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arXiv · 2606.31797

Plasma double layer development during high power EUV exposure

Manis Chaudhuri·Pavel Krainov·Dmitry Astakhov·Andrei M. Yakunin·Mark van de Kerkhof
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Abstract

The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC (Particle-In-Cell) simulations in the context of fast transient high power EUV exposures. It is found that the DL exists only for short time scale during EUV-ON time period (~ 70ns) and disappears soon after EUV is OFF. Such DL fingerprint appears above a certain critical value of EUV beam energy (~ 0.1mJ) and it transforms from weak-to-strong DL with further increase of EUV power.

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Manis Chaudhuri, Pavel Krainov, Dmitry Astakhov, Andrei M. Yakunin, Mark van de Kerkhof. 2026-06-30. Plasma double layer development during high power EUV exposure. https://arxiv.org/abs/2606.31797

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