arXiv subjects

Manis Chaudhuri

Publications and source records attributed to Manis Chaudhuri.

5 recordsLinked to original sources

arXiv2026

Plasma double layer development during high power EUV exposure

The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC (Particle-In-Cell) simulations in the context of fast transient high power EUV exposures. It is found that the DL exists only for short time scale during EUV-ON time period (~ 70ns) and disappears soon after EUV is OFF. Such DL fingerprint appears above a certain critical value of EUV beam energy (~ 0.1mJ) and it transforms from weak-to-strong DL with further increase of EUV power.

physics.plasm-ph↗

arXiv2021

Spontaneous dust pulse formation in the afterglow of complex plasmas under microgravity conditions

A new type of nonlinear dust pulse structures has been observed in afterglow complex plasma under microgravity condition on board the International Space Station (ISS). The dust pulses are triggered spontaneously as the plasma is switched off and the particles start to flow through each other (uni-directional or counter-streaming) in the presence of a low-frequency external electric excitation. The pulses are oblique with respect to the microparticle cloud and appear to be symmetric with respect to the central axis. A possible explanation of this observation with the spontaneous development of a double layer in the afterglow of complex plasma is described.

physics.plasm-ph↗

arXiv2020

Plasma-assisted Discharges and Charging in EUV-induced Plasma

In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is transmitted through a near-vacuum H2 background gas, imaging the pattern of a reticle onto a wafer. The energetic EUV photons excite the background gas into a low-density H2 plasma. The resulting plasma will locally change the near-vacuum into a conducting medium, and can charge floating surfaces and particles, also away from the direct EUV beam. This paper will discuss the interaction between EUV-induced plasma and electrostatics, by modeling and experiments. We show that the EUV-induced plasma can trigger discharges well below the classical Paschen limit. Furthermore, we demonstrate the charging effect of the EUV plasma on both particles and surfaces. Uncontrolled, this can lead to unacceptably high voltages on the reticle backside and the generation and transport of particles. We demonstrate a special unloading sequence to use the EUV-induced plasma to actively solve the charging and defectivity challenges.

physics.plasm-ph↗

arXiv2011

Universality of the melting curves for a wide range of interaction potentials

We demonstrate that the melting curves of various model systems of interacting particles collapse to (or are located very close to) a universal master curve on a plane of appropriately chosen scaled variables. The physics behind this universality is discussed. An equation for the emerging "universal melting curve" is proposed. The obtained results can be used to approximately predict melting of various substances in a wide range of conditions.

cond-mat.soft↗

arXiv2010

Shielding of a small charged particle in weakly ionized plasmas

In this paper we present a concise overview of our recent results concerning the electric potential distribution around a small charged particle in weakly ionized plasmas. A number of different effects which influence plasma screening properties are considered. Some consequences of the results are discussed, mostly in the context of complex (dusty) plasmas.

physics.plasm-ph↗