Growth and characterization of planar hexagonal Ge on CdS

Abstract

Hexagonal group-IV semiconductors have attracted increasing interest owing to their unconventional electronic and optical properties compared to the cubic diamond phase. However, the stabilization of these metastable allotropes in planar heterostructures remains a major challenge. In this work, we demonstrate the epitaxial growth of planar hexagonal germanium on non-basal $m$-plane CdS substrates by low-energy plasma-enhanced chemical vapor deposition. The role of growth temperature in the formation and stabilization of the hexagonal phase is investigated. X-ray diffraction, scanning transmission electron microscopy, and polarization-resolved Raman spectroscopy reveal the formation of epitaxial hexagonal germanium with the expected crystal symmetry. In particular, the Raman response exhibits the characteristic polarization selection rules of the E$_\text{2g}$ phonon mode of hexagonal Ge. Conversely, photoluminescence spectroscopy does not reveal any Ge-related emission feature. Combined transmission electron microscopy observations and atomistic modeling show that strain relaxation is governed by a limited set of dislocation mechanisms, which efficiently relieve most of the mismatch strain within a few nanometers from the interface and can involve localized cubic stacking insertions. At greater distances from the interface, the progressive loss of hexagonal order is increasingly dominated by stacking-fault disorder, particularly I3-type defects. These results establish CdS as a promising template for the planar stabilization of hexagonal Ge and provide insight into the defect mechanisms governing strain relaxation in metastable group-IV heterostructures.