arXiv · cond-mat/0102399
Role of defects in the electronic properties of amorphous/crystalline Si interface
Abstract
The mechanism determining the band alignment of the amorphous/crystalline Si heterostructures is addressed with direct atomistic simulations of the interface performed using a hierarchical combination of various computational schemes ranging from classical model-potential molecular dynamics to ab-initio methods. We found that in coordination defect-free samples the band alignment is almost vanishing and independent on interface details. In defect-rich samples, instead, the band alignment is sizeably different with respect to the defect-free case, but, remarkably, almost independent on the concentration of defects. We rationalize these findings within the theory of semiconductor interfaces.
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Maria Peressi, Luciano Colombo, Stefano de Gironcoli. 2001-05-14. Role of defects in the electronic properties of amorphous/crystalline Si interface. https://doi.org/10.1103/physrevb.64.193303
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