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Giant microwave photoresistance of two-dimensional electron gas

P. D. Ye·L. W. Engel·D. C. Tsui·J. A. Simmons·J. R. Wendt·G. A. Vawter·J. L. Reno
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Abstract

We measure microwave frequency (4-40 GHz) photoresistance at low magnetic field B, in high mobility 2D electron gas samples, excited by signals applied to a transmission line fabricated on the sample surface. Oscillatory photoresistance vs B is observed. For excitation at the cyclotron resonance frequency, we find an unprecedented, giant relative photoresistance (ΔR)/R of up to 250 percent. The photoresistance is apparently proportional to the square root of applied power, and disappears as the temperature is increased.

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P. D. Ye, L. W. Engel, D. C. Tsui, J. A. Simmons, J. R. Wendt, G. A. Vawter, J. L. Reno. 2001-06-09. Giant microwave photoresistance of two-dimensional electron gas. https://doi.org/10.1063/1.1408910

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