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High quality MgB2 thin films in-situ grown by dc magnetron sputtering

R. Vaglio·M. G. Maglione·R. Di Capua
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Abstract

Thin films of the recently discovered magnesium diboride (MgB2) intermetalic superconducting compound have been grown using a magnetron sputtering deposition technique followed by in-situ annealing at 830 C. High quality films were obtained on both sapphire and MgO substrates. The best films showed maximum Tc = 35 K (onset), a transition width of 0.5 K, a residual resistivity ratio up to 1.6, a low temperature critical current density Jc > 1 MA/cm2 and anisotropic critical field with gamma = 2.5 close to the values obtained for single crystals. The preparation technique can be easily scaled to produce large area in-situ films.

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R. Vaglio, M. G. Maglione, R. Di Capua. 2002-03-15. High quality MgB2 thin films in-situ grown by dc magnetron sputtering. https://doi.org/10.1088/0953-2048%2F15%2F8%2F312

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