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Random Deposition Model with a Constant Capture Length

Paolo Politi·Yukio Saito
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Abstract

We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance \ell, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to capture equations and to the analysis of the island-island distance distribution.

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BibTeXRIS

Paolo Politi, Yukio Saito. 2004-12-16. Random Deposition Model with a Constant Capture Length. https://doi.org/10.1143/ptp.113.15

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