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Diffusion-limited deposition with dipolar interactions: fractal dimension and multifractal structure

M. Tasinkevych·J. M. Tavares·F. de los Santos
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Abstract

Computer simulations are used to generate two-dimensional diffusion-limited deposits of dipoles. The structure of these deposits is analyzed by measuring some global quantities: the density of the deposit and the lateral correlation function at a given height, the mean height of the upper surface for a given number of deposited particles and the interfacial width at a given height. Evidences are given that the fractal dimension of the deposits remains constant as the deposition proceeds, independently of the dipolar strength. These same deposits are used to obtain the growth probability measure through Monte Carlo techniques. It is found that the distribution of growth probabilities obeys multifractal scaling, i.e. it can be analyzed in terms of its $f(α)$ multifractal spectrum. For low dipolar strengths, the $f(α)$ spectrum is similar to that of diffusion-limited aggregation. Our results suggest that for increasing dipolar strength both the minimal local growth exponent $α_{min}$ and the information dimension $D_1$ decrease, while the fractal dimension remains the same.

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M. Tasinkevych, J. M. Tavares, F. de los Santos. 2005-12-06. Diffusion-limited deposition with dipolar interactions: fractal dimension and multifractal structure. https://doi.org/10.1063/1.2162875

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