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Diffusional Relaxation in Random Sequential Deposition

Eli Eisenberg·Asher Baram
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Abstract

The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expression for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.

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Eli Eisenberg, Asher Baram. 1996-10-25. Diffusional Relaxation in Random Sequential Deposition. https://doi.org/10.1088/0305-4470%2F30%2F9%2F003

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