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Ageeth A. Bol

Publications and source records attributed to Ageeth A. Bol.

14 recordsLinked to original sources

WSe2 p-MOSFETs with Nb-Doped WS2 Contacts Deposited using Atomic Layer Deposition

WSe2 p-MOSFETs with Nb-doped WS2 contacts formed using atomic layer deposition are demonstrated. The devices are fabricated using a technique that aligns the contact metallization with the Nb-doped WS2 contacts using a selective oxidation process. Devices with source/drain spacing of 0.15 um have on-state current of 103 uA/um at VDS = -1 V at a channel carrier concentration of ~ 7.5 x 1012 cm-2. The results provide a promising CMOS-compatible pathway to create low-resistance contacts to 2D-channel transistors.

cond-mat.mtrl-sci

Delayed 1T to 2H Phase Transition Upon Electrochemical Delithiation of LiMoS2

Molybdenum disulfide (MoS2) is a widely studied layered material for electronic, optical, and catalytic applications. It can host lithium ions between the van der Waals layers, which triggers a phase transition between the semiconducting 2H phase and metallic 1T phase. While lithium insertion triggers a phase transition to the 1T phase, the phase behavior upon electrochemical lithium removal is not resolved. In this work, we conduct single-flake electrochemical (de)lithiation of MoS2 using microelectrode arrays. Through both electrochemical voltage analysis and correlative Raman spectroscopy, we show that an electrochemically cycled and delithiated MoS2 flake initially remains in the 1T phase. However, over the course of several days, it transitions back into the thermodynamically stable 2H phase. This result resolves the phase transformation pathway upon delithiation and showcases the ability to electrochemically synthesize the metastable 1T-MoS2 phase.

cond-mat.mtrl-sci

Content Addressable Memory Design with Reference Resistor for Improved Search Resolution

Despite the parallel in-memory search capabilities of content addressable memories (CAMs), their use in applications is constrained by their limited resolution that worsens as they are scaled to larger arrays or advanced nodes. In this work we present experimental results for a novel back-end-of-line compatible reference resistive device that can significantly improve the search resolution of CAMs implemented with CMOS and beyond-CMOS technologies to less than or equal to 5-bits.

cs.ET

Nanomechanical resonators fabricated by atomic layer deposition on suspended 2D materials

Atomic layer deposition (ALD), a layer-by-layer controlled method to synthesize ultrathin materials, provides various merits over other techniques such as precise thickness control, large area scalability and excellent conformality. Here we demonstrate the possibility of using ALD growth on top of suspended 2D materials to fabricate nanomechanical resonators. We fabricate ALD nanomechanical resonators consisting of a graphene/MoS$_2$ heterostructure. Using AFM indentation and optothermal drive, we measure their mechanical properties including Young's modulus, resonance frequency and quality factor, showing similar values as their exfoliated and chemical vapor deposited counterparts. We also demonstrate the fabrication of nanomechanical resonators by exfoliating an ALD grown NbS$_2$ layer. This study exemplifies the potential of ALD techniques to produce high-quality suspended nanomechanical membranes, providing a promising route towards high-volume fabrication of future multilayer nanodevices and nanoelectromechanical systems.

physics.app-ph

Effects of structure and temperature on the nature of excitons in the Mo0.6W0.4S2 alloys

We have studied the nature of excitons in the transition metal dichalcogenide alloy Mo0.6W0.4 S2, compared to pure MoS2 and WS2 grown by atomic layer deposition (ALD). For this, optical absorption/transmission spectroscopy and time-dependent density functional theory (TDDFT) were used. Effects of temperature on the A and B exciton peak energies and linewidths in the optical transmission spectra were compared between the alloy and pure MoS2 and WS2. On increasing the temperature from 25 K to 293 K the energy of the A and B exciton peaks decreases, while their linewidth increases due to exciton-phonon interactions. The exciton-phonon interactions in the alloy are closer to those for MoS2 than WS2. This suggests that the exciton wave functions in the alloy have a larger amplitude on Mo atoms than on W atoms. The experimental absorption spectra could be reproduced by TDDFT calculations. Interestingly, for the alloy the Mo and W atoms had to be distributed over all layers. Conversely, we could not reproduce the experimental alloy spectrum by calculations on a structure with alternating layers, in which every other layer contains only Mo atoms and the layers in between also W atoms. For the latter atomic arrangement, the TDDFT calculations yielded an additional optical absorption peak that could be due to excitons with some charge transfer character. From these results we conclude that ALD yields an alloy in which Mo and W atoms are distributed uniformly among all layers.

cond-mat.mtrl-sci

Controlling transition metal atomic ordering in two-dimensional Mo$_{1-x}$W$_{x}$S$_{2}$ alloys

The unique optical and electronic properties of two-dimensional transition metal dichalcogenides (2D TMDs) make them promising materials for applications in (opto-)electronics, catalysis and more. Specifically, alloys of 2D TMDs have broad potential applications owing to their composition-controlled properties. Several important challenges remain regarding controllable and scalable fabrication of these alloys, such as achieving control over their atomic ordering (i.e. clustering or random mixing of the transition metal atoms within the 2D layers). In this work, atomic layer deposition (ALD) is used to synthesize the TMD alloy Mo$_{1-x}$W$_{x}$S$_{2}$ with excellent composition control along the complete composition range 0 $\leq$ x $\leq$ 1. Importantly, this composition control allows us to control the atomic ordering of the alloy from well-mixed to clustered while keeping the alloy composition fixed, as is confirmed directly through atomic-resolution HAADF-STEM imaging. The control over atomic ordering leads to tuning of the bandgap, as is demonstrated using optical transmission spectroscopy. The relation between this tuning of the electronic structure and the atomic ordering of the alloy was further confirmed through ab-initio calculations. Furthermore, as the atomic ordering modulates from clustered to well-mixed, the typical MoS$_{2}$ and WS$_{2}$ A$_{1g}$ vibrational modes converge. Our results demonstrate that atomic ordering is an important parameter that can be tuned experimentally to finely tune the fundamental properties of 2D TMD alloys for specific applications.

cond-mat.mtrl-sci

Resist and Transfer Free Patterned CVD Graphene Growth on ALD Molybdenum Carbide Nano Layers

Multilayer graphene (MLG) films were grown by chemical vapour deposition (CVD) on molybdenum carbide ($MoC_{x}$) substrates. We fabricated the catalytic $MoC_{x}$ films by plasma enhanced atomic layer deposition (PEALD). The mechanism of graphene growth is studied and analysed for amorphous and crystalline $MoC_{x}$ films. In addition, the unique advantages of catalytic substrate PEALD are demonstrated in two approaches to graphene device fabrication. First, we present a complete bottom up, resist-free patterned graphene growth (GG) on pre-patterned $MoC_{x}$ PEALD performed at 50$^{\circ}C$. Selective CVD GG eliminates the need to pattern or transfer the graphene film to retain its pristine, as grown, qualities. Furthermore, we fabricated MLG directly on PEALD $MoC_{x}$ on 100 nm suspended SiN membrane. We characterise the MLG qualities using Raman spectroscopy, and analyse the samples by optical microscopy, scanning electron microscopy and X-ray diffraction measurements. The techniques of graphene device manufacturing demonstrated here pave the path for large scale production of graphene applications.

physics.app-ph

Control of Graphene Layer Thickness Grown on Plasma Enhanced Atomic Layer Deposition of Molybdenum Carbide

We show the merits of plasma enhanced atomic layer deposition (PEALD) of catalytic substrate for chemical vapour deposition (CVD) graphene growth. The high quality multilayer graphene (MLG) on molybdenum carbide ($MoC_{x}$) thin film exhibits excellent uniformity and layer homogeneity over a large area. Moreover, we demonstrate how to achieve control of graphene layers thickness and properties, by varying the specific catalytic film chemical and physical properties. The control of growth is not digital, but is broad ranged from few layer graphene to a graphitic film of $\sim{75}$ graphene layers grown on the respective ALD catalytic substrates. Characterisation of the MLG has been performed using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), spectral ellipsometry (SE), and scanning low-energy electron microscopy (SLEEM). By varying MLG thickness in a uniform homogeneous way, we can tailor the desired MLG properties for different application needs. Furthermore, the PEALD process can be readily adapted to high volume manufacturing processes, and combined with existing production lines.

physics.app-ph

Tailored Molybdenum Carbide Properties and Graphitic Nano Layer Formation by Plasma and Ion Energy Control during Plasma Enhanced ALD

We demonstrate the extensive study on how film density and crystallinity of molybdenum carbide ($MoC_{x}$) can be tailored during plasma-enhanced ALD (PEALD) by controlling either the plasma exposure time or the ion energy. We investigated $MoC_{x}$ films grown using $Mo(^tBuN)_2(NMe_2)_2$ as the precursor and $H_2/Ar$ plasma as the co-reactant at temperatures between 150°C and 300°C. We discover a threshold for graphitic layer formation at high mean ion energies during the PEALD cycle. The supplied high energy dose allows for hybridised $sp^{2}$ carbon bonds formation, similar to high temperature annealing. The graphitisation of the $MoC_{x}$ surface takes place at temperature of 300$^{\circ}C$. The graphitic film show a (101) plane diffraction peak with dominant intensity in XRD, and a typical $sp^{2}$ C1s peak along with carbidic metal in XPS measurements. Surface roughness of the film lowers significantly at the graphitisation regime of deposition. This low temperature graphitisation by high energy plasma ions during PEALD shows a great promise to advancing graphene and graphite composites at low temperature by PEALD for future applications.

physics.app-ph

Structure and electronic transport in graphene wrinkles

Wrinkling is a ubiquitous phenomenon in two-dimensional membranes. In particular, in the large-scale growth of graphene on metallic substrates, high densities of wrinkles are commonly observed. Despite their prevalence and potential impact on large-scale graphene electronics, relatively little is known about their structural morphology and electronic properties. Surveying the graphene landscape using atomic force microscopy, we found that wrinkles reach a certain maximum height before folding over. Calculations of the energetics explain the morphological transition, and indicate that the tall ripples are collapsed into narrow standing wrinkles by van der Waals forces, analogous to large-diameter nanotubes. Quantum transport calculations show that conductance through these collapsed wrinkle structures is limited mainly by a density-of-states bottleneck and by interlayer tunneling across the collapsed bilayer region. Also through systematic measurements across large numbers of devices with wide folded wrinkles, we find a distinct anisotropy in their electrical resistivity, consistent with our transport simulations. These results highlight the coupling between morphology and electronic properties, which has important practical implications for large-scale high-speed graphene electronics.

cond-mat.mes-hall

Infrared Spectroscopy of Wafer-Scale Graphene

We report on spectroscopy results from the mid- to far-infrared on wafer-scale graphene, grown either epitaxially on silicon carbide, or by chemical vapor deposition. The free carrier absorption (Drude peak) is simultaneously obtained with the universal optical conductivity (due to interband transitions), and the wavelength at which Pauli blocking occurs due to band filling. From these the graphene layer number, doping level, sheet resistivity, carrier mobility, and scattering rate can be inferred. The mid-IR absorption of epitaxial two-layer graphene shows a less pronounced peak at 0.37\pm0.02 eV compared to that in exfoliated bilayer graphene. In heavily chemically-doped single layer graphene, a record high transmission reduction due to free carriers approaching 40% at 250 \mum (40 cm-1) is measured in this atomically thin material, supporting the great potential of graphene in far-infrared and terahertz optoelectronics.

cond-mat.mes-hall

Large low-frequency resistance noise in chemical vapor deposited graphene

We report a detailed investigation of resistance noise in single layer graphene films on Si/SiO$_2$ substrates obtained by chemical vapor deposition (CVD) on copper foils. We find that noise in these systems to be rather large, and when expressed in the form of phenomenological Hooge equation, it corresponds to Hooge parameter as large as $0.1 - 0.5$. We also find the variation in the noise magnitude with the gate voltage (or carrier density) and temperature to be surprisingly weak, which is also unlike the behavior of noise in other forms of graphene, in particular those from exfoliation.

cond-mat.mes-hall

Efficient narrow-band light emission from a single carbon nanotube p-n diode

Electrically-driven light emission from carbon nanotubes could be exploited in nano-scale lasers and single-photon sources, and has therefore been the focus of much research. However, to date, high electric fields and currents have been either required for electroluminescence, or have been an undesired side effect, leading to high power requirements and low efficiencies. In addition, electroluminescent linewidths have been broad enough to obscure the contributions of individual optical transitions. Here, we report electrically-induced light emission from individual carbon nanotube p-n diodes. A new level of control over electrical carrier injection is achieved, reducing power dissipation by a factor of up to 1000, and resulting in zero threshold current, negligible self-heating, and high carrier-to- photon conversion efficiencies. Moreover, the electroluminescent spectra are significantly narrower (ca. 35 meV) than in previous studies, allowing the identification of emission from free and localized excitons.

cond-mat.mes-hall

How does the substrate affect the Raman and excited state spectra of a carbon nanotube?

We study the optical properties of a single, semiconducting single-walled carbon nanotube (CNT) that is partially suspended across a trench and partially supported by a SiO2-substrate. By tuning the laser excitation energy across the E33 excitonic resonance of the suspended CNT segment, the scattering intensities of the principal Raman transitions, the radial breathing mode (RBM), the G-mode and the D-mode show strong resonance enhancement of up to three orders of magnitude. In the supported part of the CNT, despite a loss of Raman scattering intensity of up to two orders of magnitude, we recover the E33 excitonic resonance suffering a substrate-induced red shift of 50 meV. The peak intensity ratio between G-band and D-band is highly sensitive to the presence of the substrate and varies by one order of magnitude, demonstrating the much higher defect density in the supported CNT segments. By comparing the E33 resonance spectra measured by Raman excitation spectroscopy and photoluminescence (PL) excitation spectroscopy in the suspended CNT segment, we observe that the peak energy in the PL excitation spectrum is red-shifted by 40 meV. This shift is associated with the energy difference between the localized exciton dominating the PL excitation spectrum and the free exciton giving rise to the Raman excitation spectrum. High-resolution Raman spectra reveal substrate-induced symmetry breaking, as evidenced by the appearance of additional peaks in the strongly broadened Raman G band. Laser-induced line shifts of RBM and G band measured on the suspended CNT segment are both linear as a function of the laser excitation power. Stokes/anti-Stokes measurements, however, reveal an increase of the G phonon population while the RBM phonon population is rather independent of the laser excitation power.

cond-mat.mtrl-sci