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Albert F. Rigosi

Publications and source records attributed to Albert F. Rigosi.

At least 19 recordsLinked to original sources

Nonlocal Transport in Cr-doped (Bi,Sb)2Te3: Absence of Nonchiral Edge States

The quantum anomalous Hall effect shows great promise for realization of the ohm without the need for an external magnetic field. The most mature material platform is magnetically doped topological insulators. In these materials, precise quantization is limited to low temperatures, with the activation energy for dissipative transport typically in the range of 1 K. One potential source of dissipative transport is non-chiral edge states. These states are expected to be present in sufficiently thick samples. In this work, we perform extensive Hall and non-local resistance measurements in a Hall bar geometry at 2 K. By comparing 15 independent transport measurements to different transport models, we find that the system behavior is well-described by a simple continuum Ohm's law model. The addition of non-chiral edge states into the model does not significantly improve the fitting, and we conclude that there is not strong evidence for these states. We discuss the implications of our results for the prospect of high temperature quantized anomalous Hall effect in these materials.

cond-mat.mes-hall↗

A unified realization of electrical quantities from the quantum International System of Units

In the revised International System of Units (SI), the ohm and the volt are realized from the von Klitzing constant and the Josephson constant, and a practical realization of the ampere is possible by applying Ohm's law directly to the quantum Hall and Josephson effects. As a result, it is possible to create an instrument capable of realizing all three primary electrical units, but the development of such a system remains challenging. Here we report a unified realization of the volt, ohm, and ampere by integrating a quantum anomalous Hall resistor (QAHR) and a programmable Josephson voltage standard (PJVS) in a single cryostat. Our system has a quantum voltage output that ranges from 0.24 mV to 6.5 mV with combined relative uncertainties down to 3 $μ$V/V. The QAHR provides a realization of the ohm at zero magnetic field with uncertainties near 1 $μΩ$/$Ω$. We use the QAHR to convert a longitudinal current to a quantized Hall voltage and then directly compare that against the PJVS to realize the ampere. We determine currents in the range of 9.33 nA to 252 nA, and our lowest uncertainty is 4.3 $μ$A/A at 83.9 nA. For other current values, a systematic error that ranges from -10 $μ$A/A to -30 $μ$A/A is present due to the imperfect isolation of the PJVS microwave bias.

cond-mat.mes-hall↗

From Wye-Delta to Cross-Square Recursion Configurations in Graphene-Based Quantum Hall Arrays

In electrical metrology, the quantum Hall effect is accessed at the Landau level filling factor ν = 2 plateau to define and disseminate the unit of electrical resistance (ohm). The robustness of the plateau is only exhibited at this Landau level filling factor and thus places a constraint on the quantized resistances that are accessible when constructing quantized Hall array resistance standards (QHARS) using epitaxial graphene on SiC. To overcome devices constrained by using Hall elements in series or in parallel, this work approaches the fabrication of a cross-square network configuration, which is similar to but departs slightly from conventional wye-delta designs and achieves significantly higher effective quantized resistance outputs. Furthermore, the use of pseudofractal-like recursion amplifies the ability to reach high resistances. QHARS devices designed as the ones here are shown to achieve an effective resistance of 55.81 M$Ω$ in one configuration and 27.61 G$Ω$ in another, with a hypothetically projected 317.95 T$Ω$ that could be accessed with more specialized equipment. Teraohmmeter measurements reveal the limits of conventional wet cryogenic systems due to resistance leakage. Ultimately, this work builds on the capability of realizing exceptionally high-value quantum resistance standards.

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Implementing Pseudofractal Designs in Graphene-Based Quantum Hall Arrays using Minkowski-Bouligand Algorithms

This work introduces a pseudofractal analysis for optimizing high-resistance graphene-based quantized Hall array resistance standards (QHARS). The development of resistance standard device designs through star-mesh transformations is detailed, aimed at minimizing element count. Building on a recent mathematical framework, the approach presented herein refines QHARS device concepts by considering designs incorporating pseudofractals (which may be expressed as star-mesh transformations). To understand how future QHARS pseudofractal designs enable varying sizes of neighborhoods of available quantized resistance, Minkowski-Bouligand algorithms are used to analyze fractal dimensions of the device design topologies. Three distinct partial recursion cases are explored in addition to the original full recursion design, and expressions for their total element counts are derived. These partial recursions, assessed through their fractal dimensions, offer enhanced flexibility in achieving specific resistance values within a desired neighborhood compared to full recursion methods, albeit with an increased number of required elements. The formalisms presented are material-independent, making them broadly applicable to other quantum Hall systems and artifact standards.

cond-mat.mes-hall↗

Influences of the Minkowski-Bouligand Dimension on Graphene-Based Quantum Hall Array Designs

This work elaborates on how one may develop high-resistance quantized Hall array resistance standards (QHARS) by using star-mesh transformations for element count minimization. Refinements are made on a recently developed mathematical framework optimizing QHARS device designs based on full, symmetric recursion by reconciling approximate device values with exact effective quantized resistances found by simulation and measurement. Furthermore, this work explores the concept of fractal dimension, clarifying the benefits of both full and partial recursions in QHARS devices. Three distinct partial recursion cases are visited for a near-1 Gigaohm QHARS device. These partial recursions, analyzed in the context of their fractal dimensions, offer increased flexibility in accessing desired resistance values within a specific neighborhood compared to full recursion methods, though at the cost of the number of required devices.

cond-mat.mes-hall↗

Auxiliary Calculations for Graphene-Based Quantum Hall Arrays Using Partially Recursive Star-Mesh Transformations

A previous mathematical approach adopted for optimizing the number of total device elements required for obtaining high effective quantized resistances in graphene-based quantum Hall array devices (QHARS) has been further explored with partial recursion patterns. Designs would assume the use of epitaxial graphene elements, whose quantized Hall resistance at the ν=2 plateau (R_H \approx 12906.4 \Ohm) becomes the building block for larger effective, quantized resistances. Auxiliary calculations suggest the importance of applying full recursions at least once to maximize the reduction of total QHARS elements needed for high resistances.

cond-mat.mes-hall↗

Constructing 100 MΩ and 1 GΩ Resistance Standards via Star-Mesh Transformations

A recent mathematical framework for optimizing resistor networks to achieve values in the MΩ through GΩ levels was employed for two specific cases. Objectives here include proof of concept and identification of possible apparatus limitations for future experiments involving graphene-based quantum Hall array resistance standards. Using fractal-like, or recursive, features of the framework allows one to calculate and implement network designs with substantially lower-valued resistors. The cases of 100 MΩ and 1 GΩ demonstrate that, theoretically, one would not need more than 100 quantum Hall elements to achieve these high resistances.

cond-mat.mes-hall↗

Fractal-like star-mesh transformations using graphene quantum Hall arrays

A mathematical approach is adopted for optimizing the number of total device elements required for obtaining high effective quantized resistances in graphene-based quantum Hall array devices. This work explores an analytical extension to the use of star-mesh transformations such that fractal-like, or recursive, device designs can yield high enough resistances (like 1 EΩ, arguably the highest resistance with meaningful applicability) while still being feasible to build with modern fabrication techniques. Epitaxial graphene elements are tested, whose quantized Hall resistance at the nu=2 plateau (R_H = 12906.4 Ω) becomes the building block for larger effective, quantized resistances. It is demonstrated that, mathematically, one would not need more than 200 elements to achieve the highest pertinent resistances

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Star-Mesh Quantized Hall Array Resistance Devices

Advances in the development of graphene-based technology have enabled improvements in DC resistance metrology. Devices made from epitaxially grown graphene have replaced the GaAs-based counterparts, leading to an easier and more accessible realization of the ohm. By optimizing the scale of the growth, it has become possible to fabricate quantized Hall array resistance standards (QHARS) with nominal values between 1 kΩ and 1.29 MΩ. One of these QHARS device designs accommodates a value of about 1.01 MΩ, which made it an ideal candidate to pursue a proof-of-concept that graphene-based QHARS devices are suitable for forming wye-delta resistance networks. In this work, the 1.01 MΩ array output nearly 20.6 MΩ due to the wye-delta transformation, which itself is a special case of star-mesh transformations. These mathematical equivalence principles allow one to extend the QHR to the 100 MΩ and 10 GΩ resistance levels with fewer array elements than would be necessary for a single array with many more elements in series. The 1.01 MΩ device shows promise that the wye-delta transformation can shorten the calibration chain, and, more importantly, provide a chain with a more direct line to the quantum SI.

cond-mat.mes-hall↗

Quantum Entropic Effects in the Liquid Viscosities of Hydrogen, Deuterium, and Neon

The extremely low temperatures have limited the availability and accuracy of experimental thermophysical property measurements for cryogens, particularly transport properties. Traditional scaling techniques such as corresponding states theory have long been known to be inaccurate for fluids with strong quantum effects. To address this need, this paper investigates how quantum effects impact thermodynamics and momentum transfer (shear viscosity) in the fluid phases of hydrogen, deuterium, and neon. We utilize experimental viscosity measurements and reference empirical equations of state to show that conventional entropy scaling is inadequate for quantum-dominated systems. We then provide a simple empirical correction to entropy scaling based on the ratio of quantum to packing length scale that accounts for the deviations.

cond-mat.quant-gas↗

Optical Signatures of Strain Differences in Epitaxial Graphene Nanoribbons

We demonstrate the preparation of both armchair and zigzag epitaxial graphene nanoribbons (GNRs) on 4H-SiC using a polymer-assisted, sublimation growth method. Historically, the preparation of GNRs depended on the quality, or smoothness, of the surface changes during growth. The physical phenomenon of terrace step formation introduces the risk of GNR deformation along sidewalls, but the risk is heavily mitigated by this polymer-assisted sublimation method. Two widths (100 nm and 50 nm) are examined electrically and optically for both armchair and zigzag GNRs. Our electrical results support the expected behaviors of the GNRs, while the optical signatures of variable strain reveal the subtle differences among all the GNR species measured.

cond-mat.mtrl-sci↗

Fabrication of uniformly doped graphene quantum Hall arrays with multiple quantized resistance outputs

In this work, limiting factors for developing metrologically useful arrays from epitaxial graphene on SiC are lifted with a combination of centimeter-scale, high-quality material growth and the implementation of superconducting contacts. Standard devices for metrology have been restricted to having a single quantized value output based on the $ν$ = 2 Landau level. With the demonstrations herein of devices having multiple outputs of quantized values available simultaneously, these versatile devices can be used to disseminate the ohm globally. Such devices are designed to give access to quantized resistance values over the range of three orders of magnitude, starting as low as the standard value of approximately 12.9 k$Ω$ and reaching as high as 1.29 M$Ω$. Several experimental methods are used to assess the quality and versatility of the devices, including standard lock-in techniques and Raman spectroscopy.

cond-mat.mes-hall↗

Diffraction Patterns of Apertures Shaped as National Borders

How aesthetically pleasing is your country's diffraction pattern? This work summarizes the calculated and experimental Fraunhofer diffraction patterns obtained from using apertures lithographically formed into shapes of national borders. Calculations are made based on the fast Fourier transform of the aperture images. The entropy of each of the 113 nations' diffraction patterns was also computed based on its two-dimensional gradient. Results suggest that most nations' diffraction patterns fall under one of two prominent trends forming as a function of geographical area, with one trend being less entropic than the other.

physics.pop-ph↗

Timescales for Nitric Acid Desorption in Epitaxial Graphene Devices

This work reports the dynamics of transient hole doping in epitaxial graphene devices by using nitric acid as an adsorbent. The timescales associated with corresponding desorption processes are extracted from the data. The understanding of reversible hole doping without gating is of crucial importance to those fabricating devices with a particular functionality. Measurements of the electrical and optical properties of several devices post-exposure were performed with transport temperatures between 300 K and 1.5 K. Ambient conditions are applied to non-transport measurements to replicate the most likely laboratory conditions for handling devices using this doping method. The relevant timescales from transport measurements are compared with results from Raman spectroscopy measurements.

cond-mat.mes-hall↗

Spectroscopic assessment of short-term nitric acid doping of epitaxial graphene

This work reports information on the transience of hole doping in epitaxial graphene devices when nitric acid is used as an adsorbent. Under vacuum conditions, desorption processes are monitored by electrical and spectroscopic means to extract the relevant timescales from the corresponding data. It is of vital importance to understand the reversible nature of hole doping because such device processing can be a suitable alternative to large-scale, metallic gating. Most measurements are performed post-exposure at room temperature, and, for some electrical transport measurements, at 1.5 K. Vacuum conditions are applied to many measurements to replicate the laboratory conditions under which devices using this doping method would be measured. The relevant timescales from transport measurements are compared with results from X-ray photoelecton spectroscopy and Fourier transform infrared spectroscopy measurements, with the latter performed at ambient conditions and accompanied by calculations of the spectra in the Reststrahlen band.

cond-mat.mes-hall↗

Large-scale five- and seven-junction epitaxial graphene devices

The utilization of multiple current terminals on millimeter-scale graphene p-n junction devices has enabled the measurement of many atypical, fractional multiples of the quantized Hall resistance at the i=2 plateau. These fractions take the form a/b R_H and can be determined both analytically and by simulations. These experiments validate the use of either the LTspice circuit simulator or the analytical framework recently presented in similar work. Furthermore, the production of several devices with large-scale junctions substantiates the approach of using simple ultraviolet lithography to obtain junctions of sufficient sharpness.

cond-mat.mes-hall↗

Fabrication of quantum Hall p-n junction checkerboards

Measurements of fractional multiples of the ν=2 plateau quantized Hall resistance (R_H {\approx} 12906 Ω) were enabled by the utilization of multiple current terminals on millimetre-scale graphene p-n junction devices fabricated with interfaces along both lateral directions. These quantum Hall resistance checkerboard devices have been demonstrated to match quantized resistance outputs numerically calculated with the LTspice circuit simulator. From the devices' functionality, more complex embodiments of the quantum Hall resistance checkerboard were simulated to highlight the parameter space within which these devices could operate. Moreover, these measurements suggest that the scalability of p-n junction fabrication on millimetre or centimetre scales is feasible with regards to graphene device manufacturing by using the far more efficient process of standard ultraviolet lithography.

cond-mat.mes-hall↗

Algorithms for determining resistances in quantum Hall annuli with p-n junctions

Just a few of the promising applications of graphene Corbino pnJ devices include two-dimensional Dirac fermion microscopes, custom programmable quantized resistors, and mesoscopic valley filters. In some cases, device scalability is crucial, as seen in fields like resistance metrology, where graphene devices are required to accommodate currents of the order 100 μA to be compatible with existing infrastructure. However, fabrication of these devices still poses many difficulties. In this work, unusual quantized resistances are observed in epitaxial graphene Corbino p-n junction devices held at the i=2 plateau and agree with numerical simulations performed with the LTspice circuit simulator. The formulae describing experimental and simulated data are empirically derived for generalized placement of up to three current terminals and accurately reflects observed partial edge channel cancellation. These results support the use of ultraviolet lithography as a way to scale up graphene-based devices with suitably narrow junctions that could be applied in a variety of subfields

cond-mat.mes-hall↗