arXiv subjects

Andres Godoy

Publications and source records attributed to Andres Godoy.

7 recordsLinked to original sources

arXiv2025

Numerical study of synaptic behavior in amorphous HfO2-based ferroelectric-like FETs generated by voltage-driven ion migration

The continuous effort in making artificial neural networks more alike to human brain calls for the hardware elements to implement biological synapse-like functionalities. The recent experimental demonstration of ferroelectric-like FETs promises low-power operation as compared to the conventional ferroelectric switching devices. This work presents an in-house numerical tool, which self-consistently solves the electrostatics and time-dependent electronic and ionic transport. The tool is exploited to analyze the effect that various physical parameters such as mobility and ion concentration could have on the design of the ferroelectric-like FETs. Their suitability in emulating different functions of the biological synapses is also demonstrated.

cond-mat.mtrl-sci↗

arXiv2025

Understanding Memristive Behavior: An Atomistic Study of the Influence of Grain Boundaries on Surface and Out-of-Plane Diffusion of Metallic Atoms

Atomic migration from metallic contacts, and subsequent filament formation, is recognised as a prevailing mechanism leading to resistive switching in memristors based on two-dimensional materials (2DMs). This study presents a detailed atomistic examination of the migration of different metal atoms across the grain boundaries (GBs) of 2DMs, employing Density Functional Theory in conjunction with Non-Equilibrium Green's Function transport simulations. Various types of metallic atoms, Au, Cu, Al, Ni, and Ag, are examined, focusing on their migration both in the out-of-plane direction through a MoS\textsubscript{2} layer and along the surface of the MoS\textsubscript{2} layer, pertinent to filament formation in vertical and lateral memristors, respectively. Different types of GBs usually present in MoS\textsubscript{2} are considered to assess their influence on the diffusion of metal atoms. The findings are compared with structures based on pristine MoS\textsubscript{2} and those with mono-sulfur vacancies, aiming to understand the key elements that affect the switching performance of memristors. Furthermore, transport simulations are carried out to evaluate the effects of GBs on both out-of-plane and in-plane electron conductance, providing valuable insights into the resistive switching ratio.

cond-mat.mtrl-sci↗

arXiv2022

Graphene on Silicon Hybrid Field-Effect Transistors

The combination of graphene with silicon in hybrid devices has attracted attention extensively over the last decade. Most of such devices were proposed for photonics and radiofrequency applications. In this work, we present a unique technology of graphene-on-silicon heterostructures and their properties as solution-gated transistors. The graphene-on-Silicon field-effect transistors (GoSFETs) were fabricated exploiting various conformations of drain-source regions doping and channel material dimensions. The fabricated devices were electrically characterized demonstrating hybrid behavior with features specific to both graphene and silicon. Although GoSFET's transconductance and carrier's mobility were found to be lower than in conventional silicon and graphene field-effect transistors (SiFETs and GFETs), it was demonstrated that the combination of both materials within the hybrid channel contribute uniquely to the charge carrier transport. A comprehensive physics-based compact modeling was specifically developed, showing excellent agreement with the experimental data. The model is employed to rationalize the observed hybrid behavior as the theoretical results from the electrostatics and the carrier transport under a drift-diffusion approach show that graphene acts as a shield for the silicon channel, giving rise to a non-uniform potential distribution along it, especially at the subthreshold region. This graphene screening effect is shown to strongly affect the device subthreshold swing when compared against a conventional SiFET due to a non-negligible diffusion current in this operation regime.

physics.app-ph↗

arXiv2018

High Responsivity and Quantum Efficiency of Graphene / Silicon Photodiodes Achieved by Interdigitating Schottky and Gated Regions

Graphene / silicon (G/Si) heterostructures have been studied extensively in the past years for applications such as photodiodes, photodetectors and solar cells, with a growing focus on efficiency and performance. Here, a specific contact pattern scheme with interdigitated Schottky and graphene/insulator/silicon (GIS) structures is explored to experimentally demonstrate highly sensitive G/Si photodiodes. With the proposed design, an external quantum efficiency (EQE) of > 80 % is achieved for wavelengths ranging from 380 to 930 nm. A maximum EQE of 98% is observed at 850 nm, where the responsivity peaks to 635 mA/W, surpassing conventional Si p-n photodiodes. This efficiency is attributed to the highly effective collection of charge carriers photogenerated in Si under the GIS parts of the diodes. The experimental data is supported by numerical simulations of the diodes. Based on these results, a definition for the true active area in G/Si photodiodes is proposed, which may serve towards standardization of G/Si based optoelectronic devices.

physics.app-ph↗

arXiv2017

High Photocurrent in Gated Graphene-Silicon Hybrid Photodiodes

Graphene/silicon (G/Si) heterojunction based devices have been demonstrated as high responsivity photodetectors that are potentially compatible with semiconductor technology. Such G/Si Schottky junction diodes are typically in parallel with gated G/silicon dioxide (SiO$_2$)/Si areas, where the graphene is contacted. Here, we utilize scanning photocurrent measurements to investigate the spatial distribution and explain the physical origin of photocurrent generation in these devices. We observe distinctly higher photocurrents underneath the isolating region of graphene on SiO$_2$ adjacent to the Schottky junction of G/Si. A certain threshold voltage (V$_T$) is required before this can be observed, and its origins are similar to that of the threshold voltage in metal oxide semiconductor field effect transistors. A physical model serves to explain the large photocurrents underneath SiO$_2$ by the formation of an inversion layer in Si. Our findings contribute to a basic understanding of graphene / semiconductor hybrid devices which, in turn, can help in designing efficient optoelectronic devices and systems based on such 2D/3D heterojunctions.

cond-mat.mes-hall↗

arXiv2017

Electrostatic Performance of InSb, GaSb, Si and Ge p-channel Nanowires

The electrostatic performance of p-type nanowires (NWs) made of InSb and GaSb, with special focus on their gate capacitance behavior, is analyzed and compared to that achieved by traditional semiconductors usually employed for p-MOS such as Si and Ge. To do so, a self-consistent kp simulator has been implemented to achieve an accurate description of the Valence Band and evaluate the charge behavior as a function of the applied gate bias. The contribution and role of the constituent capacitances, namely the insulator, centroid and quantum ones are assessed. It is demonstrated that the centroid and quantum capacitances are strongly dependent on the semiconductor material. We find a good inherent electrostatic performance of GaSb and InSb NWs, comparable to their Ge and Si counterparts making these III-Sb compounds good candidates for future technological nodes.

cond-mat.mes-hall↗

arXiv2010

Analytic model for the surface potential and drain current in negative capacitance field-effect transistors

In 2008, Salahuddin and Datta proposed that a ferroelectric material operating in the negative capacitance region could act as a step-up converter of the surface potential in a MOS structure, opening a new route for the realization of transistors with steeper subthreshold characteristics (S<60 mV/decade). In this letter, a comprehensive physics-based surface potential and drain current model for the negative capacitance field-effect transistor is reported. The model is aimed to evaluate the potentiality of such transistors for low-power switching applications. Moreover it provides a model core for memories devices relying on the hysteretic behavior of the ferroelectric gate insulator.

cond-mat.mes-hall↗