arXiv subjects

Anupam Roy

Publications and source records attributed to Anupam Roy.

At least 19 recordsLinked to original sources

arXiv2025

Escape-Induced Temporally Correlated Noise Driven Universality Crossover

Universal behavior in far-from-equilibrium systems is driven by interactions between transport processes and noise structure. The Kardar-Parisi-Zhang (KPZ) framework predicts that extensions incorporating conserved currents or temporally correlated noise give rise to distinct growth morphologies and universality classes, yet direct experimental realization has remained elusive. Here, we report atomically resolved Sn thin-film growth on Sb-doped MnBi$_2$Te$_4$, revealing a sharp dynamical crossover between two fundamentally different regimes. Early stage growth follows conserved KPZ scaling, forming two-dimensional islands and stanene layers. Beyond a critical deposition time, temporally correlated noise dominates, driving the nucleation of $\alpha$ -Sn clusters, their evolution into faceted grains, and coexistence with faceted $\beta$-Sn. Molecular dynamics simulation and Auger electron spectroscopy show adatom escape as the microscopic origin of temporally correlated noise, providing a microscopic mechanism for the universality crossover. These findings establish, for the first time, that temporal noise correlations can fundamentally alter the scaling class of a growing interface, linking atomistic kinetics to emergent universal behavior.

cond-mat.mtrl-sci↗

arXiv2025

Faster Algorithm for Second (s,t)-mincut and Breaking Quadratic barrier for Dual Edge Sensitivity for (s,t)-mincut

We study (s,t)-cuts of second minimum capacity and present the following algorithmic and graph-theoretic results. 1. Vazirani and Yannakakis [ICALP 1992] designed the first algorithm for computing an (s,t)-cut of second minimum capacity using $O(n^2)$ maximum (s,t)-flow computations. For directed integer-weighted graphs, we significantly improve this bound by designing an algorithm that computes an $(s,t)$-cut of second minimum capacity using $O(\sqrt{n})$ maximum (s,t)-flow computations w.h.p. To achieve this result, a close relationship of independent interest is established between $(s,t)$-cuts of second minimum capacity and global mincuts in directed weighted graphs. 2. Minimum+1 (s,t)-cuts have been studied quite well recently [Baswana, Bhanja, and Pandey, ICALP 2022], which is a special case of second (s,t)-mincut. (a) For directed multi-graphs, we design an algorithm that, given any maximum (s,t)-flow, computes a minimum+1 (s,t)-cut, if it exists, in $O(m)$ time. (b) The existing structures for storing and characterizing all minimum+1 (s,t)-cuts occupy $O(mn)$ space. For undirected multi-graphs, we design a DAG occupying only $O(m)$ space that stores and characterizes all minimum+1 (s,t)-cuts. 3. The study of minimum+1 (s,t)-cuts often turns out to be useful in designing dual edge sensitivity oracles -- a compact data structure for efficiently reporting an (s,t)-mincut after insertion/failure of any given pair of query edges. It has been shown recently [Bhanja, ICALP 2025] that any dual edge sensitivity oracle for (s,t)-mincut in undirected multi-graphs must occupy ${\Omega}(n^2)$ space in the worst-case, irrespective of the query time. For simple graphs, we break this quadratic barrier while achieving a non-trivial query time.

cs.DS↗

arXiv2024

Two superconducting thin films systems with potential integration of different quantum functionalities

Quantum computation based on superconducting circuits utilizes superconducting qubits with Josephson tunnel junctions. Engineering high-coherence qubits requires materials optimization. In this work, we present two superconducting thin film systems, grown on silicon (Si), and one obtained from the other via annealing. Cobalt (Co) thin films grown on Si were found to be superconducting [EPL 131 (2020) 47001]. These films also happen to be a self-organised hybrid superconductor/ferromagnet/superconductor (S/F/S) structure. The S/F/S hybrids are important for superconducting $\pi$-qubits [PRL 95 (2005) 097001] and in quantum information processing. Here we present our results on the superconductivity of a hybrid Co film followed by the superconductivity of a CoSi$_2$ film, which was prepared by annealing the Co film. CoSi$_2$, with its $1/f$ noise about three orders of magnitude smaller compared to the most commonly used superconductor aluminium (Al), is a promising material for high-coherence qubits. The hybrid Co film revealed superconducting transition temperature $T_c$ = 5 K and anisotropy in the upper critical field between the in-plane and out-of-plane directions. The anisotropy was of the order of ratio of lateral dimensions to thickness of the superconducting Co grains, suggesting a quasi-2D nature of superconductivity. On the other hand, CoSi$_2$ film showed a $T_c$ of 900 mK. In the resistivity vs. temperature curve, we observe a peak near $T_c$. Magnetic field scan as a function of $T$ shows a monotonic increase in intensity of this peak with temperature. The origin of the peak has been explained in terms of parallel resistive model for the particular measurement configuration. Although our CoSi$_2$ film contains grain boundaries, we observed a perpendicular critical field of 15 mT and a critical current density of 3.8x10$^7$ A/m$^2$, comparable with epitaxial CoSi$_2$ films.

cond-mat.supr-con↗

arXiv2024

Effect of UHV annealing on morphology and roughness of sputtered $Si(111)-(7\times7)$ surfaces

$Ar^+$ ion has been used regularly for the cleaning of semiconductor, metal surfaces for epitaxial nanostructures growth. We have investigated the effect of low-energy $Ar^+$ ion sputtering and subsequent annealing on the $Si(111)-(7\times7)$ surfaces under ultrahigh vacuum (UHV) condition. Using $in-situ$ scanning tunnelling microscopy (STM) we have compared the morphological changes to the $Si(111)-(7\times7)$ surfaces before and after the sputtering process. Following $500~eV Ar^+$ ion sputtering, the atomically flat $Si(111)-(7\times7)$ surface becomes amorphous. The average root mean square (rms) surface roughness $({\sigma}_{avg})$ of the sputtered surface and that following post-annealing at different temperatures $(500^\circ-700^\circ)C$ under UHV have been measured as a function of STM scan size. While, annealing at $\sim 500^\circ C$ shows no detectable changes in the surface morphology, recrystallization process starts at $\sim 600^\circ C$. For the sputtered samples annealed at temperatures $\geq 600^\circ C, \,log~\sigma_{avg}$ varies linearly at lower length scales and approaches a saturation value of $\sim 0.6 nm$ for the higher length scales confirming the self-affine fractal nature. The correlation length increases with annealing temperature indicating gradual improvement in crystallinity. For the present experimental conditions, $650^\circ C$ is the optimal annealing temperature for recrystallization. The results offer a method to engineer the crystallinity of sputtered surface during nanofabrication process.

cond-mat.mtrl-sci↗

arXiv2024

Two-dimensional ASEP model to study density profiles in CVD growth

The growth of two-dimensional (2D) transition metal dichalcogenides using chemical vapor deposition has been an area of intense study, primarily due to the scalability requirements for potential device applications. One of the major challenges of such growths is the large-scale thickness variation of the grown film. To investigate the role of different growth parameters computationally, we use a 2D asymmetric simple-exclusion process (ASEP) model with open boundaries as an approximation to the dynamics of deposition on the coarse-grained lattice. The variations in concentration of particles (growth profiles) at the lattice sites in the grown film are studied as functions of parameters like injection and ejection rate of particles from the lattice, time of observation, and the right bias (difference between the hopping probabilities towards right and towards left) imposed by the carrier gas. In addition, the deposition rates at a given coarse-grained site is assumed to depend on the occupancy of that site. The effect of the maximum deposition rate, i.e., the deposition rate at a completely unoccupied site on the substrate, has been explored. The growth profiles stretch horizontally when either the evolution time or the right bias is increased. An increased deposition rate leads to a step-like profile, with the higher density region close to the left edge. In 3D, the growth profiles become more uniform with the increase in the height of the precursor with respect to the substrate surface. These results qualitatively agree with the experimental observations.

cond-mat.stat-mech↗

arXiv2020

Structural and Magnetic Properties of Molecular Beam Epitaxy Grown Chromium Selenide Thin Films

Chromium selenide thin films were grown epitaxially on Al${_2}$O${_3}$(0001) and Si(111)-(7${\times}$7) substrates using molecular beam epitaxy (MBE). Sharp streaks in reflection high-energy electron diffraction and triangular structures in scanning tunneling microscopy indicate a flat smooth film growth along the c-axis, and is very similar to that from a hexagonal surface. X-ray diffraction pattern confirms the growth along the c-axis with c-axis lattice constant of 17.39 Å. The grown film is semiconducting, having a small band gap of about 0.034 eV, as calculated from the temperature dependent resistivity. Antiferromagnetic nature of the film with a Néel temperature of about 40 K is estimated from the magnetic exchange bias measurements. A larger out-of-plane exchange bias, along with a smaller in-plane exchange bias is observed below 40 K. Exchange bias training effects are analyzed based on different models and are observed to be following a modified power-law decay behavior.

cond-mat.mtrl-sci↗

arXiv2020

Stacking Order Driven Optical Properties and Carrier Dynamics in ReS2

Two distinct stacking orders in ReS2 are identified without ambiguity and their influence on vibrational, optical properties and carrier dynamics are investigated. With atomic resolution scanning transmission electron microscopy (STEM), two stacking orders are determined as AA stacking with negligible displacement across layers, and AB stacking with about a one-unit cell displacement along the a axis. First-principle calculations confirm that these two stacking orders correspond to two local energy minima. Raman spectra inform a consistent difference of modes I & III, about 13 cm-1 for AA stacking, and 20 cm-1 for AB stacking, making a simple tool for determining the stacking orders in ReS2. Polarized photoluminescence (PL) reveals that AB stacking possesses blue-shifted PL peak positions, and broader peak widths, compared with AA stacking, indicating stronger interlayer interaction. Transient transmission measured with femtosecond pump probe spectroscopy suggests exciton dynamics being more anisotropic in AB stacking, where excited state absorption related to Exc. III mode disappears when probe polarization aligns perpendicular to b axis. Our findings underscore the stacking-order driven optical properties and carrier dynamics of ReS2, mediate many seemingly contradictory results in literature, and open up an opportunity to engineer electronic devices with new functionalities by manipulating the stacking order.

cond-mat.mtrl-sci↗

arXiv2018

Accelerated Carrier Recombination by Grain Boundary/Edge Defects in MBE Grown Transition Metal Dichalcogenides

Defect-carrier interaction in transition metal dichalcogenides (TMDs) play important roles in carrier relaxation dynamics and carrier transport, which determines the performance of electronic devices. With femtosecond laser time-resolved spectroscopy, we investigated the effect of grain boundary/edge defects on the ultrafast dynamics of photoexcited carrier in MBE grown MoTe2 and MoSe2. We found that, comparing with exfoliated samples, carrier recombination rate in MBE grown samples accelerates by about 50 times. We attribute this striking difference to the existence of abundant grain boundary/edge defects in MBE grown samples, which can serve as effective recombination centers for the photoexcited carriers. We also observed coherent acoustic phonons in both exfoliated and MBE grown MoTe2, indicating strong electron-phonon coupling in this materials. Our measured sound velocity agrees well with previously reported result of theoretical calculation. Our findings provide useful reference for the fundamental parameters: carrier lifetime and sound velocity, reveal the undiscovered carrier recombination effect of grain boundary/edge defects, both of which will facilitate the defect engineering in TMD materials for high speed opto-electronics.

cond-mat.mtrl-sci↗

arXiv2017

Carrier Trapping by Oxygen Impurities in Molybdenum Diselenide

Understanding defect effect on carrier dynamics is essential for both fundamental physics and potential applications of transition metal dichalcogenides. Here, the phenomenon of oxygen impurities trapping photo-excited carriers has been studied with ultrafast pump-probe spectroscopy. Oxygen impurities are intentionally created in exfoliated multilayer MoSe2 with Ar+ plasma irradiation and air exposure. After plasma treatment, the signal of transient absorption first increases and then decreases, which is a signature of defect capturing carriers. With larger density of oxygen defects, the trapping effect becomes more prominent. The trapping defect densities are estimated from the transient absorption signal, and its increasing trend in the longer-irradiated sample agrees with the results from X-ray photoelectron spectroscopy. First principle calculations with density functional theory reveal that oxygen atoms occupying Mo vacancies create mid-gap defect states, which are responsible for the carrier trapping. Our findings shed light on the important role of oxygen defects as carrier trappers in transition metal dichalcogenides, and facilitates defect engineering in relevant material and device applications.

cond-mat.mtrl-sci↗

arXiv2017

Versatile Large-Area Custom-Feature van der Waals Epitaxy of Topological Insulators

As the focus of applied research in topological insulators (TI) evolves, the need to synthesize large-area TI films for practical device applications takes center stage. However, constructing scalable and adaptable processes for high-quality TI compounds remains a challenge. To this end, a versatile van der Waals epitaxy (vdWE) process for custom-feature Bismuth Telluro-Sulfide TI growth and fabrication is presented, achieved through selective-area fluorination and modification of surface free-energy on mica. The TI features grow epitaxially in large single-crystal trigonal domains, exhibiting armchair or zigzag crystalline edges highly oriented with the underlying mica lattice and only two preferred domain orientations mirrored at $180^\circ$. As-grown feature thickness dependence on lateral dimensions and denuded zones at boundaries are observed, as explained by a semi-empirical two-species surface migration model with robust estimates of growth parameters and elucidating the role of selective-area surface modification. Topological surface states contribute up to 60% of device conductance at room-temperature, indicating excellent electronic quality. High-yield microfabrication and the adaptable vdWE growth mechanism with readily alterable precursor and substrate combinations, lend the process versatility to realize crystalline TI synthesis in arbitrary shapes and arrays suitable for facile integration with processes ranging from rapid prototyping to scalable manufacturing.

cond-mat.mes-hall↗

arXiv2017

Angular dependence of magnetization reversal in epitaxial chromium telluride thin films with perpendicular magnetic anisotropy

We investigate magnetic anisotropy and magnetization reversal mechanism in chromium telluride thin films grown by molecular beam epitaxy. We report existence of strong perpendicular anisotropy in these thin films, along with a relatively strong second order anisotropy contribution. The angular variation of the switching field observed from the magnetoresistance measurement is explained quantitatively using a one-dimensional defect model. The model reveals the relative roles of nucleation and pinning in the magnetization reversal, depending on the applied field orientation. Micromagnetic simulations are performed to visualize the domain structure and switching process.

cond-mat.mes-hall↗

arXiv2017

Intra-Domain Periodic Defects in Monolayer MoS$_2$

We present an ultra-high vacuum scanning tunneling microscopy (STM) study of structural defects in molybdenum disulfide thin films grown on silicon substrates by chemical vapor deposition. A distinctive type of grain boundary periodically arranged inside an isolated triangular domain, along with other inter-domain grain boundaries of various types, is observed. These periodic defects, about 50 nm apart and a few nanometers in width, remain hidden in optical or low-resolution microscopy studies. We report a complex growth mechanism that produces 2D nucleation and spiral growth features that can explain the topography in our films.

cond-mat.mtrl-sci↗

arXiv2017

Detection of current induced spin polarization in epitaxial Bi$_2$Te$_3$ thin film

We electrically detect charge current induced spin polarization on the surface of molecular beam epitaxy grown Bi$_2$Te$_3$ thin film in a two-terminal device with a ferromagnetic MgO/Fe and a nonmagnetic Ti/Au contact. The two-point resistance, measured in an applied magnetic field, shows a hysteresis tracking the magnetization of the Fe. A theoretical estimate is obtained for the change in resistance on reversing the magnetization direction of Fe from coupled spin-charge transport equations based on quantum kinetic theory. The order of magnitude and the sign of the hysteresis is consistent with spin-polarized surface state of Bi$_2$Te$_3$.

cond-mat.mes-hall↗

arXiv2017

High density nonmagnetic cobalt in thin films

Recently high density (HD) nonmagnetic (NM) cobalt has been discovered in a cobalt thin film, grown on Si(111). This cobalt film had a natural cobalt oxide at the top. The oxide layer forms when the film is taken out of the electron-beam deposition chamber and exposed to air. Thin HD NM cobalt layers were found near the cobalt/silicon and the cobalt-oxide/cobalt interfaces, while the thicker mid-depth region of the film was hcp cobalt with normal density and normal magnetic moment. If an ultrathin film of gold is grown on the cobalt layer, before exposing it to air, the oxidation of the cobalt surface layer is prevented. It is important to investigate whether the growth of HD NM cobalt layers in the thin film depends on (i) capping of the film by the gold layer, (ii) the film thickness and (iii) the nature of the substrate. The results of such investigations, presented here, indicates that for cobalt films capped with a thin gold layer, and for various film thicknesses, HD NM cobalt layers are still observed. However, instead of a Si substrate, when the cobalt films are grown on oxide substrates, such as silicon oxide or cobalt oxide, HD NM cobalt layers are not observed.

cond-mat.mtrl-sci↗

arXiv2016

Air Stable Doping and Intrinsic Mobility Enhancement in Monolayer $MoS_{2}$ by Amorphous $TiO_{x}$ Encapsulation

To reduce Schottky-barrier-induced contact and access resistance, and the impact of charged impurity and phonon scattering on mobility in devices based on 2D transition metal dichalcogenides (TMDs), considerable effort has been put into exploring various doping techniques and dielectric engineering using $high-κ$ oxides, respectively. The goal of this work is to demonstrate a $high-κ$ dielectric that serves as an effective n-type charge transfer dopant on monolayer (ML) molybdenum disulfide ($MoS_{2}$). Utilizing amorphous titanium suboxide (ATO) as the '$high-κ$ dopant', we achieved a contact resistance of ~ $180$ $Ω.μm$ which is the lowest reported value for ML $MoS_{2}$. An ON current as high as $240$ $μA/μm$ and field effect mobility as high as $83$ $cm^2/V-s$ were realized using this doping technique. Moreover, intrinsic mobility as high as $102$ $cm^2/V-s$ at $300$ $K$ and $501$ $cm^2/V-s$ at $77$ $K$ were achieved after ATO encapsulation which are among the highest mobility values reported on ML $MoS_{2}$. We also analyzed the doping effect of ATO films on ML $MoS_{2}$, a phenomenon which is absent when stoichiometric $TiO_{2}$ is used, using ab initio density functional theory (DFT) calculations which shows excellent agreement with our experimental findings. Based on the interfacial-oxygen-vacancy mediated doping as seen in the case of $high-κ$ ATO - ML $MoS_{2}$, we propose a mechanism for the mobility enhancement effect observed in TMD-based devices after encapsulation in a $high-κ$ dielectric environment.

cond-mat.mes-hall↗

arXiv2016

A sub-1-volt analog metal oxide memristive-based synaptic device for energy-efficient spike-based computing systems

Nanoscale metal oxide memristors have potential in the development of brain-inspired computing systems that are scalable and efficient1-3. In such systems, memristors represent the native electronic analogues of the biological synapses. However, the characteristics of the existing memristors do not fully support the key requirements of synaptic connections: high density, adjustable weight, and low energy operation. Here we show a bilayer memristor that is forming-free, low-voltage (~|0.8V|), energy-efficient (full On/Off switching at ~2pJ), and reliable. Furthermore, pulse measurements reveal the analog nature of the memristive device, that is it can be directly programmed to intermediate resistance states. Leveraging this finding, we demonstrate spike-timing-dependent plasticity (STDP), a spike-based Hebbian learning rule4. In those experiments, the memristor exhibits a marked change in the normalized synaptic strength (>30 times) when the pre- and post-synaptic neural spikes overlap. This demonstration is an important step towards the physical construction of high density and high connectivity neural networks.

cond-mat.mes-hall↗

arXiv2016

Structural and Electrical Properties of MoTe$_2$ and MoSe$_2$ Grown by Molecular Beam Epitaxy

We demonstrate the growth of thin films of molybdenum ditelluride and molybdenum diselenide on sapphire substrates by molecular beam epitaxy. In-situ structural and chemical analyses reveal stoichiometric layered film growth with atomically smooth surface morphologies. Film growth along the (001) direction is confirmed by X-ray diffraction, and the crystalline nature of growth in the 2H phase is evident from Raman spectroscopy. Transmission electron microscopy is used to confirm the layered film structure and hexagonal arrangement of surface atoms. Temperature dependent electrical measurements show an insulating behavior which agrees well with a two-dimensional variable-range hopping model, suggesting that transport in these films is dominated by localized charge-carrier states.

cond-mat.mtrl-sci↗

arXiv2015

Perpendicular magnetic anisotropy and spin glass-like behavior in molecular beam epitaxy grown chromium telluride thin films

Reflection high energy electron diffraction (RHEED), scanning tunneling microscopy (STM), vibrating sample magnetometry and other physical property measurements are used to investigate the structure, morphology, magnetic and magneto-transport properties of (001)-oriented Cr$_2$Te$_3$ thin films grown on Al$_2$O$_3$(0001) and Si(111)-(7$\times$7) surfaces by molecular beam epitaxy (MBE). Streaky RHEED patterns indicate flat smooth film growth on both substrates. STM studies show the hexagonal arrangements of surface atoms. Determination of the lattice parameter from atomically resolved STM image is consistent with the bulk crystal structures. Magnetic measurements show the film is ferromagnetic having the Curie temperature of about 180 K, and a spin glass-like behavior was observed below 35 K. Magneto-transport measurements show the metallic nature of the film with a perpendicular magnetic anisotropy along the $c$-axis.

cond-mat.mtrl-sci↗