arXiv subjects

B. N. Dev

Publications and source records attributed to B. N. Dev.

30 records · Page 2Linked to original sources

arXiv2010

Growth of epitaxially oriented Ag nanoislands on air-oxidized Si(111)-(7x7) surfaces: Influence of short range order on the substrate

Clean Si(111)-(7{x7) surfaces, followed by air-exposure, have been investigated by reflection high energy electron diffraction (RHEED) and scanning tunneling microscopy (STM). Fourier transforms (FTs) of STM images show the presence of short range (7x7) order on the air-oxidized surface. Comparison with FTs of STM images from a clean Si(111)-(7x7) surface shows that only the 1/7th order spots are present on the air-oxidized surface. The oxide layer is ~ 2-3 nm thick, as revealed by cross-sectional transmission electron microscopy (XTEM). Growth of Ag islands on these air-oxidized Si(111)-(7x7) surfaces has been investigated by in-situ RHEED and STM and ex-situ XTEM and scanning electron microscopy. Ag deposition at room temperature leads to the growth of randomly oriented Ag islands while preferred orientation evolves when Ag is deposited at higher substrate temperatures. For deposition at 550°C face centered cubic Ag nanoislands grow with a predominant epitaxial orientation [1 -1 0]Ag || [1 -1 0]Si, (111)Ag || (111)Si along with its twin [-1 1 0]Ag || [1 -1 0]Si, (111)Ag || (111)Si, as observed for epitaxial growth of Ag on Si(111) surfaces. The twins are thus rotated by a 180° rotation of the Ag unit cell about the Si [111] axis. It is intriguing that Ag nanoislands follow an epitaxial relationship with the Si(111) substrate in spite of the presence of a 2-3 nm thick oxide layer between Ag and Si. Apparently the short range order on the oxide surface influences the crystallographic orientation of the Ag nanoislands.

cond-mat.other↗

arXiv2005

Magnetism in C60 Films Induced by Proton Irradiation

It is shown that polycrystalline fullerene thin films on hydrogen passivated Si(111) substrates irradiated by 2 MeV protons displays ferromagnetic-like behavior at 5 K. At 300 K both the pristine and the irradiated film show diamagnetic behavior. Magnetization data in the temperature range 2 - 300 K, in 1 Tesla applied field, for the irradiated film shows much stronger temperature dependence compared to the pristine film. Possible origin of ferromagnetic-like signals in the irradiated films are discussed.

cond-mat.mtrl-sci↗

arXiv2005

Size distribution of sputtered particles from Au nanoislands due to MeV self-ion bombardment

Nanoisland gold films, deposited by vacuum evaporation of gold onto Si(100) substrates, were irradiated with 1.5 MeV Au$^{2+}$ ions up to a fluence of $5\times 10^{14}$ ions cm$^{-2}$ and at incidence angles up to $60^{\circ}$ with respect to the surface normal. The sputtered particles were collected on carbon coated grids (catcher grid) during ion irradiation and were analyzed with transmission electron microscopy and Rutherford backscattering spectrometry. The average sputtered particle size and the areal coverage are determined from transmission electron microscopy measurements, whereas the amount of gold on the substrate is found by Rutherford backscattering spectrometry. The size distributions of larger particles (number of atoms/particle, $n$ $\ge$ 1,000) show an inverse power-law with an exponent of $\sim$ -1 in broad agreement with a molecular dynamics simulation of ion impact on cluster targets.

cond-mat.mtrl-sci↗

arXiv2005

Ion Irradiation Induced Effects in Metal Nanostructures

High resolution transmission electron microscopy (HRTEM) and Rutherford backscattering spectrometry (RBS) are used to study the ion induced effects in Au, Ag nanostructures grown on Si and thermally grown SiO2 substrates. Au and Ag films (~2 nm) are prepared by thermal evaporation under high vacuum condition at room temperature (RT). These films were irradiated with MeV Au ions also at RT. Very thin films of Au and Ag deposited on silicon substrates (with native oxide) form isolated nano-island structures due to the non-wetting nature of Au and Ag. Ion irradiation causes embedding of these nanoislands into the substrate. For Ag nanoislands with diameter 15 - 45 nm, the depth of the embedding increases with ion fluence and the nano particles are fully submerged into Si and SiO$_2$ substrate at a fluence of 5*10^14 ions /cm^2 without any mixing. Au nanoparticles (diameter 6 - 20 nm), upon ion irradiation, forms embedded gold-silicide in the case of Si substrate and show lack of mixing and silicide formation in the case of SiO2 substrate system.

cond-mat.mtrl-sci↗

arXiv2005

Energy dependent sputtering of nano-clusters from a nanodisperse target and embedding of nanoparticles into a substrate

Au nanoparticles, prepared by thermal evaporation under high vacuum condition on Si substrate, are irradiated with Au ions at different ion energies. During ion irradiation, embedding of nanoparticles as well as ejection of nano-clusters is observed. Ejected particles (usually smaller than those on the Si substrate) due to sputtering are collected on carbon-coated transmission electron microscopy (TEM) grids. Both the TEM grids and the ion-irradiated samples are analyzed with TEM. Unirradiated as well as irradiated samples are also analyzed by Rutherford backscattering spectrometry (RBS). In the case of low energy (32 keV) ions, where the nuclear energy loss is dominant, both sputtering and embedding are less compared to medium energy (1.5 MeV). In the high energy regime (100 MeV), where the electronic energy loss is dominant, sputtering is maximum but practically there is no embedding. Ion bombardment of surfaces at an angle with respect to the surface-normal produces enhanced embedding compared to normal-incidence bombardment. The depth of embedding increases with larger angle of incidence. Au nanoparticles after ion irradiation form embedded gold-silicide. Size distribution of the sputtered Au clusters on the TEM grids for different ion energy regimes are presented.

cond-mat.mtrl-sci↗

arXiv2005

Ion-beam induced 1D to 3D periodic transformation in nanostructured multilayers

Ion-irradiation-induced modifications of a periodic Pt/C multilayer system containing Fe impurity have been analyzed by transmission electron microscopy (TEM). The multilayer stack with 16 Pt/C layer pairs (period 4.23 nm) was fabricated on a glass substrate. A 2 MeV Au$^{2+}$ ion beam was rastered on the sample to obtain uniformly irradiated strips with fluences from 1$\times10^{14}$ to 1$\times10^{15}$ $ions/cm^2$. Ion-irradiation has been found to cause preferential migration of Fe towards Pt layers [Nucl. Instr. Methods Phys. Res. B212 (2003) 530]. Cross-sectional transmission electron microscopy (XTEM) shows considerable atomic redistribution for irradiation at the highest ion fluence (1$\times10^{15}$ $ions/cm^2$). Individual entities in this structure is like a cluster. Periodic multilayers have periodicity only in the direction normal to the multilayer surface. However, Fourier transform of the XTEM images of the sample irradiated at the highest-fluence shows new off-normal Fourier components of superlattice periodicities arising due to ion irradiation. With a proper understanding of this phenomenon it may be possible to fabricate three dimensional periodic structures of nanoclusters.

cond-mat.mtrl-sci↗

arXiv2005

Replicating Nanostructures on Silicon by Low Energy Ion Beams

We report on a nanoscale patterning method on Si substrates using self-assembled metal islands and low-energy ion-beam irradiation. The Si nanostructures produced on the Si substrate have a one-to-one correspondence with the self-assembled metal (Ag, Au, Pt) nanoislands initially grown on the substrate. The surface morphology and the structure of the irradiated surface were studied by high-resolution transmission electron microscopy (HRTEM). TEM images of ion-beam irradiated samples show the formation of sawtooth-like structures on Si. Removing metal islands and the ion-beam induced amorphous Si by etching, we obtain a crystalline nanostructure of Si. The smallest structures emit red light when exposed to a UV light. The size of the nanostructures on Si is governed by the size of the self-assembled metal nanoparticles grown on the substrate for this replica nanopatterning. The method can easily be extended for tuning the size of the Si nanostructures by the proper choice of the metal nanoparticles and the ion energy in ion-irradiation. It is suggested that off-normal irradiation can also be used for tuning the size of the nanostructures.

cond-mat.mtrl-sci↗

arXiv2004

Ge growth on ion-irradiated Si self-affine fractal surfaces

We have carried out scanning tunneling microscopy experiments under ultrahigh vacuum condition to study the morphology of ultrathin Ge films eposited on pristine Si(100) and ion-irradiated Si(100) self-affine fractal surfaces. The pristine and the ion-irradiated Si(100) surface have roughness exponents of alpha=0.19+/-0.05 and alpha=0.82+/-0.04 respectively. These measurements were carried out on two halves of the same sample where only one half was ion-irradiated. Following deposition of a thin film of Ge (~6 A) the roughness exponents change to 0.11+/-0.04 and 0.99+/-0.06, respectively. Upon Ge deposition, while the roughness increases by more than an order of magnitude on the pristine surface, a smoothing is observed for the ion-irradiated surface. For the ion-irradiated surface the correlation length xi increases from 32 nm to 137 nm upon Ge deposition. Ge grows on Si surfaces in the Stranski-Krastanov or layer-plus-island mode where islands grow on a wetting layer of about three atomic layers. On the pristine surface the islands are predominantly of square or rectangular shape, while on the ion-irradiated surface the islands are nearly diamond shaped. Changes of adsorption behaviour of deposited atoms depending on the roughness exponent (or the fractal dimension) of the substrate surface are discussed.

cond-mat.mtrl-sci↗

arXiv2003

Height preference and strain in Ag islands on Si(111)-(7x7)

Growth and strain behavior of thin Ag films on Si substrate have been investigated by scanning tunneling microscopy, cross-sectional transmission electron microscopy and high resolution x-ray diffraction studies. Ag islands formed on Si at room temperature growth show strongly preferred heights and flat top. At low coverage, islands containing two atomic layers of Ag are overwhelmingly formed. At higher coverages island height distribution shows strong peaks at relative heights corresponding to an even number of Ag atomic layers. This appears to be a quantum size effect. Hexagonal disc-like islands with flat top are formed upon annealing. The annealed film shows two closely-spaced Ag(111) diffraction peaks - one weak and broad and the other narrow and more intense. The intense peak corresponds to a shorter Ag(111) planar spacing compared to the bulk value. This can be explained in terms of changes in the Ag lattice during the heating-cooling cycle due to thermal expansion coefficient mismatch between Ag and Si.

cond-mat.mtrl-sci↗

arXiv2002

Nanoscale self-affine surface smoothing by ion bombardment

Topography of silicon surfaces irradiated by a 2 MeV Si$^+$ ion beam at normal incidence and ion fluences in the range $10^{15}-10^{16}$ ions/cm$^{2}$ has been investigated using scanning tunneling microscopy. At length scales below $\sim$~50 nm, surface smoothing is observed; the smoothing is more prominent at smaller length scales. The smoothed surface is self-affine with a scaling exponent $α=0.53\pm0.02$.

cond-mat.mtrl-sci↗

arXiv2001

X-ray standing wave and reflectometric characterization of multilayer structures

Microstructural characterization of synthetic periodic multilayers by x-ray standing waves have been presented. It has been shown that the analysis of multilayers by combined x-ray reflectometry (XRR) and x-ray standing wave (XSW) techniques can overcome the deficiencies of the individual techniques in microstructural analysis. While interface roughnesses are more accurately determined by the XRR technique, layer composition is more accurately determined by the XSW technique where an element is directly identified by its characteristic emission. These aspects have been explained with an example of a 20 period Pt/C multilayer. The composition of the C-layers due to Pt dissolution in the C-layers, Pt$_{x}$C$_{1-x}$, has been determined by the XSW technique. In the XSW analysis when the whole amount of Pt present in the C-layers is assumed to be within the broadened interface, it l eads to larger interface roughness values, inconsistent with those determined by the XRR technique. Constraining the interface roughness values to those determined by the XRR technique, requires an additional amount of dissolved Pt in the C-layers to expl ain the Pt fluorescence yield excited by the standing wave field. This analysis provides the average composition Pt$_{x}$C$_{1-x}$ of the C-layers .

cond-mat.mtrl-sci↗

arXiv1994

Shape Transition in the Epitaxial Growth of Gold Silicide in Au Thin Films on Si(111)

Growth of epitaxial gold silicide islands on bromine-passivated Si(111) substrates has been studied by optical and electron microscopy, electron probe micro analysis and helium ion backscattering. The islands grow in the shape of equilateral triangles up to a critical size beyond which the symmetry of the structure is broken, resulting in a shape transition from triangle to trapezoid. The island edges are aligned along $Si[110]$ directions. We have observed elongated islands with aspect ratios as large as 8:1. These islands, instead of growing along three equivalent [110] directions on the Si(111) substrate, grow only along one preferential direction. This has been attributed to the vicinality of the substrate surface.

cond-mat↗