Fabricacion de un magnetron sputtering para deposito de peliculas nanometricas magneticas
This paper presents the development of scientific instrumentation for the fabrication of ferromagnetic thin films, by sputtering technique, for the use of 2-inch-diameter targets. Thin films were deposited using Permalloy alloy (Ni80Fe20) as ferromagnetic material at room temperature on Si (001) substrates. The film thicknesses were measured with profilometry and a deposition rate for this alloy of 16.2 nm/min was calculated. Scanning electron microscopy showed a continuous film formation and a chemical composition similar to the target
physics.ins-det↗