arXiv subjects

Chloe Leblanc

Publications and source records attributed to Chloe Leblanc.

11 recordsLinked to original sources

arXiv2026

Compositional gradient engineering for enhanced ferroelectricity in ultrathin AlScN

Ferroelectric AlScN is promising for CMOS-compatible non-volatile memory, but thickness scaling is limited by leakage, premature breakdown, and defect-mediated failure. Here we show that compositional grading within a continuous wurtzite AlN-AlScN lattice mitigates these limitations by distributing structural and polarization discontinuities across the film thickness, reducing defect formation and local field concentration. In a 20 nm graded heterostructure, monotonic Sc incorporation and AlN-rich boundaries produce reversible ferroelectric switching, an as-grown metal-polar state, a 21% higher breakdown field, 10% enhanced remanent polarization, and 40x higher resistivity relative to homogeneous AlScN. Time-domain PUND measurements reveal strongly suppressed post-switching leakage, consistent with reduced defect-assisted and polarization-coupled conduction. This improved dielectric robustness enables ferroelectric functionality in 5 nm graded stacks containing only a 2 nm $\mathrm{Al}_{0.64}\mathrm{Sc}_{0.36}\mathrm{N}$ region, with measurable switching near 1 V. These results establish compositional grading as a defect- and field-management strategy for scalable ultrathin wurtzite ferroelectrics.

cond-mat.mtrl-sci↗

arXiv2026

Controlled non-volatile modulation of optical dispersion in monolayer tungsten disulfide via ferroelectric polarization patterning

The manipulation of optical properties, including reflection, refraction, polarization, phase, and frequency, has long been central to advancing photonic and optoelectronic technologies. However, existing electro-optical approaches rely on volatile mechanisms that require continuous power consumption. Here, we demonstrate strong, nonvolatile modulation of optical dispersion in monolayer tungsten disulfide (ML WS2) using patterned ferroelectric domains in aluminum scandium nitride (AlScN). By locally poling ferroelectric domains into opposite states, we achieve substantial manipulation of the complex refractive index (Delta n > 0.7, Delta k > 0.4) and excitonic energy shifts (~50 meV) in ML WS2, comparable to previous gate-tuning approaches while eliminating continuous power consumption. We introduce an asymmetric screening model that reveals how ferroelectric polarization induces carrier-density-dependent Coulomb screening, leading to distinct excitonic behaviors between electron- and hole-doped regions. Furthermore, we demonstrate a gate-free lateral p-n homojunction with a rectification ratio of 6e10^3, formed through spatial carrier redistribution. These findings establish ferroelectric/2D heterostructures as a powerful platform for nonvolatile optical dispersion engineering, enabling energy-efficient, reconfigurable photonic and optoelectronic devices.

physics.optics↗

arXiv2025

Hydrazine-Free Precursor for Solution-Processed All-Inorganic Se and Se1-xTex Photovoltaics

Selenium (Se) has reemerged as a promising absorber material for indoor and tandem photovoltaics (PVs), and its alloys with Te (Se1-xTex) offer a widely tunable bandgap. Solution processing of this materials system offers a route to low-cost fabrication. However, solution processing of Se has, thus far, only used hydrazine, which is an extremely hazardous solvent. In this work, we prepare and isolate propylammonium poly-Se and poly-Se-Te precursors from a safer thiol-amine solvent system. We formulate molecular inks by dissolving the precursor n,n-dimethylformamide (DMF) with a monoethanolamine (EA) additive and process high-quality Se and Se1-xTex films with bandgaps ranging from 1.20 eV to 1.86 eV. We fabricate PVs from these films using TiO2 and MoO3 charge transport layers (CTLs) to achieve power conversion efficiencies as high as 2.73% for Se and 2.33% for Se0.7Te0.3 under solar simulation. Se devices show excellent stability with no degradation after 1 month in air, enabled by the excellent stability of Se and the use of inorganic CTLs. This work represents an important step towards low-cost solution-phase processing of Se and Se1-xTex alloys for PVs and photodetectors with low toxicity and high bandgap tunability.

cond-mat.mtrl-sci↗

arXiv2025

Demonstration of highly scaled AlScN ferroelectric diode memory with storage density > 100 Mbit/mm$^2$

Wurtzite nitride ferroelectric materials have emerged as promising candidates for next-generation memory applications due to their exceptional polarization properties and compatibility with conventional semiconductor processing techniques. Here, we demonstrate the first successful areal scaling of Aluminum Scandium Nitride (AlScN) ferroelectric diode (FeDiode) memory down to 40 nm device diameters while maintaining ON/OFF > 60. Using a 20 nm thick Al0.64Sc0.36N ferroelectric layer, we evaluate both metal-insulator-ferroelectric-metal (MIFM) and metal-ferroelectric-metal (MFM) architectures for scaled resistive memory devices. Our scaled devices exhibit an enhanced breakdown-to-coercive field ratio exceeding 2.6 due to increased breakdown field. The MIFM devices demonstrate stable 3-bit non-volatile multistate behavior with clearly distinguishable resistance states and retention exceeding 4*10^4 seconds at 85 C. By achieving more than a million-fold areal scaling with enhanced performance metrics, this work establishes AlScN-based FeDiode memory as a highly promising platform for non-volatile storage with potential for direct integration into CMOS technology.

cond-mat.mes-hall↗

arXiv2025

Write Cycling Endurance Exceeding 1010 in Sub-50 nm Ferroelectric AlScN

Wurtzite ferroelectrics, particularly aluminum scandium nitride (AlScN), have emerged as a promising materials platform for nonvolatile memories, offering high polarization values exceeding 100 uC/cm2. However, their high coercive fields (>3 MV/cm) have limited cycling endurance to ~107 cycles in previous reports. Here, we demonstrate unprecedented control of polarization switching in AlScN, achieving write cycling endurance exceeding 1010 cycles a thousand fold improvement over previous wurtzite ferroelectric benchmarks. Through precise voltage modulation in 45 nm thick Al0.64Sc0.36N capacitors, we show that while complete polarization reversal (2Pr ~ 200 uC/cm2) sustains ~108 cycles, partial switching extends endurance beyond 1010 cycles while maintaining a substantial polarization (>30 uC/cm2 for 2Pr). This exceptional endurance, combined with breakdown fields approaching 10 MV/cm in optimized 10 um diameter devices, represents the highest reported values for any wurtzite ferroelectric. Our findings establish a new paradigm for reliability in nitride ferroelectrics, demonstrating that controlled partial polarization and size scaling enables both high endurance and energy efficient operation.

cond-mat.mtrl-sci↗

arXiv2025

Low-voltage Ferroelectric Field-Effect Transistors with Ultrathin Aluminum Scandium Nitride and 2D channels

The continued evolution of CMOS technology demands materials and architectures that emphasize low power consumption, particularly for computations involving large scale data processing and multivariable optimization. Ferroelectric materials offer promising solutions through enabling dual-purpose memory units capable of performing both storage and logic operations. In this study, we demonstrate ferroelectric field effect transistors (FeFETs) with MoS2 monolayer channels fabricated on ultrathin 5 nm and 10 nm ferroelectric Aluminum Scandium Nitride (AlScN) films. By decreasing the thickness of the ferroelectric film, we achieve significantly reduced gate voltages (<3V) required to switch the conductance of the devices, enabling operation at low voltages compatible with advanced CMOS. We observe a characteristic crossover in hysteresis behavior that varies with film thickness, channel fabrication method, and environmental conditions. Through systematic investigation of multiple parameters including channel fabrication methods, dimensional scaling, and environmental effects, we provide pathways to improve device performance. While our devices demonstrate clear ferroelectric switching behavior, further optimization is required to enhance the ON/OFF ratio at zero gate voltage while continuing to reduce the coercive field of these ultrathin films.

physics.app-ph↗

arXiv2024

2D ferroelectrics and ferroelectrics with 2D: materials and device prospects

Ferroelectric and two-dimensional materials are both heavily investigated classes of electronic materials. This is unsurprising since they both have superlative fundamental properties and high-value applications in computing, sensing etc. In this Perspective, we investigate the research topics where 2D semiconductors and ferroelectric materials both in 2D or 3D form come together. 2D semiconductors have unique attributes due to their van der Waals nature that permits their facile integration with any other electronic or optical materials. In addition, the emergence of ferroelectricity in 2D monolayers, multilayers, and artificial structures offers further advantages since traditionally ferroelectricity has been difficult to achieve in extremely thickness scaled materials. In this perspective, we elaborate on the applications of 2D materials + ferroelectricity in non-volatile memory devices highlighting their potential for in-memory computing, neuromorphic computing, optoelectronics, and spintronics. We also suggest the challenges posed by both ferroelectrics and 2D materials, including material/device preparation, and reliable characterizations to drive further investigations at the interface of these important classes of electronic materials.

physics.app-ph↗

arXiv2023

Near 6 GHz Sezawa Mode Surface Acoustic Wave Resonators using AlScN on SiC

Surface Acoustic Wave (SAW) devices featuring Aluminum Scandium Nitride (AlScN) on a 4H-Silicon Carbide (SiC) substrate, offer a unique blend of high sound velocity, low thermal resistance, substantial piezoelectric response, simplified fabrication, as well as suitability for high-temperature and harsh environment operation. This study presents high-frequency SAW resonators employing AlScN thin films on SiC substrates, utilizing the second SAW mode (referred to as the Sezawa mode). The resonators achieve remarkable performance, boasting a K2 value of 5.5% and a maximum Q-factor (Qmax) of 1048 at 4.7 GHz, outperforming previous benchmarks. Additionally, a SAW resonator with a 960 nm wavelength attains 5.9 GHz frequency with record K2 (4.0%) and Qmax (887). Our study underscores the potential of the AlScN on SiC platform for advanced radio-frequency applications.

physics.app-ph↗

arXiv2021

2D Metal Selenide-Silicon Steep Sub-Threshold Heterojunction Triodes with High On-Current Density

Low power consumption in both static and dynamic modes of operation is a key requirement in modern, highly scaled nanoelectronics. Tunneling field-effect transistors (TFETs) that exploit direct band-to-band tunneling of charges and exhibit steep sub-threshold slope (SS) transfer characteristics are an attractive option in this regard. However, current generation of Si and III-V heterojunction based TFETs while suffer from low ON current density and ON/OFF current ratios for < 60 mV/dec operation. Semiconducting two-dimensional (2D) layers have recently renewed enthusiasm in novel device design for TFETs not only because of their atomically-thin bodies that favor superior electrostatic control but the same feature also favors higher ON current density and consequently high ON/OFF ratio. Here, we demonstrate gate-tunable heterojunction diodes (triodes) fabricated from InSe/Si 2D/3D van der Waals heterostructures, with a minimum subthreshold swing (SS) as low as 6.4 mV/dec and an SS average of 30 mV/dec over 4 decades of current. Further, the devices show a large current on/off ratio of approximately 10^6 and on-state current density of 0.3 uA/um at a drain bias of -1V. Our work opens new avenues for 2D semiconductors for 3D hetero-integration with Si to achieve ultra-low power logic devices.

physics.app-ph↗

arXiv2020

DER Information Unaware Coordination via Day-ahead Dynamic Power Bounds

Reliability and voltage quality in distribution networks have been achieved via a combination of transformer power rating satisfaction and voltage management asset control. To maintain reliable operation under this paradigm, however, future grids with deep DER penetrations would require costly equipment upgrades. These upgrades can be mitigated via judicious coordination of DER operation. Earlier work has assumed a hierarchical control architecture in which a global controller (GC) uses detailed power injection and DER data and knowledge of DER owners' objectives to determine setpoints that local controllers should follow in order to achieve reliable and cost effective grid operation. Having such data and assuming knowledge of DER owners' objectives, however, are often not desirable or possible. In an earlier work, a 2-layer DER coordination architecture was shown to achieve close to optimal performance despite infrequent communication to a global controller. Motivated by this work, this paper proposes a day-ahead coordination scheme that uses forecasted power profile ranges to generate day-ahead dynamic power rating bounds at each transformer. Novel features of this scheme include: (i) the GC knows only past node power injection data and does not impose or know DER owner objectives, (ii) we use bounds that ensure reliable operation to guide the local controllers rather than setpoint tracking, and (iii) we consider electric vehicle (EV) charging in addition to storage. Simulations using the IEEE 123-bus network show that with 50% solar, 50% EVs and 10% storage penetrations, the uncoordinated approach incurs rating violations at nearly all 86 transformers and results in 10 times higher voltage deviation, while our approach incurs only 12 rating violations and maintains almost the same voltage deviations as before the addition of solar and EVs.

eess.SY↗

arXiv2019

Molybdenum Trioxide Gates for Suppression of Leakage Current in InAlN/GaN HEMTs at 300°C

Because high electron mobility transistors (HEMTs) often exhibit significant gate leakage during high-temperature operation, the choice of Schottky metal is critical. Increased gate leakage and reduced ON/OFF ratio are unsuitable for the design of high-temperature electronics and integrated circuits. This paper presents high-temperature characteristics of depletion-mode molybdenum trioxide (MoO${_3}$)-gated InAlN/GaN-on-silicon HEMTs in air. After a room temperature oxidation of the Mo for 10 weeks, the leakage of the HEMT is reduced over 60 times compared to the as-deposited Mo. The use of MoO${_3}$ as the Schottky gate material enables low gate leakage, resulting in a high ON/OFF current ratio of 1.2 x 10${^8}$ at 25°C and 1.2 x 10${^5}$ at 300°C in air. At 400°C, gate control of the InAlN/GaN two-dimensional electron gas (2DEG) channel is lost and unrecoverable. Here, this permanent device failure is attributed to volatilization of the MoO${_3}$ gate due to the presence of water vapor in air. Passivation of the device with SiN enables operation up to 500°C, but also increases the leakage current. The suppression of gate leakage via Mo oxidation and resulting high ON/OFF ratio paves the way for viable high-temperature GaN-based electronics that can function beyond the thermal limit of silicon once proper passivation is achieved.

physics.app-ph↗