arXiv subjects

David M. Fryauf

Publications and source records attributed to David M. Fryauf.

2 recordsLinked to original sources

arXiv2021

Critical processing temperature for high performance protected silver thin film mirrors

Silver (Ag) mirrors for astronomical telescopes consist of multiple metallic and dielectric thin films. Furthermore, the topmost surface of such Ag mirrors needs to be covered by a protection coating. While the protection coating is often deposited at room temperature and the entire mirrors are also handled at room temperature, various thin film deposition techniques offer protection coatings with improved characteristics when carried out at elevated temperatures. Thus, in this work, high-performance Ag mirrors were designed and fabricated with a new benchmark. The resulting Ag mirrors were annealed (i.e., post-fabrication annealing) at various temperatures to investigate the viability of introducing thermal processes during and/or after fabrication in improving overall optical performance and durability of protected silver mirrors. In our experiments, Ag mirror samples were deposited by electron-beam evaporation and subsequently annealed at various temperatures in the range from 60 °C to 300 °C, and then the mirror samples underwent an environmental stress test at 80 °C and 80% humidity for 10 days. While all the mirror samples annealed below 200 °C showed negligible corrosion after undergoing the stress testing, those annealed below 160 °C presented spectral reflectivity comparable to or higher than that of as-deposited reference samples. In contrast, the mirror samples annealed above 200 °C exhibited significant degradation after the stress testing. The comprehensive analysis indicated that delamination and voids caused by the growth of Ag grains during the annealing are the primary mechanisms of the degradation.

astro-ph.IM↗

arXiv2019

Demonstration of Sputtering Atomic Layer Augmented Deposition (SALAD): Aluminum Oxide-Copper Dielectric-Metal Nanocomposite

Designing a thin film structure often begins with choosing a film deposition method that employs a specific primary process by which chemical species are formed and transported. In other words, a film deposition system in which two complementary deposition methods are hybridized should lead to new ways of designing thin film structures with structural complexity tailored at a level that has never been envisioned.This premise inspired us to uniquely combine atomic layer deposition (ALD) and magnetron sputtering (SPU) within a single deposition chamber; the combined film deposition system is referred to as sputtering atomic layer augmented deposition (SALAD). SALAD allows us to take full advantages of both ALDs precise and accurate precursor delivery and SPUs versatility in choices of chemical elements. A SALAD system was designed based on knowledge obtained by computational fluid dynamics with the goal of conceiving a film deposition system that satisfied deposition conditions distinctive for both ALD and SPU, and a prototype SALAD system was assembled by employing off-the-shelf vacuum components.A s a demonstration, the SALAD system was utilized to deposit a unique nanocomposite made of a stack of aluminum oxide thin films by ALD and copper thin films by SPU, AlOx-Cu dielectric-metal (ACDM) nanocomposite thin films, on Si and glass substrates. Spectroscopic reflectivity collected on ACDM nanocomposite thin films shows unique dispersion features to which conventional effective medium theories used for describing optical properties of composites made of a dielectric host that contains metallic inclusions do not seem to simply apply.

physics.app-ph↗