arXiv subjects

Fengbin Tian

Publications and source records attributed to Fengbin Tian.

5 recordsLinked to original sources

arXiv2024

Impact of the Top SiO2 Interlayer Thickness on Memory Window of Si Channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) Gate Structure

We study the impact of top SiO2 interlayer thickness on the memory window (MW) of Si channel ferroelectric field-effect transistor (FeFET) with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) gate structure. We find that the MW increases with the increasing thickness of the top SiO2 interlayer, and such an increase exhibits a two-stage linear dependence. The physical origin is the presence of the different interfacial charges trapped at the top SiO2/Hf0.5Zr0.5O2 interface. Moreover, we investigate the dependence of endurance characteristics on initial MW. We find that the endurance characteristic degrades with increasing the initial MW. By inserting a 3.4 nm SiO2 dielectric interlayer between the gate metal TiN and the ferroelectric Hf0.5Zr0.5O2, we achieve a MW of 6.3 V and retention over 10 years. Our work is helpful in the device design of FeFET.

cond-mat.mtrl-sci↗

arXiv2024

Impact of Top SiO2 interlayer Thickness on Memory Window of Si Channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) Gate Structure

We study the impact of top SiO2 interlayer thickness on memory window of Si channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) gate structure. The memory window increases with thicker top SiO2. We realize the memory window of 6.3 V for 3.4 nm top SiO2. Moreover, we find that the endurance characteristic degrades with increasing the initial memory window.

physics.app-ph↗

arXiv2022

First-principles study of oxygen vacancy defects in orthorhombic Hf$_{0.5}$Zr$_{0.5}$O$_2$/SiO$_2$/Si gate stack

The gate defect of the ferroelectric HfO$_2$-based Si field-effect transistor (Si FeFET) plays a dominant role in its reliability issue. The first-principles calculations are an effective method for the atomic-scale understanding of gate defects. However, the first-principles study on the defects of FeFET gate stacks, i.e., metal/orthorhombic-Hf$_{0.5}$Zr$_{0.5}$O$_2$/SiO$_2$/Si structure, has not been reported so far. The key challenge is the construction of metal/orthorhombic-Hf$_{0.5}$Zr$_{0.5}$O$_2$/SiO$_2$/Si gate stack models. Here, we use the Hf$_{0.5}$Zr$_{0.5}$O$_2$(130) high-index crystal face as the orthorhombic ferroelectric layer and construct a robust atomic structure of the orthorhombic-Hf$_{0.5}$Zr$_{0.5}$O$_2$/SiO$_2$/Si gate stack without any gap states. Its high structural stability is ascribed to the insulated interface. The calculated band offsets show that this gate structure is of the type-I band alignment. Furthermore, the formation energies and charge transition levels (CTLs) of defects reveal that the oxygen vacancy defects are more favorable to form compared with other defects such as oxygen interstitial and Hf/Zr vacancy, and their CTLs are mainly localized near the Si conduction band minimum and valence band maximum, in agreement with the reported experimental results. The oxygen vacancy defects are responsible for charge trapping/de-trapping behavior in Si FeFET. This work provides an insight into gate defects and paves the way to carry out the first-principles study of ferroelectric HfO$_2$-based Si FeFET.

cond-mat.mtrl-sci↗

arXiv2021

Impact of Interlayer and Ferroelectric Materials on Charge Trapping during Endurance Fatigue of FeFET with TiN/HfxZr1-xO2/interlayer/Si (MFIS) Gate Structure

We study the impact of different interlayers and ferroelectric materials on charge trapping during the endurance fatigue of Si FeFET with TiN/HfxZr1-xO2/interlayer/Si (MFIS) gate stack. We have fabricated FeFET devices with different interlayers (SiO2 or SiON) and HfxZr1-xO2 materials (x=0.75, 0.6, 0.5), and directly extracted the charge trapping during endurance fatigue. We find that: 1) The introduction of the N element in the interlayer suppresses charge trapping and defect generation, and improves the endurance characteristics. 2) As the spontaneous polarization (Ps) of the HfxZr1-xO2 decreases from 25.9 μC/cm2 (Hf0.5Zr0.5O2) to 20.3 μC/cm2 (Hf0.6Zr0.4O2), the charge trapping behavior decreases, resulting in the slow degradation rate of memory window (MW) during program/erase cycling; in addition, when the Ps further decreases to 8.1 μC/cm2 (Hf0.75Zr0.25O2), the initial MW nearly disappears (only ~0.02 V). Thus, the reduction of Ps could improve endurance characteristics. On the contract, it can also reduce the MW. Our work helps design the MFIS gate stack to improve endurance characteristics.

physics.app-ph↗

arXiv2021

Experimental Extraction and Simulation of Charge Trapping during Endurance of FeFET with TiN/HfZrO/SiO2/Si (MFIS) Gate Structure

We investigate the charge trapping during endurance fatigue of FeFET with TiN/Hf0.5Zr0.5O2/SiO2/Si (MFIS) gate structure. We propose a method of experimentally extracting the number of trapped charges during the memory operation, by measuring the charges in the metal gate and Si substrate. We verify that the amount of trapped charges increases during the endurance fatigue process. This is the first time that the trapped charges are directly experimentally extracted and verified to increase during endurance fatigue. Moreover, we model the interplay between the trapped charges and ferroelectric polarization switching during endurance fatigue. Through the consistency of experimental results and simulated data, we demonstrate that as the memory window decreases: 1) The ferroelectric characteristic of Hf0.5Zr0.5O2 is not degraded. 2) The trap density in the upper bandgap of the gate stacks increases. 3) The reason for memory window decrease is increased trapped electrons after program operation but not related to hole trapping/de-trapping. Our work is helpful to study the charge trapping behavior of FeFET and the related endurance fatigue process.

physics.app-ph↗