arXiv subjects

G. M. Zhidomirov

Publications and source records attributed to G. M. Zhidomirov.

3 recordsLinked to original sources

arXiv2020

Ni-doped epitaxial graphene monolayer on the Ni(111) surface

Nickel-doped graphene has been synthesized from propylene on a Ni(111) surface and studied using scanning tunneling microscopy (STM) and density functional theory (DFT). It is established that nickel centers are formed during graphene synthesis on the Ni(111) surface by both chemical vapor deposition (CVD) and temperature-programmed growth (TPG); apparently, they are always present in graphene synthesized on Ni(111). The centers are observed in STM images as single defects or defect chains and identified by DFT calculations as Ni atoms in carbon bivacancies. These nickel atoms are positively charged and may be of interest for single-atom catalysis. The incorporated Ni atoms should remain in graphene after the detachment from the substrate since they bound more strongly with carbon atoms in graphene than with substrate nickel atoms.

cond-mat.mtrl-sci↗

arXiv2020

Local removal of silicon layers on Si(100)-2x1 with chlorine-resist STM lithography

We report the realization of STM-based lithography with silicon layers removal on the chlorinated Si(100)-2x1 surface at 77 K. In contrast to other STM lithography studies, we were able to remove locally both chlorine and silicon atoms. Most of the etched pits have a lateral size of 10-20 A and a depth of 1-5 A. In the pits in which the STM image with atomic resolution is obtained, the bottom is mainly covered with chlorine. Some pits contain chlorine vacancies. Mechanisms of STM-induced removal of silicon and chlorine atoms on Si(100)-2x1-Cl are discussed and compared with the well-studied case of STM-induced hydrogen desorption on Si(100)-2x1-H. The results open up new possibilities of the three-dimensional local etching with STM lithography.

cond-mat.mes-hall↗

arXiv2019

Ab Initio Study of the Early Stage of Si Epitaxy on the Chlorinated Si(100) Surface

The homoepitaxial growth of Si on Si(100) covered by a resist mask is a necessary technological step for the fabrication of donor-based quantum devices with scanning tunneling microscope lithography. In the present work, the chlorine monolayer is selected as the resist. Using density functional theory, we investigated the adsorption of a single silicon atom on Si(100)-2$\times$1-Cl as the starting process of Si epitaxy. The incorporation of a silicon atom under a Cl monolayer proved to be the most energetically favorable process. Our results show that chlorine segregates on the surface during Si deposition and does not incorporate into homoepitaxial layers. In addition, we found that SiCl$_2^{\ast}$, SiCl$_3^{\ast}$, and SiCl$_4^{\ast}$ clusters can be formed above a Si(100)-2$\times$1-Cl surface while Si is adsorbed. SiCl$_2^{\ast}$ clusters are bound weakly to the substrate, and their desorption leaves the silicon surface free of chlorine. To check whether the Si epitaxy is possible on the chlorine resist, we compare our results with the well-studied case of a hydrogen resist. We find the two processes to be similar; moreover, epitaxy on chlorine resist appears to have an advantage.

physics.app-ph↗