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Hae-Jun Seok

Publications and source records attributed to Hae-Jun Seok.

2 recordsLinked to original sources

Stable AgBiS2 near-infrared absorbers for thin film tandem photovoltaics

AgBiS2 has rapidly risen in efficiency as single-junction photovoltaics (PVs), but its potential for tandem PVs is unexplored. Herein, we perform optical modeling based on the experimental absorption spectrum of AgBiS2, revealing that, as the NIR sub-cell, efficiencies exceeding 47.9% are achievable in triple-junction tandems, superseding tandems using Pb/Sn perovskite NIR cells (35.9%). However, fulfilling this potential requires overcoming the limited transport properties of AgBiS2 nanocrystal films, which constrains film thicknesses to only 30-50 nm, severely restricting NIR response. A solution-phase ligand exchange process is herein developed, allowing one-step deposition of passivated AgBiS2 nanocrystals that maintain efficient charge-carrier extraction despite an order of magnitude increase in film thickness. These films enable 24.0%-efficient four-terminal tandems with visible-light-absorbing lead-halide perovskite sub-cells, and monolithic tandems successfully demonstrating voltage addition. AgBiS2 PVs have high stability, retaining >90% of the original efficiency after 3 months of storage in dry air without encapsulation. This work establishes the significant potential of AgBiS2 as a stable and scalable NIR absorber for tandem PVs.

cond-mat.mtrl-sci↗

Rapid Atmospheric Vapor Deposition of H:In2O3 Transparent Conducting Oxide Thin Films

Transparent conducting oxides (TCOs) are essential for the optoelectronics industry, but there is a critical gap in cost-effective methods to rapidly deposit low sheet resistance, high transmittance films without damaging delicate materials, including emerging soft semiconductors like metal-halide perovskites. In this work, atmospheric pressure chemical vapor deposition (AP-CVD) is used to synthesise H:In2O3 films with 7.20+/-0.01 Ohm/sq sheet resistance (0.50+/-0.06 mOhm.cm resistivity) and transmittance up to 89% in the near-infrared (NIR), surpassing commercial sputter-deposited indium tin oxide. The growth rate is 40x higher than atomic layer deposition (ALD), and the AP-CVD films are fully processed under atmospheric conditions at only 140 C. Comparison of secondary ion mass spectrometry and time-of-flight elastic recoil detection analysis with changes in carrier concentration indicate that H dopants are introduced from the water oxidant. There is an increase in mobility form 40+/-10 cm2/Vs to 160+/-30 cm2/Vs when changing from O2 to H2O as the oxidant, which is attributed to H dopants passivating oxygen vacancies that act as carrier scattering centers. This work establishes AP-CVD as a promising method for manufacturing high figure-of-merit TCOs in a rapid, scalable and cost-effective manner, using mild growth conditions compatible with thermally-sensitive materials.

cond-mat.mtrl-sci↗