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arXiv · 2605.16166

Rapid Atmospheric Vapor Deposition of H:In2O3 Transparent Conducting Oxide Thin Films

Xiaoyu Guo·Hae-Jun Seok·Eilidh L. Quinn·Matthew K Sharpe·Callum. D. McAleese·Yi-Teng Huang·Xinjuan Li·Kexue Li·Chia-Yu Chang·Yongjie Wang·John O'Sullivan·Katie L. Moore·Caterina Ducati·Ruy Sebastian Bonilla·Han-Ki Kim·Abderrahime Sekkat·Robert L. Z. Hoye
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Abstract

Transparent conducting oxides (TCOs) are essential for the optoelectronics industry, but there is a critical gap in cost-effective methods to rapidly deposit low sheet resistance, high transmittance films without damaging delicate materials, including emerging soft semiconductors like metal-halide perovskites. In this work, atmospheric pressure chemical vapor deposition (AP-CVD) is used to synthesise H:In2O3 films with 7.20+/-0.01 Ohm/sq sheet resistance (0.50+/-0.06 mOhm.cm resistivity) and transmittance up to 89% in the near-infrared (NIR), surpassing commercial sputter-deposited indium tin oxide. The growth rate is 40x higher than atomic layer deposition (ALD), and the AP-CVD films are fully processed under atmospheric conditions at only 140 C. Comparison of secondary ion mass spectrometry and time-of-flight elastic recoil detection analysis with changes in carrier concentration indicate that H dopants are introduced from the water oxidant. There is an increase in mobility form 40+/-10 cm2/Vs to 160+/-30 cm2/Vs when changing from O2 to H2O as the oxidant, which is attributed to H dopants passivating oxygen vacancies that act as carrier scattering centers. This work establishes AP-CVD as a promising method for manufacturing high figure-of-merit TCOs in a rapid, scalable and cost-effective manner, using mild growth conditions compatible with thermally-sensitive materials.

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Xiaoyu Guo, Hae-Jun Seok, Eilidh L. Quinn, Matthew K Sharpe, Callum. D. McAleese, Yi-Teng Huang, Xinjuan Li, Kexue Li, Chia-Yu Chang, Yongjie Wang, John O'Sullivan, Katie L. Moore, Caterina Ducati, Ruy Sebastian Bonilla, Han-Ki Kim, Abderrahime Sekkat, Robert L. Z. Hoye. 2026-05-15. Rapid Atmospheric Vapor Deposition of H:In2O3 Transparent Conducting Oxide Thin Films. https://arxiv.org/abs/2605.16166

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