I. S. Abramov | Searcharxiv

arXiv2018

Extreme-ultraviolet light source for lithography based on an expanding jet of dense xenon plasma supported by microwaves

We discuss a concept of a point-like source of the extreme ultraviolet (EUV) light based on a non-equilibrium microwave discharge in expanding jet of dense xenon plasma with multiply charged ions. A conversion efficiency of microwave radiation to EUV light is calculated, and physical constraints, and opportunities for future devices are considered. Special attention is given to trapping of spontaneous line emission inside a radiating plasma spot that significantly influences the efficiency of EUV light source.

physics.plasm-ph↗

arXiv2018

Observation of extreme-ultraviolet light emission from an expanding plasma jet with multiply-charged argon or xenon ions

We report the first direct demonstration of possibility to generate the extreme ultraviolet (EUV) radiation with a freely expanding jet of dense plasma with multiply-charged ions supported by high-power microwaves. The detected emission power is about 20 W at 18--50 nm for argon and xenon and 0.3 W at 13--17 nm for xenon. The discharge with a peak electron density up to $3\times 10^{16}\,$cm$^{-3}$ and a characteristic size of $150\,μ$m is supported by a focused radiation of a recently developed gyrotron with unique characteristics, 250~kW output power at 250~GHz, operating in a relatively long (50$\,μ$s) pulse mode. Up-scaling of these experimental results gives grounds for development of a point-like kilowatt-level EUV source for a high-resolution lithography able to fulfill requirements of the microelectronics industry.

physics.plasm-ph↗