arXiv subjects

Johanna Huhtasaari

Publications and source records attributed to Johanna Huhtasaari.

3 recordsLinked to original sources

arXiv2025

Wafer-Scale Single-Crystalline Monolayer Graphene

Producing large-area single-crystalline graphene is key to realizing its full potential in advanced applications, including twistronics. Yet, controlling graphene growth kinetics to avoid grain boundaries or multilayer growth remains challenging. Here, we demonstrate single-crystalline graphene free from multilayer domains via one-step delamination of epitaxial graphene from silicon carbide (SiC). This is enabled by a specific surface reconstruction of 4H-SiC(0001) achieved in our growth conditions. High crystalline quality is confirmed by the observation of the half-integer quantum Hall effect -- the hallmark of monolayer graphene -- in near cm-sized crystals. The scalability of our process, explored with 4''-wafers, represents an advance toward large-scale integration of high-performance graphene applications.

cond-mat.mes-hall↗

arXiv2025

Quantum-Ready Microwave Detection with Scalable Graphene Bolometers in the Strong Localization Regime

Exploiting quantum interference of charge carriers, epitaxial graphene grown on silicon carbide emerges as a game-changing platform for ultra-sensitive bolometric sensing, featuring an intrinsic resistive thermometer response unmatched by any other graphene variant. By achieving low and uniform carrier densities, we have accessed a new regime of strong charge localization that dramatically reduces thermal conductance, significantly enhancing bolometer performance. Here we present scalable graphene-based bolometers engineered for detecting GHz-range photons, a frequency domain essential for superconducting quantum processors. Our devices deliver a state-of-the-art noise equivalent power of 40 zW$/\sqrt{\rm Hz}$ at $T=40~$mK, enabled by the steep temperature dependence of thermal conductance, $G_{\rm th}\sim T^4$ for $T<100~$mK. These results establish epitaxial graphene bolometers as versatile and low-back-action detectors, unlocking new possibilities for next-generation quantum processors and pioneering investigations into the thermodynamics and thermalization pathways of strongly entangled quantum systems.

cond-mat.mes-hall↗

arXiv2023

Scalable fabrication of edge contacts to 2D materials

We present a fabrication method for reliably and reproducibly forming electrical contacts to 2D materials, based on the tri-layer resist system. We demonstrate the applicability of this method for epitaxial graphene on silicon carbide (epigraphene) and the transition metal dichalcogenides (TMDCs) molybdenum disulfide ($MoS_2$). For epigraphene, the specific contact resistances are of the order of $ρ_c$ ~ $50$ $Ωμm$, and follow the Landauer quantum limit, $ρ_c \propto n^{-1/2}$, with $n$ being the carrier density of graphene. For $MoS_2$ flakes, our edge contacts enable field effect transistors (FET) with ON/OFF ratio of $> 10^6$ at room temperature ( $> 10^9$ at cryogenic temperatures). The fabrication route here demonstrated allows for contact metallization using thermal evaporation and also by sputtering, giving an additional flexibility when designing electrical interfaces, which is key in practical devices and when exploring the electrical properties of emerging materials.

cond-mat.mes-hall↗