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Jose Luis Enriquez-Carrejo

Publications and source records attributed to Jose Luis Enriquez-Carrejo.

2 recordsLinked to original sources

Role of lithium intercalation in fluorine-doped tin oxide thin films: Ab-initio calculations and experiment

Using a combination of experimental techniques and density functional theory (DFT) calculations, the influence of lithium insertion on the electronic and electrochemical properties of fluourine-doped SnO$_2$ (FTO) is assessed. For this purpose, we investigate the electrochromic behavior of commercial FTO electrode embedded in a solution of lithium perclorate (LiClO$_4$). The electrochromic properties are evaluated by UV-VIS spectroscopy, cyclic voltammetry, and chronoamperometry. These tests show that FTO exhibits electrochromism with a respectable coloration efficiency ($η=47.9$ cm$^2$/C @ 637 nm). DFT study indicates that lithium remains ionized in the lattice, raising the Fermi level about 0.7 eV deep into the conduction band. X-ray photoelectron spectroscopy (XPS) is used to study chemical bonding and oxidation states. XPS analysis of the Sn 3d core levels reveals that lithium insertion in FTO induces a shift of 350 meV in the Sn 3d states suggesting that lithium is incorporated into the SnO$_2$ lattice.

cond-mat.mtrl-sci↗

Effect of Ion Bombardment on the Chemical Properties of Crystalline Tantalum Pentoxide Films

The effect of argon ion bombardment on the chemical properties of crystalline Ta$_2$O$_5$ films grown on Si(100) substrates by radio frequency magnetron sputtering was investigated by X-ray photoelectron spectroscopy. All samples were irradiated for several time intervals [(0.5, 3, 6, 9) min] and the Ta $4f$ and O $1s$ core levels were measured each time. Upon analysis at the surface of the films, we observe the Ta $4f$ spectrum characteristic of Ta$_2$O$_5$. Irradiated samples exhibit the formation of Ta suboxides with oxidation states Ta$^{1+}$, Ta$^{2+}$, Ta$^{3+}$, Ta$^{4+}$, and Ta$^{5+}$. Exposing the films, after ion bombardment, to ambient for some days stimulates the amorphous phase of Ta$_2$O$_5$ at the surface suggesting that the suboxides of Ta are unstable. Using a sputtering simulation we discuss that these suboxides are largely generated during ion bombardment that greatly reduces the oxygen to tantalum ratio as the irradiation time increases. The computer simulation indicates that this is due to the high sputtering yield of oxygen.

cond-mat.mtrl-sci↗