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Juhn-Jong Lin

Publications and source records attributed to Juhn-Jong Lin.

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Electronic conduction properties of indium tin oxide: single-particle and many-body transport

Indium tin oxide (Sn-doped In$_2$O$_{3-δ}$ or ITO) is an interesting and technologically important transparent conducting oxide. This class of material has been extensively studied for decades, with research efforts focusing on the application aspects. The fundamental issues of the electronic conduction properties of ITO from 300 K down to low temperatures have rarely been addressed. Studies of the electrical-transport properties over a wide range of temperature are essential to unraveling the underlying electronic dynamics and microscopic electronic parameters. We show that one can learn rich physics in ITO material, including the semi-classical Boltzmann transport, the quantum-interference electron transport, and the electron-electron interaction effects in the presence of disorder and granularity. To reveal the opportunities that the ITO material provides for fundamental research, we demonstrate a variety of charge transport properties in different forms of ITO structures, including homogeneous polycrystalline films, homogeneous single-crystalline nanowires, and inhomogeneous ultrathin films. We not only address new physics phenomena that arise in ITO but also illustrate the versatility of the stable ITO material forms for potential applications. We emphasize that, microscopically, the rich electronic conduction properties of ITO originate from the inherited free-electron-like energy bandstructure and low-carrier concentration (as compared with that in typical metals) characteristics of this class of material. Furthermore, a low carrier concentration leads to slow electron-phonon relaxation, which causes ($i$) a small residual resistance ratio, ($ii$) a linear electron diffusion thermoelectric power in a wide temperature range 1-300 K, and ($iii$) a weak electron dephasing rate. We focus our discussion on the metallic-like ITO material.

cond-mat.mes-hall↗

Variable-range-hopping conduction processes in oxygen deficient polycrystalline ZnO films

We have fabricated oxygen deficient polycrystalline ZnO films by the rf sputtering deposition method. To systematically investigate the charge transport mechanisms in these samples, the electrical resistivities have been measured over a wide range of temperature from 300 K down to liquid-helium temperatures. We found that below about 100 K, the variable-range-hopping (VRH) conduction processes govern the charge transport properties. In particular, the Mott VRH conduction process dominates at higher temperatures, while crossing over to the Efros-Shklovskii (ES) VRH conduction process at lower temperatures. The crossover occurred at temperatures as high as a few tens degrees Kelvin. Moreover, the temperature behavior of resistivity over the entire VRH conduction regime from the Mott-type to the ES-type process can be well described by a universal scaling law.

cond-mat.dis-nn↗

Ultralow 1/f Noise in a Heterostructure of Superconducting Epitaxial Cobalt-Disilicide Thin Film on Silicon

High-precision resistance noise measurements indicate that the epitaxial CoSi$_2$/Si hetero-structures at 150 K and 2 K (slightly above its superconducting transition temperature $T_c$ of 1.54 K) exhibit an unusually low 1/f noise level in the frequency range of 0.008-0.2 Hz. This corresponds to an upper limit of Hooge constant $γ\leq 3 \times 10^{-6}$, about 100 times lower than that of single-crystalline aluminum films on SiO$_2$ capped Si substrates. Supported by high-resolution cross-sectional transmission electron microscopy studies, our analysis reveals that the 1/f noise is dominated by excess interfacial Si atoms and their dimer reconstruction induced fluctuators. Unbonded orbitals (i.e., dangling bonds) on excess Si atoms are intrinsically rare at the epitaxial CoSi$_2$/Si(100) interface, giving limited trapping-detrapping centers for localized charges. With its excellent normal-state properties, CoSi$_2$ has been used in silicon-based integrated circuits for decades. The intrinsically low noise properties discovered in this work could be utilized for developing quiet qubits and scalable superconducting circuits for future quantum computing.

cond-mat.mes-hall↗

Quantum-interference transport through surface layers of indium-doped ZnO nanowires

We have fabricated indium-doped ZnO (IZO) nanowires (NWs) and carried out 4-probe electrical-transport measurements at low temperatures. The NWs reveal charge conduction behavior characteristic of disordered metals. In addition to the $T$ dependence of resistance $R$, we have measured the magnetoresistances (MR) in perpendicular and parallel magnetic fields. Our $R(T)$ and MR data in different $T$ intervals are consistent with the theoretical predictions of the one- (1D), two- (2D) or three-dimensional (3D) weak-localization (WL) and the electron-electron interaction (EEI) effects. In particular, a few dimensionality crossovers in the two effects are observed. These crossover phenomena are consistent with the model of a "core-shell-like structure" in individual IZO NWs, where an outer shell of a thickness $t$ ($\simeq$ 15-17 nm) is responsible for the quantum-interference transport. In the WL effect, as the electron dephasing length $L_ϕ$ gradually decreases with increasing $T$ from the lowest measurement temperatures, a 1D-to-2D dimensionality crossover takes place around a characteristic temperature where $L_ϕ$ approximately equals $d$, an effective NW diameter which is slightly smaller than the geometric diameter. As $T$ further increases, a 2D-to-3D dimensionality crossover occurs around another characteristic temperature where $L_ϕ$ approximately equals $t$ ($< d$). In the EEI effect, a 2D-to-3D dimensionality crossover takes place when the thermal diffusion length $L_T$ progressively decreases with increasing $T$ and approaches $t$. However, a crossover to the 1D EEI effect is not seen because $L_T < d$ even at $T$ = 1 K in our IZO NWs. Furthermore, we explain the various inelastic electron scattering processes which govern $L_ϕ$. This work indicates that the surface-related conduction processes are essential to doped semiconductor nanostructures.

cond-mat.mes-hall↗

Structural Order and Melting of a Quasi-One-Dimensional Electron System

We investigate the influence of confinement on the positional order of a quasi-1D electron system trapped on the surface of liquid helium. We find evidence that the melting of the Wigner solid (WS) depends on the confinement strength, as well as electron density and temperature. A reentrant solid-liquid-solid transition is observed for increasing electron density under constant electrostatic confinement. As the electron row number $N_y$ changes, varying commensurability results in a modulation of the WS order, even when $N_y$ is large (several tens). This is confirmed by Monte Carlo simulations.

cond-mat.mes-hall↗

Stick-Slip Motion of the Wigner Solid on Liquid Helium

We present time-resolved transport measurements of a Wigner solid (WS) on the surface of liquid Helium confined in a micron-scale channel. At rest, the WS is `dressed' by a cloud of quantised capillary waves (ripplons). Under a driving force, we find that repeated WS-ripplon decoupling leads to stick-slip current oscillations, the frequency of which can be tuned by adjusting the temperature, pressing electric field, or electron density. The WS on liquid He is a promising system for the study of polaron-like decoupling dynamics.

cond-mat.mes-hall↗

Electron-electron scatttering in Sn-doped indium oxide thick films

We have measured the low-field magnetoresistances (MRs) of a series of Sn-doped indium oxide thick films in the temperature $T$ range 4--35 K. The electron dephasing rate $1/τ_φ$ as a function of $T$ for each film was extracted by comparing the MR data with the three-dimensional (3D) weak-localization theoretical predictions. We found that the extracted $1/τ_φ$ varies linearly with $T^{3/2}$. Furthermore, at a given $T$, $1/τ_φ$ varies linearly with $k_F^{-5/2}l^{-3/2}$, where $k_{F}$ is the Fermi wavenumber, and $l$ is the electron elastic mean free path. These features are well explained in terms of the small-energy-transfer electron-electron scattering time in 3D disordered conductors. This electron dephasing mechanism dominates over the electron-phonon ($e$-ph) scattering process because the carrier concentrations in our films are $\sim$ 3 orders of magnitude lower than those in typical metals, which resulted in a greatly suppressed $e$-ph relaxation rate.

cond-mat.mes-hall↗

Weak antilocalization in topological insulator Bi$_{2}$Te$_{3}$ microflakes

We have studied the carrier transport in two topological insulator (TI) Bi$_{2}$Te$_{3}$ microflakes between 0.3 and 10 K and under applied backgate voltages ($V_{\rm BG}$). Logarithmic temperature dependent resistance corrections due to the two-dimensional electron-electron interaction effect in the presence of weak disorder were observed. The extracted Coulomb screening parameter is negative, which is in accord with the situation of strong spin-orbit scattering as is inherited in the TI materials. In particular, positive magnetoresistances (MRs) in the two-dimensional weak-antilocalization (WAL) effect were measured in low magnetic fields, which can be satisfactorily described by a multichannel-conduction model. Both at low temperatures of $T < 1$ K and under high positive $V_{\rm BG}$, signatures of the presence of two coherent conduction channels were observed, as indicated by an increase by a factor of $\approx$ 2 in the prefactor which characterizes the WAL MR magnitude. Our results are discussed in terms of the (likely) existence of the Dirac fermion surface states, in addition to the bulk states, in the three-dimensional TI Bi$_2$Te$_3$ material.

cond-mat.mes-hall↗

Observation of fluctuation-induced tunneling conduction in micrometer-sized tunnel junctions

Micrometer-sized Al/AlO$_{x}$/Y tunnel junctions were fabricated by the electron-beam lithography technique. The thin ($\approx$ 1.5--2 nm thickness) insulating AlO$_{x}$ layer was grown on top of the Al base electrode by O$_{2}$ glow discharge. The zero-bias conductances $G(T)$ and the current-voltage characteristics of the junctions were measured in a wide temperature range 1.5--300 K\@. In addition to the direct tunneling conduction mechanism observed in low-$G$ junctions, high-$G$ junctions reveal a distinct charge transport process which manifests the thermally fluctuation-induced tunneling conduction (FITC) through short nanoconstrictions. We ascribe the experimental realization of the FITC mechanism to originating from the formations of "hot spots" (incomplete pinholes) in the AlO$_{x}$ layer owing to large junction-barrier interfacial roughness.

cond-mat.mes-hall↗

Electron dephasing in homogeneous and inhomogeneous indium tin oxide thin films

The electron dephasing processes in two-dimensional homogeneous and inhomogeneous indium tin oxide thin films have been investigated in a wide temperature range 0.3--90 K. We found that the small-energy-transfer electron-electron ($e$-$e$) scattering process dominated the dephasing from a few K to several tens K. At higher temperatures, a crossover to the large-energy-transfer $e$-$e$ scattering process was observed. Below about 1--2 K, the dephasing time $τ_φ$ revealed a very weak temperature dependence, which intriguingly scaled approximately with the inverse of the electron diffusion constant $D$, i.e., $τ_φ(T \approx 0.3 \, {\rm K}) \propto 1/D$. Theoretical implications of our results are discussed. The reason why the electron-phonon relaxation rate is negligibly weak in this low-carrier-concentration material is presented.

cond-mat.mes-hall↗

Universal conductance fluctuations in indium tin oxide nanowires

Magnetic field dependent universal conductance fluctuations (UCF's) are observed in weakly disordered indium tin oxide nanowires from 0.26 K up to $\sim 25$ K. The fluctuation magnitudes increase with decreasing temperature, reaching a fraction of $e^2/h$ at $T \lesssim 1$ K. The shape of the UCF patterns is found to be very sensitive to thermal cycling of the sample to room temperatures, which induces irreversible impurity reconfigurations. On the other hand, the UCF magnitudes are insensitive to thermal cycling. Our measured temperature dependence of the root-mean-square UCF magnitudes are compared with the existing theory [C. W. J. Beenakker and H. van Houten, Phys. Rev. B \textbf{37}, 6544 (1988)]. A notable discrepancy is found, which seems to imply that the experimental UCF's are not cut off by the thermal diffusion length $L_T$, as would be expected by the theoretical prediction when $L_T < L_φ$, where $L_φ$ is the electron dephasing length. The approximate electron dephasing length is inferred from the UCF magnitudes and compared with that extracted from the weak-localization magnetoresistance studies. A reasonable semiquantitative agreement is observed.

cond-mat.mes-hall↗

Temporal universal conductance fluctuations in RuO$_2$ nanowires due to mobile defects

Temporal universal conductance fluctuations (TUCF) are observed in RuO$_2$ nanowires at cryogenic temperatures. The fluctuations persist up to very high $T \sim 10$ K. Their root-mean-square magnitudes increase with decreasing $T$, reaching $\sim 0.2 e^2/h$ at $T \lesssim 2$ K. These fluctuations are shown to originate from scattering of conduction electrons with rich amounts of mobile defects in artificially synthesized metal oxide nanowires. TUCF characteristics in both one-dimensional saturated and unsaturated regimes are identified and explained in terms of current theories. Furthermore, the TUCF as a probe for the characteristic time scales of the mobile defects (two-level systems) are discussed.

cond-mat.mes-hall↗

Fluctuation-induced tunneling conduction through RuO$_2$ nanowire contacts

A good understanding of the electronic conduction processes through nanocontacts is a crucial step for the implementation of functional nanoelectronic devices. We have studied the current-voltage ($I$-$V$) characteristics of nanocontacts between single metallic RuO$_2$ nanowires (NWs) and contacting Au electrodes which were pre-patterned by simple photolithography. Both the temperature behavior of contact resistance in the low-bias voltage ohmic regime and the $I$-$V$ curves in the high-bias voltage non-ohmic regime have been investigated. We found that the electronic conduction processes in the wide temperature interval 1--300 K can be well described by the fluctuation-induced tunneling (FIT) conduction theory. Taken together with our previous work (Lin {\it et al.}, Nanotechnology {\bf 19}, 365201 (2008)) where the nanocontacts were fabricated by delicate electron-beam lithography, our study demonstrates the general validity of the FIT model in characterizing electronic nanocontacts.

cond-mat.mes-hall↗

Electrical conduction processes in ZnO in a wide temperature range 20--500 K

We have investigated the electrical conduction processes in as-grown and thermally cycled ZnO single crystal as well as as-grown ZnO polycrystalline films over the wide temperature range 20--500 K. In the case of ZnO single crystal between 110 and 500 K, two types of thermal activation conduction processes are observed. This is explained in terms of the existence of both shallow donors and intermediately deep donors which are consecutively excited to the conduction band as the temperature increases. By measuring the resistivity $ρ(T)$ of a given single crystal after repeated thermal cycling in vacuum, we demonstrate that oxygen vacancies play an important role in governing the shallow donor concentrations but leave the activation energy ($\simeq27\pm$2 meV) largely intact. In the case of polycrystalline films, two types of thermal activation conduction processes are also observed between $\sim$150 and 500 K. Below $\sim$150 K, we found an additional conduction process due to the nearest-neighbor-hopping conduction mechanism which takes place in the shallow impurity band. As the temperatures further decreases below $\sim$80 K, a crossover to the Mott variable-range-hopping conduction process is observed. Taken together with our previous measurements on $ρ(T)$ of ZnO polycrystalline films in the temperature range 2--100 K [Y. L. Huang {\it et al.}, J. Appl. Phys. \textbf{107}, 063715 (2010)], this work establishes a quite complete picture of the overall electrical conduction mechanisms in the ZnO material from liquid-helium temperatures up to 500 K.

cond-mat.mtrl-sci↗

Logarithmic temperature dependence of Hall transport in granular metals

We have measured the Hall coefficient $R_H$ and the electrical conductivity $σ$ of a series of ultrathin indium tin oxide films between 2 and 300 K. A robust $R_H$\,$\propto$\,ln$T$ law is observed in a considerably wide temperature range of 2 and $\sim$120 K. This ln$T$ dependence is explained as originated from the electron-electron interaction effect in the presence of granularity, as newly theoretically predicted. Furthermore, we observed a $σ$\,$\propto$\,ln$T$ law from 3 K up to several tens K, which also arose from the Coulomb interaction effect in inhomogeneous systems. These results provide strong experimental supports for the current theoretical concepts for charge transport in granular metals with intergrain tunneling conductivity $g_T$$\gg$1.

cond-mat.mes-hall↗

Long electron dephasing length and disorder-induced spin-orbit coupling in indium tin oxide nanowires

We have measured the quantum-interference magnetoresistances in two single indium tin oxide (ITO) nanowires between 0.25 and 40 K, by using the four-probe configuration method. The magnetoresistances are compared with the one-dimensional weak-(anti)localization theory to extract the electron dephasing length $L_ϕ$. We found, in a 60-nm diameter nanowire with a low resistivity of $ρ$(10 K) = 185 $μΩ$ cm, that $L_ϕ$ is long, increasing from 150 nm at 40 K to 520 nm at 0.25 K. Therefore, the nanowire reveals strict one-dimensional weak-localization effect up to several tens of degrees of Kelvin. In a second 72-nm diameter nanowire with a high resistivity of $ρ$(10 K) = 1030 $μΩ$ cm, the dephasing length is suppressed to $L_ϕ$(0.26 K) = 200 nm, and thus a crossover of the effective device dimensionality from one to three occurs at about 12 K. In particular, disorder-induced spin-orbit coupling is evident in the latter sample, manifesting weak-antilocalization effect at temperatures below $\sim$ 4 K. These observations demonstrate that versatile quantum-interference effects can be realized in ITO nanowires by controlling differing levels of atomic defects and impurities.

cond-mat.mes-hall↗

Two-Channel Kondo Effects in Al/AlO$_{x}$/Sc Planar Tunnel Junctions

We have measured the differential conductances $G(V,T)$ in several Al/AlO$_{x}$/Sc planar tunnel junctions between 2 and 35 K. As the temperature decreases to $\sim$ 16 K, the zero-bias conductance $G(0,T)$ crosses over from a standard $-$ln$T$ dependence to a novel $- \sqrt{T}$ dependence. Correspondingly, the finite bias conductance $G(V,T)$ reveals a two-channel Kondo scaling behavior between $\sim$ 4 and 16 K. The observed two-channel Kondo physics is ascribed to originating from a few localized spin-$\frac12$ Sc atoms situated slightly inside the AlO$_x$/Sc interface.

cond-mat.mes-hall↗

Direct Observation of Long-Term Durability of Superconductivity in YBa$_2$Cu$_3$O$_7$-Ag$_2$O Composites

We report direct observation of long-term durability of superconductivity of several YBa$_2$Cu$_3$O$_7$-Ag$_2$O composites that were first prepared and studied almost 14 years ago [J. J. Lin {\it et al}., Jpn. J. Appl. Phys. {\bf 29}, 497 (1990)]. Remeasurements performed recently on both resistances and magnetizations indicate a sharp critical transition temperature at 91 K. We also find that such long-term environmental stability of high-temperature superconductivity can only be achieved in YBa$_2$Cu$_3$O$_7$ with Ag$_2$O addition, but not with pure Ag addition.

cond-mat.supr-con↗