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Kyeongjae Cho

Publications and source records attributed to Kyeongjae Cho.

At least 19 recordsLinked to original sources

Role of surface states and band modulations in ultrathin ruthenium interconnects

Mitigating the RC delay from transistor miniaturization is essential for next-generation devices, driving a focus on interconnect electrical performance. Current copper-based interconnects face a critical challenge, that their resistivity sharply increases at the nanometer-scale due to surface and grain boundary scattering. Therefore, there is a pressing need for techniques that reduce resistance in ultrathin metal films. In this study, we employ the density functional theory to investigate how the intrinsic electronic structure of thin films impacts conductivity as a function of thickness. Notably, our analysis of ruthenium slab structures shows that surface states significantly influence thickness-dependent resistivity. It reveals that vacuum-terminated Ru slab exhibits decreasing resistivity with the decrease in thickness, whereas oxygen-terminated Ru slab shows the opposite trend. This difference is fundamentally attributed to the presence or absence of surface states, highlighting the importance of surface engineering in optimizing interconnect performance.

cond-mat.mtrl-sci

Sub-nm2 ferroelectric domains via charged 180 degree walls in ZrO2

Flat phonon bands in fluorite ferroelectrics (HfO2 or ZrO2) shrink polar domains laterally to an irreducible half-unit-cell width (0.27 nm) within which the vertical arrangement of dipoles is expected to remain uniform. We report on the direct observation of nonuniform and nearly discrete vertical arrangements of dipoles in ZrO2 thin films consisting of closely spaced head-to-head (HH) and tail-to-tail (TT) charged 180 degree walls, each exhibiting a distinct bulk-like structure. These charged domain walls (CDWs) further compress the irreducibly narrow, laterally stacked domains vertically to a thickness of 1-2.75 nm, yielding in-plane domains with sub-nm2 footprints-among the smallest ever reported for any ferroelectric material. The HH and TT walls form due to their flat longitudinal optical (LO) polar bands and are electrostatically stabilized by bound-charge compensation via interstitial oxygen atoms, which act as natural structural defects at the HH walls. Moreover, these walls are predicted to be conducting and to exhibit ultralow propagation barriers, with HH walls (1.6 meV) being far more mobile than TT walls (22.3 meV), indicating strong potential for low-voltage, domain-wall-based nanoelectronics.

cond-mat.mtrl-sci

Direct imaging of asymmetric interfaces and electrostatic potentials inside a hafnia-zirconia ferroelectric nanocapacitor

In hafnia-based thin-film ferroelectric devices, chemical phenomena during growth and processing such as oxygen vacancy formation and interfacial reactions appear to strongly affect device performance. However, the nanoscale structure, chemistry, and electrical potentials in these devices are not fully known, making it difficult to understand their influence on device properties. Here, we directly image the composition and electrostatic potential with nanometer resolution in the cross section of a nanocrystalline W / Hf$_{0.5}$Zr$_{0.5}$O$_{2-δ}$ (HZO) / W ferroelectric capacitor using multimodal electron microscopy. This reveals a 1.4 nm wide tungsten sub-oxide interfacial layer formed at the bottom interface during fabrication which introduces a potential dip and leads to asymmetric switching fields. Additionally, the measured inner potential in HZO is consistent with the presence of about 20% oxygen vacancies and a negative built-in potential in HZO. These chemical and electrostatic details are important to characterize and tune to achieve high performance ferroelectric devices.

cond-mat.mtrl-sci

Seamless monolithic three-dimensional integration of single-crystalline films by growth

The demand for the three-dimensional (3D) integration of electronic components is on a steady rise. The through-silicon-via (TSV) technique emerges as the only viable method for integrating single-crystalline device components in a 3D format, despite encountering significant processing challenges. While monolithic 3D (M3D) integration schemes show promise, the seamless connection of single-crystalline semiconductors without intervening wafers has yet to be demonstrated. This challenge arises from the inherent difficulty of growing single crystals on amorphous or polycrystalline surfaces post the back-end-of-the-line process at low temperatures to preserve the underlying circuitry. Consequently, a practical growth-based solution for M3D of single crystals remains elusive. Here, we present a method for growing single-crystalline channel materials, specifically composed of transition metal dichalcogenides, on amorphous and polycrystalline surfaces at temperatures lower than 400 °C. Building on this developed technique, we demonstrate the seamless monolithic integration of vertical single-crystalline logic transistor arrays. This accomplishment leads to the development of unprecedented vertical CMOS arrays, thereby constructing vertical inverters. Ultimately, this achievement sets the stage to pave the way for M3D integration of various electronic and optoelectronic hardware in the form of single crystals.

physics.app-ph

Two Types of 3D Quantum Hall Effects in Multilayer WTe$_2$

Interplay between the topological surface states and bulk states gives rise to diverse exotic transport phenomena in topological materials. The recently proposed Weyl orbit in topological semimetals in the presence of magnetic field is a remarkable example. This novel closed magnetic orbit consists of Fermi arcs on two spatially separated sample surfaces which are connected by the bulk chiral zero mode, which can contribute to transport. Here we report Shubnikov-de Haas (SdH) oscillation and its evolution into quantum Hall effect (QHE) in multilayered type-II Weyl semimetal WTe2. We observe both the three-dimensional (3D) QHE from bulk states by parallelly stacking of confined two-dimensional layers in the low magnetic field region and the 3D QHE in the quantized surface transport due to Weyl orbits in the high magnetic field region. Our study of the two types of novel QHEs controlled by magnetic field and our demonstration of the crossover between quantized bulk and surface transport provide an essential platform for the future quantized transport studies in topological semimetals.

cond-mat.mes-hall

A Nanometer-Thick Oxide Semiconductor Transistor with Ultra-High Drain Current

High drive current is a critical performance parameter in semiconductor devices for high-speed, low-power logic applications or high-efficiency, high-power, high-speed radio frequency (RF) analog applications. In this work, we demonstrate an In2O3 transistor grown by atomic layer deposition (ALD) at back-end-of-line (BEOL) compatible temperatures with a record high drain current exceeding 10 A/mm, the performance of which is 2-3 times better than all known transistors with semiconductor channels. A record high transconductance of 4 S/mm is also achieved among all transistors with a planar structure. It is found that a high carrier density and high electron velocity both contribute to this remarkably high on-state performance in ALD In2O3 transistors, which is made possible by the high-quality oxide/oxide interface, the metal-like charge-neutrality-level (CNL) alignment, and the high band velocities induced by the low density-of-state (DOS). Experimental Hall, I-V and split C-V measurements at room temperature confirm a high carrier density up to 6-7*10^13 /cm2 and a high velocity of about 10^7 cm/s. Ultra-thin oxide semiconductors, with a CNL located deep inside the conduction band, represent a promising new direction for the search of alternative channel materials for high-performance semiconductor devices.

cond-mat.mes-hall

Why In2O3 Can Make 0.7 nm Atomic Layer Thin Transistors?

In this work, we demonstrate enhancement-mode field-effect transistors by atomic-layer-deposited (ALD) amorphous In2O3 channel with thickness down to 0.7 nm. Thickness is found to be critical on the materials and electron transport of In2O3. Controllable thickness of In2O3 at atomic scale enables the design of sufficient 2D carrier density in the In2O3 channel integrated with the conventional dielectric. The threshold voltage and channel carrier density are found to be considerably tuned by channel thickness. Such phenomenon is understood by the trap neutral level (TNL) model where the Fermi-level tends to align deeply inside the conduction band of In2O3 and can be modulated to the bandgap in atomic layer thin In2O3 due to quantum confinement effect, which is confirmed by density function theory (DFT) calculation. The demonstration of enhancement-mode amorphous In2O3 transistors suggests In2O3 is a competitive channel material for back-end-of-line (BEOL) compatible transistors and monolithic 3D integration applications.

cond-mat.mtrl-sci

Flatbands and Mechanical Deformation Effects in the Moiré Superlattice of MoS$_2$-WSe$_2$ Heterobilayers

It has recently been shown that quantum-confined states can appear in epitaxially grown van der Waals material heterobilayers without a rotational misalignment ($θ=0^\circ$), associated with flat bands in the Brillouin zone of the moiré pattern formed due to the lattice mismatch of the two layers. Peaks in the local density of states and confinement in a MoS$_2$/WSe$_2$ system was qualitatively described only considering local stacking arrangements, which cause band edge energies to vary spatially. In this work, we report the presence of large in-plane strain variation across the moiré unit cell of a $θ=0^\circ$ MoS$_2$/WSe$_2$ heterobilayer, and show that inclusion of strain variation and out-of-plane displacement in density functional theory calculations greatly improves their agreement with the experimental data. We further explore the role of twist-angle by showing experimental data for a twisted MoS$_2$/WSe$_2$ heterobilayer structure with twist angle of $θ=15^\circ$, that exhibits a moiré pattern but no confinement.

cond-mat.mtrl-sci

Real-time ab initio simulation of inelastic electron scattering using the exact, density functional, and alternative approaches

To investigate inelastic electron scattering, which is ubiquitous in various fields of study, we carry out ab initio study of the real-time dynamics of a one-dimensional electron wave packet scattered by a hydrogen atom using different methods: the exact solution, the solution provided by time-dependent density functional theory (TDDFT), and the solutions given by alternative approaches. This research not only sheds light on inelastic scattering processes but also verifies the capability of TDDFT in describing inelastic electron scattering. We revisit the adiabatic local-density approximation (ALDA) in describing the excitation of the target during the scattering process along with a self-interaction correction and spin-polarized calculations. Our results reveal that the ALDA severely underestimates the energy transferred in the regime of low incident energy particularly for a spin-singlet system. After demonstrating alternative approaches, we propose a hybrid ab initio method to deal with the kinetic correlation alongside TDDFT. This hybrid method would facilitate first-principles studies of systems in which the correlation of a few electrons among many others is of interest.

physics.atom-ph

First-principles study of metal-graphene edge contact for ballistic Josephson junction

Edge-contacted superconductor-graphene-superconductor Josephson junction have been utilized to realize topological superconductivity, which have shown superconducting signatures in the quantum Hall regime. We perform the first-principles calculations to interpret electronic couplings at the superconductor-graphene edge contacts by investigating various aspects in hybridization of molybdenum d orbitals and graphene $π$ orbitals. We also reveal that interfacial oxygen defects play an important role in determining the doping type of graphene near the interface.

cond-mat.supr-con

Higher superconducting transition temperature by breaking the universal pressure relation

By investigating the bulk superconducting state via dc magnetization measurements, we have discovered a common resurgence of the superconductive transition temperatures (Tcs) of the monolayer Bi2Sr2CuO6+δ (Bi2201) and bilayer Bi2Sr2CaCu2O8+δ (Bi2212) to beyond the maximum Tcs (Tc-maxs) predicted by the universal relation between Tc and doping (p) or pressure (P) at higher pressures. The Tc of under-doped Bi2201 initially increases from 9.6 K at ambient to a peak at ~ 23 K at ~ 26 GPa and then drops as expected from the universal Tc-P relation. However, at pressures above ~ 40 GPa, Tc rises rapidly without any sign of saturation up to ~ 30 K at ~ 51 GPa. Similarly, the Tc for the slightly overdoped Bi2212 increases after passing a broad valley between 20-36 GPa and reaches ~ 90 K without any sign of saturation at ~ 56 GPa. We have therefore attributed this Tc-resurgence to a possible pressure-induced electronic transition in the cuprate compounds due to a charge transfer between the Cu 3d_(x^2-y^2 ) and the O 2p bands projected from a hybrid bonding state, leading to an increase of the density of states at the Fermi level, in agreement with our density functional theory calculations. Similar Tc-P behavior has also been reported in the trilayer Br2Sr2Ca2Cu3O10+δ (Bi2223). These observations suggest that higher Tcs than those previously reported for the layered cuprate high temperature superconductors can be achieved by breaking away from the universal Tc-P relation through the application of higher pressures.

cond-mat.supr-con

Quantum Transport and Band Structure Evolution under High Magnetic Field in Few-Layer Tellurene

Quantum Hall effect (QHE) is a macroscopic manifestation of quantized states which only occurs in confined two-dimensional electron gas (2DEG) systems. Experimentally, QHE is hosted in high mobility 2DEG with large external magnetic field at low temperature. Two-dimensional van der Waals materials, such as graphene and black phosphorus, are considered interesting material systems to study quantum transport, because it could unveil unique host material properties due to its easy accessibility of monolayer or few-layer thin films at 2D quantum limit. Here for the first time, we report direct observation of QHE in a novel low-dimensional material system: tellurene.High-quality 2D tellurene thin films were acquired from recently reported hydrothermal method with high hole mobility of nearly 3,000 cm2/Vs at low temperatures, which allows the observation of well-developed Shubnikov-de-Haas (SdH) oscillations and QHE. A four-fold degeneracy of Landau levels in SdH oscillations and QHE was revealed. Quantum oscillations were investigated under different gate biases, tilted magnetic fields and various temperatures, and the results manifest the inherent information of the electronic structure of Te. Anomalies in both temperature-dependent oscillation amplitudes and transport characteristics were observed which are ascribed to the interplay between Zeeman effect and spin-orbit coupling as depicted by the density functional theory (DFT) calculations.

cond-mat.mtrl-sci

Quantum-Confined Electronic States arising from Moiré Pattern of MoS2-WSe2 Hetero-bilayers

A two-dimensional (2D) hetero-bilayer system consisting of MoS2 on WSe2, deposited on epitaxial graphene, is studied by scanning tunneling microscopy and spectroscopy at temperatures of 5 and 80 K. A moiré pattern is observed, arising from lattice mismatch of 3.7% between the MoS2 and WSe2. Significant energy shifts are observed in tunneling spectra observed at the maxima of the moiré corrugation, as compared with spectra obtained at corrugation minima, consistent with prior work. Furthermore, at the minima of the moiré corrugation, sharp peaks in the spectra at energies near the band edges are observed, for spectra acquired at 5 K. The peaks correspond to discrete states that are confined within the moiré unit cells. Conductance mapping is employed to reveal the detailed structure of the wave functions of the states. For measurements at 80 K, the sharp peaks in the spectra are absent, and conductance maps of the band edges reveal little structure.

cond-mat.mes-hall

Magnitude of the Current in Two-Dimensional Interlayer Tunneling Devices

Using the Bardeen tunneling method with first-principles wave functions, computations are made of the tunneling current in graphene / hexagonal-boron-nitride / graphene (G/h-BN/G) vertical structures. Detailed comparison with prior experimental results is made, focusing on the magnitude of the achievable tunnel current. With inclusion of the effects of translational and rotational misalignment of the graphene and the h-BN, predicted currents are found to be about 15x larger than experimental values. A reduction in this discrepancy, to a factor of 2.5x, is achieved by utilizing a realistic size for the band gap of the h-BN, hence affecting the exponential decay constant for the tunneling.

cond-mat.mes-hall

Characteristics of Interlayer Tunneling Field Effect Transistors Computed by a "DFT-Bardeen" Method

Theoretical predictions are made for the current-voltage characteristics of two-dimensional heterojunction interlayer tunneling field-effect transistors (Thin-TFETs), focusing on the magnitude of the current that is achievable in such devices. A theory based on the Bardeen tunneling method is employed, using wavefunctions from first-principles density-functional theory. This method permits convenient incorporation of differing materials into the source and drain electrodes, i.e. with different crystal structures, lattice constants, and/or band structures. Large variations in the tunnel currents are found, depending on the particular two-dimensional materials used for the source and drain electrodes. Tunneling between states derived from the center (Gamma-point) of the Brillouin zone (BZ) is found, in general, to lead to larger current than for zone-edge (e.g. K-point) states. Differences, as large as an order of magnitude, between the present results and various prior predictions are discussed. Predicted values for the tunneling currents, including subthreshold swing, are compared with benchmark values for low-power digital applications. Contact resistance is considered and its effect on the tunneling currents is demonstrated.

cond-mat.mes-hall

Covalent Nitrogen Doping and Compressive Strain in MoS2 by Remote N2 Plasma Exposure

Controllable doping of two-dimensional materials is highly desired for ideal device performance in both hetero- and p-n homo-junctions. Herein, we propose an effective strategy for doping of MoS2 with nitrogen through a remote N2 plasma surface treatment. By monitoring the surface chemistry of MoS2 upon N2 plasma exposure using in-situ X-ray photoelectron spectroscopy, we identified the presence of covalently bonded nitrogen in MoS2, where substitution of the chalcogen sulfur by nitrogen is determined as the doping mechanism. Furthermore, the electrical characterization demonstrates that p-type doping of MoS2 is achieved by nitrogen doping, in agreement with theoretical predictions. Notably, we found that the presence of nitrogen can induce compressive strain in the MoS2 structure, which represents the first evidence of strain induced by substitutional doping in a transition metal dichalcogenide material. Finally, our first principle calculations support the experimental demonstration of such strain, and a correlation between nitrogen doping concentration and compressive strain in MoS2 is elucidated.

cond-mat.mtrl-sci

Electronic Properties of MoS2/HfO2 Interface: Impact of Interfacial Impurities during Atomic Layer Deposition Growth

Using ab-initio calculations within the framework of Density Functional Theory (DFT), atomic structures and electronic properties of MoS2/HfO2 interface are investigated. The impact of interfacial oxygen concentration on the MoS2/HfO2 interface electronic structure is examined in order to mimic the atomic layer deposition growth at ambient conditions. Then, the effect on band offsets and the thermodynamic stability of those interfaces is investigated and compared with available relevant experimental data. These results seem to indicate that, for a well-prepared interface, the electronic device performance should be better than other interfaces like III-V/high-k due to the absence of interface defect states. However, any unpassivated defects, if present during oxide growth, strongly influence the subsequent electronic properties of the interface.

cond-mat.mtrl-sci

Band alignment of two-dimensional transition metal dichalcogenides: application in tunnel field effect transistors

Tunnel field effect transistors (TFETs) based on vertical stacking of two dimensional materials are of interest for low-power logic devices. The monolayer transition metal dichalcogenides (TMDs) with sizable band gaps show promise in building p-n junctions (couples) for TFET applications. Band alignment information is essential for realizing broken gap junctions with excellent electron tunneling efficiencies. Promising couples composed of monolayer TMDs are suggested to be VIB-MeX2 (Me= W, Mo; X= Te, Se) as the n-type source and IVB-MeX2 (Me = Zr, Hf; X= S, Se) as the p-type drain by density functional theory calculations.

cond-mat.mtrl-sci