arXiv subjects

Manish Chhowalla

Publications and source records attributed to Manish Chhowalla.

At least 19 recordsLinked to original sources

arXiv2025

Dielectric and gate metal engineering for threshold voltage modulation in enhancement mode monolayer MoS2 field effect transistors

Excellent gate electrostatics in field effect transistors (FETs) based on two-dimensional transition metal dichalcogenide (2D TMD) channels can dramatically decrease static power dissipation. Energy efficient FETs operate in enhancement mode with small and positive threshold voltage (Vth) for n-type devices. However, most state-of-the-art FETs based on monolayer MoS2 channel operate in depletion mode with negative Vth due to doping from the underlying dielectric substrate. In this work, we identify key properties of the semiconductor/dielectric interface (MoS2 on industrially relevant high dielectric constant (k) HfO2, ZrO2 and hBN for reference) responsible for realizing enhancement-mode operation of 2D MoS2 channel FETs. We find that hBN and ZrO2 dielectric substrates provide low defect interfaces with MoS2 that enables effective modulation of the Vth using gate metals of different work functions (WFs). We use photoluminescence (PL) and synchrotron X-ray photoelectron spectroscopy (XPS) measurements to investigate doping levels in monolayer MoS2 on different dielectrics with different WF gate metals. We complement the FET and spectroscopic measurements with capacitance-voltage analysis on dielectrics with varying thicknesses, which confirm that Vth modulation in ZrO2 devices is correlated with WF of the gate metals - in contrast with HfO2 devices that exhibit signatures of Vth pinning induced by oxide/interface defect states. Finally, we demonstrate FETs using a 2D MoS2 channel and a 6 nm of ZrO2 dielectric, achieving a subthreshold swing of 87 mV dec-1 and a threshold voltage of 0.1 V. Our results offer insights into the role of dielectric/semiconductor interface in 2D MoS2 based FETs for realizing enhancement mode FETs and highlight the potential of ZrO2 as a scalable high-k dielectric.

cond-mat.mtrl-sci↗

arXiv2025

Crossover from quantum correlation to hot-carrier transport in scattering-tolerant 2D transistors

Quantum correlation and hot-carrier transport represent two fundamentally distinct regimes of electronic conduction, rarely accessible within the same device. Here, we report a state-of-the-art monolayer transition metal dichalcogenides transistor architecture on a ferroelectric substrate that enables this crossover by leveraging the strong dielectric screening and in-plane gate control. At cryogenic temperatures, the devices exhibit reproducible quasi-periodic current fluctuations, consistent with an emergent potential landscape driven by electron-electron interactions at low carrier densities. As the temperature increases, this correlated potential profile thermally dissolves and transport is dominated by the lateral gate-field that drives the carriers with high kinetic energy. These hot-carriers can efficiently surmount the scattering events, exhibiting a record-high room-temperature electron mobility of ~4,800 cm^2/Vs and a maximum on-current ~0.5 mA/{\mu}m, surpassing traditional FETs in key performance metrics. These findings establish a unified approach for probing intermediate mesoscopic orders, while advancing the transistor performance limits in scalable 2D transistors.

cond-mat.mes-hall↗

arXiv2025

Ultra-clean interface between high k dielectric and 2D MoS2

Atomically thin transition metal dichalcogenides (TMDs) are promising candidates for next-generation transistor channels due to their superior scaling properties. However, the integration of ultra-thin gate dielectrics remains a challenge, as conventional oxides such as SiO2, Al2O3, and HfO2 tend to unintentionally dope 2D TMDs and introduce interfacial defect states, leading to undesirable field-effect transistor (FET) performance and unstable threshold voltages. Here, we demonstrate that zirconium oxide (ZrO2), a high-k dielectric compatible with semiconductor processing, forms an ultra-clean interface with monolayer MoS2. Using soft and hard X-ray photoelectron spectroscopy and density functional theory, we find that ZrO2 does not measurably interact with MoS2, in contrast to significant doping observed for SiO2 and HfO2 substrates. As a result, back-gated monolayer MoS2 FETs fabricated with ZrO2 dielectrics exhibit stable and positive threshold voltages (0.36 plus/minus 0.3 V), low subthreshold swing (75 mV per decade), and high ON currents exceeding 400 microamperes. We further demonstrate p-type WSe2 FETs with ON currents greater than 200 microamperes per micrometer by suppressing electron doping with ZrO2 dielectrics. Atomic-resolution imaging confirms a defect-free ZrO2/MoS2 interface, which enables top-gate FETs with an equivalent oxide thickness of 0.86 nanometers and subthreshold swing of 80 mV per decade. Moreover, the ultraclean ZrO2/MoS2 interface allows for effective threshold voltage modulation in top-gate FETs via gate metal work function engineering. These findings establish ZrO2 as a highly promising, industry-compatible high-k dielectric for scalable 2D TMD-based electronics.

cond-mat.mtrl-sci↗

arXiv2025

High-efficiency WSe$_2$ photovoltaics enabled by ultra-clean van der Waals contacts

Layered transition metal dichalcogenide semiconductors are interesting for photovoltaics owing to their high solar absorbance and efficient carrier diffusion. Tungsten diselenide (WSe$_2$), in particular, has emerged as a promising solar cell absorber. However, defective metal-semiconductor interfaces have restricted the power conversion efficiency (PCE) to approximately 6%. Here we report WSe$_2$ photovoltaics with a record-high PCE of approximately 11% enabled by ultra-clean indium/gold (In/Au) van der Waals (vdW) contacts. Using grid-patterned top vdW electrodes, we demonstrate near-ideal diodes with a record-high on/off ratio of $1.0\times 10^9$. Open-circuit voltage (VOC) of 571 +/- 9 mV, record-high short-circuit current density (JSC) of 27.19 +/- 0.45 mA cm$^{-2}$ -- approaching the theoretical limit (34.5 mA cm$^{-2}$) -- and fill factor of 69.2 +/- 0.7% resulting in PCE of 10.8 +/- 0.2% under 1-Sun illumination on large active area (approximately 0.13x0.13 mm$^2$) devices have been realised. The excellent device performance is consistent with the high external quantum efficiency (up to approximately 93%) measured across a broad spectral range of 500-830 nm. Our results suggest that ultra-clean vdW contacts on WSe$_2$ enable high-efficiency photovoltaics and form the foundation for further optimisation.

cond-mat.mtrl-sci↗

arXiv2025

Large Scale Manufacture of Phase Pure Two-Dimensional Metallic MoS2 Nanosheets

Metallic monolayered [or two - dimensional (2D)] MoS2 nanosheets show tremendous promise for energy storage and catalysis applications. However, state-of-the-art chemical exfoliation methods require > 48 hours to produce milligrams of metallic 2D MoS2. Further, chemically exfoliated MoS2 nanosheets are a mixture of metallic (1T or 1T prime 50% to 70%) and semiconducting (2H 30% to 50%) phases. Here, we demonstrate large-scale and rapid (>600 grams per hour) production of purely metallic phase 2D MoS2 (and WS2, MoSe2) nanosheets using microwave irradiation. Atomic resolution imaging shows 1T or 1T prime metallic phase in basal plane - consistent with close to 100% metallic phase concentration measured by X-ray photoelectron spectroscopy. The high 1T phase concentration results in the highest exchange current density of 0.175 plus-minus 0.03 mA cm-2 and among the lowest Tafel slopes (39 - 43 mV dec-1) measured to date for the hydrogen evolution reaction. In supercapacitors and lithium-sulfur pouch cell batteries, record-high volumetric capacitance of 753 plus-minus 3.6 F cm-3 and specific capacity of 1245 plus-minus 16 mAh g-1 (at exceptionally low electrolyte to sulfur ratio = 2 microlitre g-1), respectively, are obtained. Our method provides a practical pathway for producing high quality purely metallic phase 2D materials for high performance energy devices.

cond-mat.mtrl-sci↗

arXiv2024

Helium atom micro-diffraction as a characterisation tool for 2D materials

We present helium atom micro-diffraction as an ideal technique for characterization of 2D materials due to its ultimate surface sensitivity combined with sub-micron spatial resolution. Thermal energy neutral helium scatters from the valence electron density, 2-3A above the ionic cores of a surface, making the technique ideal for studying 2D materials, where other approaches can struggle due to small interaction cross-sections with few-layer samples. Sub-micron spatial resolution is key development in neutral atom scattering to allow measurements from device-scale samples. We present measurements of monolayer-substrate interactions, thermal expansion coefficients, the electron-phonon coupling constant and vacancy-type defect density on monolayer-MoS2. We also discuss extensions to the presented methods which can be immediately implemented on existing instruments to perform spatial mapping of these material properties.

physics.app-ph↗

arXiv2024

Measuring vacancy-type defect density in monolayer semiconductors

Two-dimensional (2D) materials have attracted wide-spread interest due to their unique and tunable properties. Their optoelectronic, mechanical, and thermal properties are greatly influenced by crystal defects, which are, in turn, used to control these properties. However, experimental quantification of the density of defects, whether deliberately introduced or inherent, is very difficult in these atomically thin materials. Here we show that helium atom micro-diffraction can be used to measure the defect density in 15x20um monolayer MoS2, a prototypical 2D semiconductor, quickly and easily compared to standard methods. We present a simple analytic model, the lattice gas equation, that fully captures the relationship between atomic Bragg diffraction intensity and defect density. The model, combined with ab initio scattering calculations, shows that our technique can immediately be applied to a wide range of 2D materials, independent of sample chemistry or structure. Additionally, wafer-scale characterization is immediately possible.

physics.app-ph↗

arXiv2024

Multistate ferroelectric diodes with high electroresistance based on van der Waals heterostructures

Some van der Waals (vdW) materials exhibit ferroelectricity, making them promising for novel non-volatile memories (NVMs) such as ferroelectric diodes (FeDs). CuInP2S6 (CIPS) is a well-known vdW ferroelectric that has been integrated with graphene for memory devices. Here we demonstrate FeDs with self-rectifying, hysteretic current-voltage characteristics based on vertical heterostructures of 10-nm-thick CIPS and graphene. By using vdW indium-cobalt top electrodes and graphene bottom electrodes, we achieve high electroresistance (on- and off-state resistance ratios) of ~10^6, on-state rectification ratios of ~2500 for read/write voltages of 2 V/0.5 V and maximum output current densities of 100 A/cm^2. These metrics compare favourably with state-of-the-art FeDs. Piezoresponse force microscopy measurements show that stabilization of intermediate net polarization states in CIPS leads to stable multi-bit data retention at room temperature. The combination of two-terminal design, multi-bit memory, and low-power operation in CIPS-based FeDs is potentially interesting for compute-in-memory and neuromorphic computing applications.

physics.app-ph↗

arXiv2024

Chiral two-dimensional MoS2 by molecular functionalization as ultra-sensitive detectors for circularly polarized light

Inducing chirality in optically and electronically active materials is interesting for applications in sensing and quantum information transmission. Two-dimensional (2D) transition metal chalcogenides (TMDs) possess excellent electronic and optical properties but are achiral. Here we demonstrate chirality induction in atomically thin layers of 2D MoS2 by functionalization with chiral thiol molecules. Analysis of X-ray absorption near-edge structure and Raman optical activity with circularly polarized excitation suggest chemical and electronic interactions that leads chirality transfer from the molecules to the MoS2. We confirm chirality induction in 2D MoS2 with circular dichroism measurements that show absorption bands at wavelengths of 380-520 nm and 520-600 nm with giant molar ellipticity of 10^8 deg cm2/dmol 2-3 orders of magnitude higher than 3D chiral materials. Phototransistors fabricated from atomically thin chiral MoS2 for detection of circularly polarized light exhibit responsivity of >10^2 A/W and maximum anisotropy g-factor of 1.98 close to the theoretical maximum of 2.0, which indicates that the chiral states of photons are fully distinguishable by the photodetectors. Our results demonstrate that it is possible achieve chirality induction in monolayer MoS2 by molecular functionalization and realise ultra-sensitive detectors for circularly polarized photons.

cond-mat.mtrl-sci↗

arXiv2022

Recent Advances in Design of Electrocatalysts for High-Current-Density Water Splitting

Electrochemical water splitting technology for producing "green hydrogen" is important for the global mission of carbon neutrality. Electrocatalysts with decent performance at high current densities play a central role in the industrial implementation of this technology. The field has advanced immensely in recent years, as witnessed by many types of catalysts have been designed and synthesized which work at industrially-relevant current densities (> 200 mA cm-2). Note that the activity and stability of catalysts can be influenced by their local reaction environment, which are closely related to the current density. By discussing recent advances in this field, we summarize several key aspects that affect the catalytic performance for high-current-density electrocatalysis, including dimensionality of catalysts, surface chemistry, electron transport path, morphology, and catalyst-electrolyte interplay. We highlight the multiscale design strategy that considers these aspects comprehensively for developing high-current-density catalysts. We also put forward out perspectives on the future directions in this emerging field.

physics.chem-ph↗

arXiv2021

Quantum Transport in Two-Dimensional WS$_2$ with High-Efficiency Carrier Injection Through Indium Alloy Contacts

Two-dimensional transition metal dichalcogenides (TMDCs) have properties attractive for optoelectronic and quantum applications. A crucial element for devices is the metal-semiconductor interface. However, high contact resistances have hindered progress. Quantum transport studies are scant as low-quality contacts are intractable at cryogenic temperatures. Here, temperature-dependent transfer length measurements are performed on chemical vapour deposition grown single-layer and bilayer WS$_2$ devices with indium alloy contacts. The devices exhibit low contact resistances and Schottky barrier heights (\sim10 k$\Omega$\si{\micro\metre} at 3 K and 1.7 meV). Efficient carrier injection enables high carrier mobilities ($\sim$190 cm$^2$V$^{-1}$s$^{-1}$) and observation of resonant tunnelling. Density functional theory calculations provide insights into quantum transport and properties of the WS$_2$-indium interface. Our results reveal significant advances towards high-performance WS$_2$ devices using indium alloy contacts.

cond-mat.mtrl-sci↗

arXiv2019

Electronic polarizability as the fundamental variable in the dielectric properties of two-dimensional materials

The dielectric constant, which defines the polarization of the media, is a key quantity in condensed matter. It determines several electronic and optoelectronic properties important for a plethora of modern technologies from computer memory to field effect transistors and communication circuits. Moreover, the importance of the dielectric constant in describing electromagnetic interactions through screening plays a critical role in understanding fundamental molecular interactions. Here we show that despite its fundamental transcendence, the dielectric constant does not define unequivocally the dielectric properties of two-dimensional (2D) materials due to the locality of their electrostatic screening. Instead, the electronic polarizability correctly captures the dielectric nature of a 2D material which is united to other physical quantities in an atomically thin layer. We reveal a long-sought universal formalism where electronic, geometrical and dielectric properties are intrinsically correlated through the polarizability opening the door to probe quantities yet not directly measurable including the real covalent thickness of a layer. We unify the concept of dielectric properties in any material dimension finding a global dielectric anisotropy index defining their controllability through dimensionality.

cond-mat.mtrl-sci↗

arXiv2019

Evidence of Rotational Fr\"ohlich Coupling in Polaronic Trions

Electrons commonly couple through Fr\"ohlich interactions with longitudinal optical phonons to form polarons. However, trions possess a finite angular momentum and should therefore couple instead to rotational optical phonons. This creates a polaronic trion whose binding energy is determined by the crystallographic orientation of the lattice. Here, we demonstrate theoretically within the Fr\"ohlich approach and experimentally by photoluminescence emission that the bare trion binding energy (20 meV) is significantly enhanced by the phonons at the interface between the two-dimensional semiconductor MoS$_2$ and the bulk transition metal oxide SrTiO$_3$. The low-temperature {binding energy} changes from 60 meV in [001]-oriented substrates to 90 meV for [111] orientation, as a result of the counter-intuitive interplay between the rotational axis of the MoS$_2$ trion and that of the SrTiO$_3$ phonon mode.

cond-mat.mes-hall↗

arXiv2018

An Inside Look at the Ti-MoS2 Contact in Ultra-thin Field Effect Transistor with Atomic Resolution

Two-dimensional molybdenum disulfide (MoS2) is an excellent channel material for ultra-thin field effect transistors. However, high contact resistance across the metal-MoS2 interface continues to limit its widespread realization. Here, using atomic-resolution analytical scanning transmission electron microscopy (STEM) together with first principle calculations, we show that this contact problem is a fundamental limitation from the bonding and interactions at the metal-MoS2 interface that cannot be solved by improved deposition engineering. STEM analysis in conjunction with theory shows that when MoS2 is in contact with Ti, a metal with a high affinity to form strong bonds with sulfur, there is a release of S from Mo along with the formation of small Ti/TixSy clusters. A destruction of the MoS2 layers and penetration of metal can also be expected. The design of true high-mobility metal-MoS2 contacts will require the optimal selection of the metal or alloy based on their bonding interactions with the MoS2 surface. This can be advanced by evaluation of binding energies with increasing the number of atoms within metal clusters.

cond-mat.mtrl-sci↗

arXiv2016

Valence band electronic structure evolution of graphene oxide upon thermal annealing for optoelectronics

We report valence band electronic structure evolution of graphene oxide (GO) upon its thermal reduction. Degree of oxygen functionalization was controlled by annealing temperatures, and an electronic structure evolution was monitored using real-time ultraviolet photoelectron spectroscopy. We observed a drastic increase in density of states around the Fermi level upon thermal annealing at ~600 oC. The result indicates that while there is an apparent band gap for GO prior to a thermal reduction, the gap closes after an annealing around that temperature. This trend of band gap closure was correlated with electrical, chemical, and structural properties to determine a set of GO material properties that is optimal for optoelectronics. The results revealed that annealing at a temperature of ~500 oC leads to the desired properties, demonstrated by a uniform and an order of magnitude enhanced photocurrent map of an individual GO sheet compared to as-synthesized counterpart.

cond-mat.mtrl-sci↗

arXiv2014

Spatially Resolved Photo-Excited Charge Carrier Dynamics in Phase-Engineered Monolayer MoS2

A fundamental understanding of the intrinsic optoelectronic properties of atomically thin transition metal dichalcogenides (TMDs) is crucial for its integration into high performance semiconductor devices. Here, we investigate the transport properties of chemical vapor deposition (CVD) grown monolayer molybdenum disulfide (MoS2) under photo-excitation using correlated scanning photocurrent microscopy and photoluminescence imaging. We examined the effect of local phase transformation underneath the metal electrodes on the generation of photocurrent across the channel length with diffraction-limited spatial resolution. While maximum photocurrent generation occurs at the Schottky contacts of semiconducting (2H-phase) MoS2, after the metallic phase transformation (1T-phase), the photocurrent peak is observed towards the center of the device channel, suggesting a strong reduction of native Schottky barriers. Analysis using the bias and position dependence of the photocurrent indicates that the Schottky barrier heights are few meV for 1T- and ~200 meV for 2H-contacted devices. We also demonstrate that a reduction of native Schottky barriers in a 1T device enhances the photo responsivity by more than one order of magnitude, a crucial parameter in achieving high performance optoelectronic devices. The obtained results pave a pathway for the fundamental understanding of intrinsic optoelectronic properties of atomically thin TMDs where Ohmic contacts are necessary for achieving high efficiency devices with low power consumption.

cond-mat.mtrl-sci↗

arXiv2013

Reduced graphene oxide thin films as ultrabarriers for organic electronics

Encapsulation of electronic devices based on organic materials that are prone to degradation even under normal atmospheric conditions with hermetic barriers is crucial for increasing their lifetime. A challenge is to develop 'ultrabarriers' that are impermeable, flexible, and preferably transparent. Another important requirement is that they must be compatible with organic electronics fabrication schemes (i.e. must be solution processable, deposited at room temperature and be chemically inert). Here, we report lifetime increase of 1,300 hours for poly(3-hexylthiophene) (P3HT) films encapsulated by uniform and continuous thin (~10 nm) films of reduced graphene oxide (rGO). This level of protection against oxygen and water vapor diffusion is substantially better than conventional polymeric barriers such as CytopTM, which degrades after only 350 hours despite being 400 nm thick. Analysis using atomic force microscopy, x-ray photoelectron spectroscopy and high resolution transmission electron microscopy suggest that the superior oxygen gas/moisture barrier property of rGO is due to the close interlayer distance packing and absence of pinholes within the impermeable sheets. These material properties can be correlated to the enhanced lag time of 500 hours. Our results provide new insight for the design of high performance and solution processable transparent 'ultrabarriers' for a wide range of encapsulation applications.

cond-mat.mtrl-sci↗

arXiv2013

Modeling of the self-limited growth in catalytic chemical vapor deposition of graphene

The development of wafer-scale continuous single-crystal graphene layers is key in view of its prospective applications. To this end, here we pave the way for a graphene growth model in the framework of the Langmuir adsorption theory and two dimensional crystallization. In specific, we model the nucleation and growth of graphene on copper using methane as carbon precursor. The model leads to identification of the range of growth parameters (temperature and gas pressures) that uniquely entails the final surface coverage of graphene. This becomes an invaluable tool to address the fundamental problems of continuity of polycrystalline graphene layers, and crystalline grain dimensions. The model shows agreement with the existing experimental data in the literature. On the basis of the "contour map" for graphene growth developed here and existing evidence of optimized growth of large graphene grains, novel insights for engineering wafer-scale continuous graphene films are provided.

cond-mat.mtrl-sci↗