arXiv subjects

Mark Lundstrom

Publications and source records attributed to Mark Lundstrom.

41 records · Page 3Linked to original sources

arXiv2004

High-Field, Quasi-Ballistic Transport in Short Carbon Nanotubes

Single walled carbon nanotubes with Pd ohmic contacts and lengths ranging from several microns down to 10 nm are investigated by electron transport experiments and theory. The mean free path (mfp) for acoustic phonon scattering is estimated to be lap~300 nm, and that for optical phonon scattering is lop~15 nm. Transport through very short (~10 nm) nanotubes is free of significant acoustic and optical phonon scattering and thus ballistic and quasi-ballistic at the low and high bias voltage limits respectively. High currents of up to 70 uA can flow through a short nanotube. Possible mechanisms for the eventual electrical breakdown of short nanotubes at high fields are discussed. The results presented here have important implications to high performance nanotube transistors and interconnects.

cond-mat.mes-hall↗

arXiv2003

Towards Multi-Scale Modeling of Carbon Nanotube Transistors

Multiscale simulation approaches are needed in order to address scientific and technological questions in the rapidly developing field of carbon nanotube electronics. In this paper, we describe an effort underway to develop a comprehensive capability for multiscale simulation of carbon nanotube electronics. We focus in this paper on one element of that hierarchy, the simulation of ballistic CNTFETs by self-consistently solving the Poisson and Schrodinger equations using the non-equilibrium Greens function (NEGF) formalism. The NEGF transport equation is solved at two levels: i) a semi-empirical atomistic level using the pz orbitals of carbon atoms as the basis, and ii) an atomistic mode space approach, which only treats a few subbands in the tube-circumferential direction while retaining an atomistic grid along the carrier transport direction. Simulation examples show that these approaches describe quantum transport effects in nanotube transistors. The paper concludes with a brief discussion of how these semi-empirical device level simulations can be connected to ab initio, continuum, and circuit level simulations in the multi-scale hierarchy.

cond-mat.mes-hall↗

arXiv2003

Carbon Nanotube Field-Effect Transistors With Integrated Ohmic Contacts and High-k Gate Dielectrics

High performance enhancement mode semiconducting carbon nanotube field-effect transistors (CNTFETs) are obtained by combining ohmic metal-tube contacts, high dielectric constant HfO2 films as gate insulators, and electrostatically doped nanotube segments as source/drain electrodes. The combination of these elements affords high ON currents, subthreshold swings of ~ 70-80 mV/decade, and allows for low OFF currents and suppressed ambipolar conduction. The doped source and drain approach resembles that of MOSFETs and can impart excellent OFF states to nanotube FETs under aggressive vertical scaling. This presents an important advantage over devices with metal source/drain, or devices commonly referred to as Schottky barrier FETs.

cond-mat.mes-hall↗

arXiv2003

Predicted Performance Advantages of Carbon Nanotube Transistors with Doped Nanotubes as Source/Drain

Most carbon nanotube field-effect transistors (CNTFETs) directly attach metal source/drain contacts to an intrinsic nanotube channel. When the gate oxide thickness is reduced, such transistors display strong ambipolar conduction, even when the Schottky barrier for electrons (or for holes) is zero. The resulting leakage current, which increases exponentially with the drain voltage, constrains the potential applications of such devices. In this paper, we use numerical simulations to show that if CNT based metal-oxide-semiconductor (MOS) FETs can be achieved by using heavily doped CNT sections as source and drain, ambipolar conduction will be suppressed, leakage current will be reduced, and the scaling limit imposed by source-drain tunneling will be extended. By eliminating the Schottky barrier between the source and channel, the transistor will be capable of delivering more on-current. The leakage current of such devices will be controlled by the full bandgap of CNTs (instead of half of the bandgap for SB CNTFETs) and band-to-band tunneling. These factors will depend on the diameter of nanotubes and the power supply voltage.

cond-mat.mes-hall↗

arXiv2003

A Numerical Study of Scaling Issues for Schottky Barrier Carbon Nanotube Transistors

We performed a comprehensive scaling study of Schottky barrier carbon nanotube transistors using self-consistent, atomistic scale simulations. We restrict our attention to Schottky barrier carbon nanotube FETs whose metal source/drain is attached to an intrinsic carbon nanotube channel. Ambipolar conduction is found to be an important factor that must be carefully considered in device design, especially when the gate oxide is thin. The channel length scaling limit imposed by source-drain tunneling is found to be between 5nm and 10nm, depending on the off-current specification. Using a large diameter tube increases the on-current, but it also increases the leakage current. Our study of gate dielectric scaling shows that the charge on the nanotube can play an important role above threshold.

cond-mat.mes-hall↗