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Marta Baselga

Publications and source records attributed to Marta Baselga.

6 recordsLinked to original sources

Characterization of Passive CMOS Strip Detectors After Proton Irradiation

Strip detectors are populating outer trackers of high-energy particle experiments. They are convenient for covering large areas of sensitive material since they use less power and have fewer readout channels compared to pixels sensors. Nevertheless, they are typically manufactured with a mask set that covers the full wafer, otherwise when using smaller reticles the strip implants have to be stitched. For this project, strip detectors were fabricated in a CMOS commercial foundry using different reticles to be stitched several times, proving the feasibility of this technology. LFoundry produced the passive CMOS strip detector with a production line of 150 nm node technology, using a 150 um thick FZ wafer. Those strip sensors have three different geometries to study different impacts of the CMOS technology. The strips have lengths of 2.1 cm and 4.1 cm, stitching 3 or 5 reticles respectively. This work shows results of 24 GeV proton irradiated passive CMOS strip detectors. The detectors were irradiated at CERN and were tested with different set-ups, not showing any effect from the strips stitching. Proving that this technology is feasible for detecting high-energy particles opens the door to future large productions of passive strip detectors and also to produce active strip sensors in commercial CMOS foundries.

physics.ins-det

Charge-Carrier transport simulations in diamond detectors with electric-field-dependent mobility and charge-collection-distance-based trapping

Diamond detectors are attractive for operation in harsh radiation environments because they combine radiation tolerance, fast signal formation, and low leakage current. Realistic detector-response simulations require an accurate description of charge-carrier mobility and trapping, which determine both signal amplitude and timing. In this work, we extend \allpix{}, a modular end-to-end detector simulation framework, with diamond-specific transport models. The implementation includes field-dependent mobility parameterizations for electrons and holes and an effective trapping model based on the charge collection distance (CCD), providing a detector-level interface to material quality and radiation-damage measurements. The mobility description is validated in the negligible-trapping limit using single-crystalline CVD diamond by comparing simulated drift velocities and transient-current signals with published reference data. For polycrystalline CVD diamond, the CCD-based trapping model is evaluated using experimentally measured CCD values and compared with laboratory transient-current-technique waveforms. The simulations reproduce the measured drift-velocity behavior in scCVD and the reduced charge collection and degraded transient response observed in pcCVD. The presented implementation enables detector-level studies of charge collection, pulse formation, and timing performance in diamond sensors using experimentally accessible transport and trapping parameters, and provides a practical framework for simulation-driven detector development and radiation-damage studies.

physics.ins-det

TCAD Simulation of Stitching for Passive CMOS Strip Detectors

Most of the tracking detectors for high energy particle experiments are filled with silicon detectors since they are radiation hard, they can give very small spatial resolution and they can take advantage of the silicon electronics foundries developments and production lines. Strip detectors are very useful to cover large areas for tracking purposes, while consuming less power per area compared to pixel sensors. The majority of particle physics experiments use conventional silicon strip detectors fabricated in foundries that do not use stitching, relying on a very small number of foundries worldwide that can provide large amounts of strip detectors. Fabricating strip detectors in a CMOS foundry opens the possibility to use more foundries and to include active elements in the strips for future productions. For the passive CMOS strip detectors project we fabricated strip detectors in a CMOS foundry using two 1 cm2 reticles that are stitched together along the wafer. The fabricated strips stitched the reticles three and five times, and it was shown that the performance of those strips is not affected by the stitching. This paper shows 3D TCAD simulations of the stitching area to investigate the possible effects stitching can have on the performance of the strip detectors, considering different stitching mismatches. We will show that the mismatch of stitched structures up to 1 um does not impact the performance with TCAD simulations which agrees with the results obtained from the measurements.

physics.ins-det

Characterisation and simulation of stitched CMOS strip sensors

In high-energy physics, there is a need to investigate alternative silicon sensor concepts that offer cost-efficient, large-area coverage. Sensors based on CMOS imaging technology present such a silicon sensor concept for tracking detectors. The CMOS Strips project investigates passive CMOS strip sensors fabricated by LFoundry in a 150nm technology. By employing the technique of stitching, two different strip sensor formats have been realised. The sensor performance is characterised based on measurements at the DESY II Test Beam Facility. The sensor response was simulated utilising Monte Carlo methods and electric fields provided by TCAD device simulations. This study shows that employing the stitching technique does not affect the hit detection efficiency. A first look at the electric field within the sensor and its impact on generated charge carriers is being discussed.

physics.ins-det

Characterization of Passive CMOS Strip Sensors

Recent advances in CMOS imaging sensor technology , e.g. in CMOS pixel sensors, have proven that the CMOS process is radiation tolerant enough to cope with certain radiation levels required for tracking layers in hadron collider experiments. With the ever-increasing area covered by silicon tracking detectors cost effective alternatives to the current silicon sensors and more integrated designs are desirable. This article describes results obtained from laboratory measurements of silicon strip sensors produced in a passive p-CMOS process. Electrical characterization and charge collection measurements with a 90Sr source and a laser with infrared wavelength showed no effect of the stitching process on the performance of the sensor.

physics.ins-det

Simulations of 3D-Si sensors for the innermost layer of the ATLAS pixel upgrade

The LHC is expected to reach luminosities up to 3000fb-1 and the innermost layer of the ATLAS upgrade plans to cope with higher occupancy and to decrease the pixel size. 3D-Si sensors are a good candidate for the innermost layer of the ATLAS pixel upgrade since they exhibit good performance under high fluences and the new designs will have smaller pixel size to fulfill the electronics expectations. This paper reports TCAD simulations of the 3D-Si sensors designed at IMB-CNM with non passing-through columns that are being fabricated for the next innermost layer of the ATLAS pixel upgrade, shows the charge collection response before and after irradiation, and the response of 3D-Si sensors located at large $η$ angles.

physics.ins-det