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Mengkun Tian

Publications and source records attributed to Mengkun Tian.

12 recordsLinked to original sources

Engineering Wake-Up-Free Ferroelectric Capacitors with Enhanced High-Temperature Reliability

We systematically explore the design space of ferroelectric hafnium-zirconium oxide (H0.5Z0.5O or HZO) heterostructures for reliable high temperature operation. HZO films are deposited using thermal and plasma-enhanced atomic layer deposition (Th-ALD and PE-ALD) on tungsten (W) and titanium nitride (TiN) bottom electrodes (BE), while maintaining identical top electrodes. We demonstrate that PE-ALD HZO capacitors integrated with W BE exhibit wake-up-free switching up to 125C, along with significantly improved endurance compared to Th-ALD HZO/W devices across a wide temperature range (85-125C). By decoupling the contributions of the plasma-deposited HZO film and the oxidized bottom interface inherently formed during PE-ALD, we identify the oxidized W interfacial layer (WOx) as the primary factor governing endurance enhancement and wake-up suppression at elevated temperatures, while the PE-ALD HZO film provides secondary benefits in reducing wake-up. In contrast, PE-ALD HZO capacitors fabricated on TiN BE show no substantial improvement in wake-up behavior or endurance relative to Th-ALD HZO/TiN devices, despite the formation of an unintentional TiOxNy interfacial layer, and instead exhibit degraded polarization. This difference arises from the significantly weaker endurance enhancement and no wake-up suppression provided by oxidized TiN compared to oxidized W under comparable oxidation conditions. Overall, PE-ALD HZO films enable superior ferroelectric performance at elevated temperatures only when deposited on W BE, while Th-ALD HZO films remain a viable option for high temperature operation on TiN BE. These findings clarify the interplay between deposition technique, electrode chemistry, and interfacial oxidation, and provide design guidelines for integrating ferroelectric memories into monolithic 3D systems under stringent thermal constraints.

cond-mat.mtrl-sci

ALD-Derived WO3-x Leads to Nearly Wake-Up-Free Ferroelectric Hf0.5Zr0.5O2 at Elevated Temperatures

Breaking the memory wall in advanced computing architectures will require complex 3D integration of emerging memory materials such as ferroelectrics-either within the back-end-of-line (BEOL) of CMOS front-end processes or through advanced 3D packaging technologies. Achieving this integration demands that memory materials exhibit high thermal resilience, with the capability to operate reliably at elevated temperatures such as 125C, due to the substantial heat generated by front-end transistors. However, silicon-compatible HfO2-based ferroelectrics tend to exhibit antiferroelectric-like behavior in this temperature range, accompanied by a more pronounced wake-up effect, posing significant challenges to their thermal reliability. Here, we report that by introducing a thin tungsten oxide (WO3-x) layer-known as an oxygen reservoir-and carefully tuning its oxygen content, ultra-thin Hf0.5Zr0.5O2 (5 nm) films can be made robust against the ferroelectric-to-antiferroelectric transition at elevated temperatures. This approach not only minimizes polarization loss in the pristine state but also effectively suppresses the wake-up effect, reducing the required wake-up cycles from 105 to only 10 at 125C- a qualifying temperature for back-end memory integrated with front-end logic, as defined by the JEDEC standard. First-principles density functional theory calculations reveal that WO3 enhances the stability of the ferroelectric orthorhombic phase at elevated temperatures by increasing the tetragonal-to-orthorhombic phase energy gap, and promoting favorable phonon mode evolution, thereby supporting o-phase formation under both thermodynamic and kinetic constraints.

cond-mat.mtrl-sci

The First Switch Effect in Ferroelectric Field-Effect Transistors

In this work, a ferroelectric field-effect transistor (FEFET) is systematically characterized and compared with an equivalent standard MOSFET with an equivalent oxide thickness. We show that these two devices, with a silicon channel, exhibit similar pristine state transfer characteristics but starkly different endurance characteristics. In contrast to the MOSFET, the FEFET shows a significant increase in sub-threshold swing in the first write pulse. Based on this, we reveal that this first write pulse (cycle 1) generates more than half of the total traps generated during the fatigue cycling in FEFETs. We call this the 'First Switch Effect'. Further, by polarizing a pristine FEFET step by step, we demonstrate a direct correlation between the switched polarization and interface trap density during the first switch. Through charge pumping measurements, we also observe that continued cycling generates traps more towards the bulk of the stack, away from the Si/SiO2 interface in FEFETs. We establish that: (1) the first switch effect leads to approximately 50% of the total trap density (Nit) near the Si/SiO2 interface until memory window closure; and (2) further bipolar cycling leads to trap generation both at and away from Si/SiO2 interface in FEFETs.

cond-mat.mtrl-sci

Hf/Zr Superlattice-Based High-\k{appa} Gate Dielectrics with Dipole Layer Engineering for Advanced CMOS

Advanced logic transistors require gate dielectrics that achieve sub-nanometer equivalent oxide thickness (EOT), suppress leakage, and satisfy three key requirements: (i) compatibility with RMG-like high-temperature processing, (ii) sufficient Vth tunability for multi-Vth design, and (iii) high device reliability. However, meeting all of these requirements simultaneously has been difficult with conventional high-k systems. In this work, we demonstrate that Hf/Zr-based gate stacks quantitatively satisfy these conditions. After a 700 C N2 anneal, the HZH superlattice achieves an EOT of 7.3 A, lower than conventional HfO2-only stacks (8.5 A) while maintaining comparable leakage. Embedding a 3 A Al2O3 dipole within an HfO2/ZrO2/HfO2 superlattice (HZHA) breaks the conventional dipole trade-off, achieving an EOT of 8.4 A, lower than the 9.0 A of a standard HfO2/Al2O3 stack, while providing a flatband voltage shift greater than 200 mV, thereby enabling multi-Vth tuning without compromising scaling. Furthermore, under -2 V negative-bias temperature stress at 125 C for 100 s, HZHA and HA exhibit comparable flatband voltage drifts of 87 mV and 97 mV, respectively, confirming that strong Vth tunability and sub-nanometer EOT can be achieved without compromising stability. In addition to these quantitative advances, this study reveals previously unreported physical insights into dipole behavior and interfacial diffusion in ultrathin Hf/Zr multilayers. These results establish HZHA as an RMG-compatible, Vth-tunable, low-EOT dielectric platform capable of supporting logic scaling beyond the 1 nm frontier.

cond-mat.mes-hall

FeNOMS: Enhancing Open Modification Spectral Library Search with In-Storage Processing on Ferroelectric NAND (FeNAND) Flash

The rapid expansion of mass spectrometry (MS) data, now exceeding hundreds of terabytes, poses significant challenges for efficient, large-scale library search - a critical component for drug discovery. Traditional processors struggle to handle this data volume efficiently, making in-storage computing (ISP) a promising alternative. This work introduces an ISP architecture leveraging a 3D Ferroelectric NAND (FeNAND) structure, providing significantly higher density, faster speeds, and lower voltage requirements compared to traditional NAND flash. Despite its superior density, the NAND structure has not been widely utilized in ISP applications due to limited throughput associated with row-by-row reads from serially connected cells. To overcome these limitations, we integrate hyperdimensional computing (HDC), a brain-inspired paradigm that enables highly parallel processing with simple operations and strong error tolerance. By combining HDC with the proposed dual-bound approximate matching (D-BAM) distance metric, tailored to the FeNAND structure, we parallelize vector computations to enable efficient MS spectral library search, achieving 43x speedup and 21x higher energy efficiency over state-of-the-art 3D NAND methods, while maintaining comparable accuracy.

cs.AR

A van der Waals material exhibiting room temperature broken inversion symmetry with ferroelectricity

Since the initial synthesis of van der Waals two-dimensional indium selenide was first documented in 1957, five distinct polymorphs and their corresponding polytypes have been identified. In this study, we report a unique phase of indium selenide via Scanning Transmission Electron Microscopy (STEM) analysis in the synthesized large-area films -- which we have named the $\beta^\text{p}$ phase. The quintuple layers of the $\beta^\text{p}$ phase, characterized by a unique zigzag atomic configuration with unequal indium-selenium bond lengths from the middle selenium atom, are distinct from any other previously reported phase of indium selenide. Cross-sectional STEM analysis has revealed that the $\beta^\text{p}$ layers exhibit intralayer shifting. We found that indium selenide films with $\beta^\text{p}$ layers display electric-field-induced switchable polarization characteristic of ferroelectric materials, suggesting the breaking of the inversion symmetry. Experimental observations of nonlinear optical phenomena -- Second Harmonic Generation (SHG) responses further support this conclusion. This study reports a $\beta^\text{p}$ phase of indium selenide showing ferroelectricity over large areas at room temperature in a low-dimensional limit.

cond-mat.mtrl-sci

Creation of Lunar-Like Rims in Ilmenite using Synthetic Solar Wind

Space weathering of lunar minerals, due to bombardment from solar wind (SW) particles and micrometeoroid impacts, modifies the mineralogy within tens of nanometers of the surface, i.e., the rim. Spectroscopic signatures of these modifications, observed via remote sensing, have long been used to gauge surface exposure times on the Moon. However, the relative contributions of SW and micrometeoroids in the creation of rim features are still debated, particularly for the nanometer-scale clusters known as nanophase iron (npFe0), which commonly form in ferrous minerals. We address this issue in the laboratory, using deuterium ions and low-energy electrons as a synthetic solar wind plasma to irradiate ilmenite (FeTiO3), a common lunar mineral. Characterization by high-resolution scanning transmission electron microscopy and electron energy-loss spectroscopy shows that the SW alone creates rims with all the main characteristics of lunar samples. We conclusively identify npFe0 and quantify its distribution as a function of depth and fluence, allowing us to estimate the SW exposure of Apollo soil 71501. Our results confirm that small npFe0 particles (<10 nm in diameter) form from SW irradiation. Such experiments provide microscopic details of space weathering, improving the link between surface modification processes and macroscopic remote-sensing data.

astro-ph.EP

Sub-nm2 ferroelectric domains via charged 180 degree walls in ZrO2

Flat phonon bands in fluorite ferroelectrics (HfO2 or ZrO2) shrink polar domains laterally to an irreducible half-unit-cell width (0.27 nm) within which the vertical arrangement of dipoles is expected to remain uniform. We report on the direct observation of nonuniform and nearly discrete vertical arrangements of dipoles in ZrO2 thin films consisting of closely spaced head-to-head (HH) and tail-to-tail (TT) charged 180 degree walls, each exhibiting a distinct bulk-like structure. These charged domain walls (CDWs) further compress the irreducibly narrow, laterally stacked domains vertically to a thickness of 1-2.75 nm, yielding in-plane domains with sub-nm2 footprints-among the smallest ever reported for any ferroelectric material. The HH and TT walls form due to their flat longitudinal optical (LO) polar bands and are electrostatically stabilized by bound-charge compensation via interstitial oxygen atoms, which act as natural structural defects at the HH walls. Moreover, these walls are predicted to be conducting and to exhibit ultralow propagation barriers, with HH walls (1.6 meV) being far more mobile than TT walls (22.3 meV), indicating strong potential for low-voltage, domain-wall-based nanoelectronics.

cond-mat.mtrl-sci

Sharp spectroscopic fingerprints of disorder in an incompressible magnetic state

Disorder significantly impacts the electronic properties of conducting quantum materials by inducing electron localization and thus altering the local density of states and electric transport. In insulating quantum magnetic materials, the effects of disorder are less understood and can drastically impact fluctuating spin states like quantum spin liquids. In the absence of transport tools, disorder is typically characterized using chemical methods or by semi-classical modeling of spin dynamics. This requires high magnetic fields that may not always be accessible. Here, we show that magnetization plateaus -- incompressible states found in many quantum magnets -- provide an exquisite platform to uncover small amounts of disorder, regardless of the origin of the plateau. Using optical magneto-spectroscopy on the Ising-Heisenberg triangular-lattice antiferromagnet K$_2$Co(SeO$_3$)$_2$ exhibiting a 1/3 magnetization plateau, we identify sharp spectroscopic lines, the fine structure of which serves as a hallmark signature of disorder. Through analytical and numerical modeling, we show that these fingerprints not only enable us to quantify minute amounts of disorder but also reveal its nature -- as dilute vacancies. Remarkably, this model explains all details of the thermomagnetic response of our system, including the existence of multiple plateaus. Our findings provide a new approach to identifying disorder in quantum magnets.

cond-mat.mtrl-sci

Ion-Assisted Nanoscale Material Engineering in Atomic Layers

Achieving deterministic control over the properties of low-dimensional materials with nanoscale precision is a long-sought goal. Mastering this capability has a transformative impact on the design of multifunctional electrical and optical devices. Here, we present an ion-assisted synthetic technique that enables precise control over the material composition and energy landscape of two-dimensional (2D) atomic crystals. Our method transforms binary transition metal dichalcogenides (TMDs), like MoSe$_2$, into ternary MoS$_{2\alpha}$Se$_{2(1-{\alpha}})$ alloys with systematically adjustable compositions, ${\alpha}$. By piecewise assembly of the lateral, compositionally modulated MoS$_{2\alpha}$Se$_{2(1-{\alpha})}$ segments within 2D atomic layers, we present a synthetic pathway towards the realization of multi-compositional designer materials. Our technique enables the fabrication of complex structures with arbitrary boundaries, dimensions as small as 30 nm, and fully customizable energy landscapes. Our optical characterizations further showcase the potential for implementing tailored optoelectronics in these engineered 2D crystals.

cond-mat.mtrl-sci

Discovering the nanoscale origins of localized corrosion in additive manufactured stainless steel 316L by in situ liquid cell TEM

Additive manufacturing (AM) by laser powder bed fusion (L-PBF) leads to the formation of a rich, hierarchical microstructure, including dislocation cell structures and elemental segregation. This structure has profound impacts on the corrosion behavior and mechanical properties of printed materials. In this study, we use in situ liquid cell scanning transmission electron microscope (STEM) to directly characterize the nanoscale origins of corrosion initiation in AM 316L stainless steel. Under applied anodic potentials, we found that the dislocation cellular boundaries were preferentially corroded and that pit-like features formed along the cellular boundaries. We directly observed the earliest stages of corrosion by controlling the biasing parameters to decelerate the corrosion processes. The results show that highly localized corrosion occurs via inclusion dissolution along dislocation cell boundaries. More widespread corrosion initiates at the dislocation cell boundaries and spreads throughout the dislocation networks.

cond-mat.mtrl-sci

Antiferroelectric negative capacitance from a structural phase transition in zirconia

Crystalline materials with broken inversion symmetry can exhibit a spontaneous electric polarization, which originates from a microscopic electric dipole moment. Long-range polar or anti-polar order of such permanent dipoles gives rise to ferroelectricity or antiferroelectricity, respectively. However, the recently discovered antiferroelectrics of fluorite structure (HfO$_2$ and ZrO$_2$) are different: A non-polar phase transforms into a polar phase by spontaneous inversion symmetry breaking upon the application of an electric field. Here, we show that this structural transition in antiferroelectric ZrO$_2$ gives rise to a negative capacitance, which is promising for overcoming the fundamental limits of energy efficiency in electronics. Our findings provide insight into the thermodynamically 'forbidden' region of the antiferroelectric transition in ZrO$_2$ and extend the concept of negative capacitance beyond ferroelectricity. This shows that negative capacitance is a more general phenomenon than previously thought and can be expected in a much broader range of materials exhibiting structural phase transitions.

cond-mat.mtrl-sci