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Michael Liao

Publications and source records attributed to Michael Liao.

11 recordsLinked to original sources

Nonlinear Characterization of Thin-Film LiNbO3 Acoustic Filters

Compact, high-performance components in millimeter-wave (mmWave) communication systems demand new acoustic filter technology at increasingly higher frequencies. Among various promising mmWave platforms, first-order antisymmetric (A1) mode laterally excited bulk acoustic resonators (XBARs) in thin-film lithium niobate (LiNbO3) have perhaps the most impressive linear performance. Despite these advances, there are few reports of nonlinear characterization of LiNbO3 filters at mmWaves. Here, we address this gap by developing a new nonlinear methodology for high-frequency filters. The result is a methodology for performing power-dependent S-parameters and third-order intermodulation (IMD3) measurements. To test our methodology, we fabricated filters on transferred single-crystal LiNbO3 films on sapphire (Al2O3) and silicon (Si) substrates with amorphous silicon (aSi) sacrificial layer. At 21.8 GHz, the filters on Al2O3 demonstrated an insertion loss of 1.48 dB, a 3 dB fractional bandwidth (FBW) of 17.7%, and in-band third-order input intercept points (IIP3) of 50.8 dBm. At 21.6 GHz, the filters on silicon demonstrated an insertion loss of 2.47 dB, a 3 dB FBW of 18.6%, and in-band IIP3 of 46.5 dBm. The nonlinear results conclusively show that thermal stability and passband distortion improved on the Al2O3 substrate, confirming that substrate selection plays a pivotal role in mitigating nonlinearity in acoustic front-end modules.

eess.SP

Thermal Endurance of Suspended Thin-Film Lithium Niobate up to 800 {\deg}C

The need for high-temperature piezoelectric microelectromechanical systems (MEMS) requires pushing piezoelectric platforms to their thermal limits. In harsh thermal environments, piezoelectric MEMS devices are expected to sustain severe damage because of material degradation and coefficient of thermal expansion (CTE) mismatches between the functional layers and the carrier wafer. This paper investigates the thermal endurance of the suspended thin-film lithium niobate (LN) platform by observing the structural integrity and performance of acoustic Lamb wave resonators after annealing rounds at increasing temperatures, with a focus on temperatures between 550 $^\circ$C and 800 $^\circ$C, with 50 $^\circ$C temperature increments. Fundamental symmetric (S0) mode acoustic resonators are fabricated on 600 nm stoichiometric LN (sLN) with 40 nm thick platinum top electrodes and a thin titanium adhesion layer. After each annealing round, changes in the devices' resonant frequency and quality factor (\emph{Q}) are quantitatively studied. The devices and material stack are further analyzed with resistivity structures, optical microscope images, and X-ray diffraction (XRD) measurements. The results provide valuable insights into the design and material selection necessary to optimize the suspended thin-film LN platform for high temperatures. Understanding the thermal limit of the platform enables its use for sensors, actuators, resonators, and potentially other thin-film LN microsystems, e.g, photonics, electro-optical, and acousto-optical systems in harsh thermal environments.

physics.app-ph

An 11.7-GHz ScAlN FBAR Filter: Case Study on Scaling Limits and Challenges

This paper reports an 11.7 GHz compact 50 ohm ladder filter based on single layer Scandium Aluminum Nitride (ScAlN) film bulk acoustic resonators (FBARs) with platinum (Pt) electrodes, and uses it as a quantitative case study of the limits encountered when directly scaling to higher frequencies. The measured filter achieves a 3 dB fractional bandwidth (FBW) of 4.0% and an out of band rejection greater than 23.1 dB, with a minimum insertion loss (IL) of 6.8 dB. We analyze the origin of this performance through a quantitative framework: (1) a loss decomposition study, (2) frequency shift sensitivity that explains the discrepancy between simulated and measured center frequency, (3) FBW sensitivity to series shunt separation and port impedance, and (4) stress limited aperture that constrains device size. The results establish a realistic, fabricable baseline for directly scaled single layer ScAlN FBAR filters and outline materials, electrode, and stress management directions toward lower loss mmWave acoustic filters.

physics.app-ph

Periodically Poled Piezoelectric Lithium Niobate Resonator for Piezoelectric Power Conversion

As the demand for compact and efficient power conversion systems increases, piezoelectric power converters have gained attention for their ability to replace bulky magnetic inductors with acoustic resonators, enabling higher power density and improved efficiency. Achieving optimal converter performance requires resonators with high quality factor ($Q$), strong electromechanical coupling ($k^2$), high power handling capability, and a spurious-free response. Lithium niobate (LN) has emerged as a promising material in this context due to its high figure of merit (FoM = $Q \cdot k^2$). While previous studies on single-layer LN resonators have demonstrated high FoM values, they typically operate at relatively low resonance frequencies ($f_s$). Recently, periodically poled piezoelectric film (P3F) structures, formed by stacking piezoelectric layers with alternating crystal orientations, have shown the potential to both scale up the operating frequency and enhance the FoM compared to single-layer counterparts in piezoelectric power conversion. This work presents the first P3F thickness-extensional (TE) LN resonator for power conversion, operating at 19.23 MHz, with a large \textit{$k^2$} of 29\% and a high \textit{Q} of 3187, achieving a state-of-the-art (\textit{ $f_s \cdot Q$}) product among piezoelectric power resonators. A high-power testing procedure is performed to systematically study the nonlinear behavior and power handling of P3F LN for power applications. With further optimization, P3F TE resonators have the potential to open up a new design space for high-power and high-frequency power conversion.

physics.app-ph

50 GHz Piezoelectric Acoustic Filter

This paper presents significant frequency scaling of acoustic filter technology to 50 GHz. This achievement is enabled by the P3F LiNbO3 multilayer stack, in which piezoelectric thin-films of alternating orientations are transferred in sequence, thereby allowing efficient exploitation of high-order modes with high quality factor (Q) and coupling coefficient (k2) in a thicker piezoelectric stack. The demonstrated filter is comprised of twelfth-order symmetric (S12) mode lateral-field-excited bulk acoustic wave resonators (XBARs), built on a 4-layer periodically poled piezoelectric (P3F) 128 Y-cut lithium niobate (LiNbO3) stack. The filter exhibits 3.3 dB insertion loss (IL) and a fractional bandwidth (FBW) of 2.9%. The miniature design, with a footprint of 0.36 mm2, makes it promising for future wireless front-end applications. These results represent the highest frequency acoustic filters reported to date, setting a new benchmark in piezoelectric filter technology. Upon further development, the platform could enable filters further into the FR2 range, essential for next-generation communication systems.

eess.SP

Thin-film scandium aluminum nitride bulk acoustic resonator with high Q of 208 and K2 of 9.5% at 12.5 GHz

This work describes sputtered scandium aluminum nitride (ScAlN) thin-film bulk acoustic resonators (FBAR) at 12.5 GHz with high electromechanical coupling (k2) of 9.5% and quality factor (Q) of 208, resulting in a figure of merit (FoM, Qk2) of 19.8. ScAlN resonators employ a stack of 90 nm thick 20% Sc doping ScAlN piezoelectric film on the floating bottom 38 nm thick platinum (Pt) electrode to achieve low losses and high coupling toward centimeter wave (cmWave) frequency band operation. Three fabricated and FBARs are reported, show promising prospects of ScAlN-Pt stack towards cmWave front-end filters.

physics.app-ph

An LLM-Integrated Framework for Completion, Management, and Tracing of STPA

In many safety-critical engineering domains, hazard analysis techniques are an essential part of requirement elicitation. Of the methods proposed for this task, STPA (System-Theoretic Process Analysis) represents a relatively recent development in the field. The completion, management, and traceability of this hazard analysis technique present a time-consuming challenge to the requirements and safety engineers involved. In this paper, we introduce a free, open-source software framework to build STPA models with several automated workflows powered by large language models (LLMs). In past works, LLMs have been successfully integrated into a myriad of workflows across various fields. Here, we demonstrate that LLMs can be used to complete tasks associated with STPA with a high degree of accuracy, saving the time and effort of the human engineers involved. We experimentally validate our method on real-world STPA models built by requirement engineers and researchers. The source code of our software framework is available at the following link: https://github.com/blueskysolarracing/stpa.

cs.SE

Unraveling the nature of quasi van der Waals Epitaxy of magnetic topological insulators Cr: (BixSb1-x)2Te3 on a GaAs (111) substrate through coherently strained interface

Quasi van der Waals Epitaxy (qvdWE) has been realized for decades at the interfaces between 3D and 2D materials or van der Waals materials. The growth of magnetic topological insulators (MTI) Cr: (BixSb1-x)2Te3 (CBST) on GaAs (111) substrates for Quantum Anomalous Hall Effect (QAH) is actually one of the examples of qvdWE, which is not well noticed despite the fact that its advantages have been used in growth of various MTI materials. This is distinguished from the growth of MTIs on other substrates. Although the qvdWE mode has been used in many 2D growth on III-V substrates, the specific features and mechanisms are not well demonstrated and summarized yet. Here in this work, we have for the first time shown the features of both coherent interfaces and the existence of strain originating from qvdWE at the same time.

cond-mat.mtrl-sci

Transferred Thin Film Lithium Niobate as Millimeter Wave Acoustic Filter Platforms

This paper reports the first high-performance acoustic filters toward millimeter wave (mmWave) bands using transferred single-crystal thin film lithium niobate (LiNbO3). By transferring LiNbO3 on the top of silicon (Si) and sapphire (Al2O3) substrates with an intermediate amorphous Si (aSi) bonding and sacrificial layer, we demonstrate compact acoustic filters with record-breaking performance beyond 20 GHz. In the LN-aSi-Al2O3 platform, the third-order ladder filter exhibits low insertion loss (IL) of 1.62 dB and 3-dB fractional bandwidth (FBW) of 19.8% at 22.1 GHz, while in the LN-aSi-Si platform, the filter shows low IL of 2.38 dB and FBW of 18.2% at 23.5 GHz. Material analysis validates the great crystalline quality of the stacks. The high-resolution x-ray diffraction (HRXRD) shows full width half maximum (FWHM) of 53 arcsec for Al2O3 and 206 arcsec for Si, both remarkably low compared to piezoelectric thin films of similar thickness. The reported results bring the state-of-the-art (SoA) of compact acoustic filters to much higher frequencies, and highlight transferred LiNbO3 as promising platforms for mmWave filters in future wireless front ends.

eess.SP

Thin-Film Lithium Niobate Acoustic Resonator with High Q of 237 and k2 of 5.1% at 50.74 GHz

This work reports a 50.74 GHz lithium niobate (LiNbO3) acoustic resonator with a high quality factor (Q) of 237 and an electromechanical coupling (k2) of 5.17% resulting in a figure of merit (FoM, Q x k2) of 12.2. The LiNbO3 resonator employs a novel bilayer periodically poled piezoelectric film (P3F) 128 Y-cut LiNbO3 on amorphous silicon (a-Si) on sapphire stack to achieve low losses and high coupling at millimeter wave (mm-wave). The device also shows a Q of 159, k2 of 65.06%, and FoM of 103.4 for the 16.99 GHz tone. This result shows promising prospects of P3F LiNbO3 towards mm-wave front-end filters.

eess.SP

Experimental Observation of High Intrinsic Thermal Conductivity of AlN

AlN is an ultra-wide bandgap semiconductor which has been developed for applications including power electronics and optoelectronics. Thermal management of these applications is the key for stable device performance and allowing for long lifetimes. AlN, with its potentially high thermal conductivity, can play an important role serving as a dielectric layer, growth substrate, and heat spreader to improve device performance. However, the intrinsic high thermal conductivity of bulk AlN predicted by theoretical calculations has not been experimentally observed because of the difficulty in producing materials with low vacancy and impurity levels, and other associated defect complexes in AlN which can decrease the thermal conductivity. This work reports the growth of thick AlN layers by MOCVD with an air-pocketed AlN layer and the first experimental observation of intrinsic thermal conductivity from 130 K to 480 K that matches density-function-theory calculations for single crystal AlN, producing some of the highest values ever measured. Detailed material characterizations confirm the high quality of these AlN samples with one or two orders of magnitude lower impurity concentrations than seen in commercially available bulk AlN. Measurements of these commercially available bulk AlN substrates from 80 K to 480 K demonstrated a lower thermal conductivity, as expected. A theoretical thermal model is built to interpret the measured temperature dependent thermal conductivity. Our work demonstrates that it is possible to obtain theoretically high values of thermal conductivity in AlN and such films may impact the thermal management and reliability of future electronic and optoelectronics devices.

cond-mat.mtrl-sci