Comparison of time-resolved photoluminescence and deep-level transient spectroscopy defect evaluations in an InAs nBn detector subjected to in-situ and ex-situ 63 MeV proton irradiation
Deep-level transient spectroscopy and temperature-dependent time-resolved photoluminescence experiments are performed on identical InAs nBn photodetector structures as a function of in-situ and ex-situ 63 MeV proton irradiation to assess their generation and recombination dynamics. Pre-irradiation, the n-type InAs absorbing region exhibits a steadily increasing minority carrier lifetime with increasing temperature, providing evidence that excited minority carriers may be recombining via shallow defect levels. From deep-level transient spectroscopy, two features are found between 10 K and 275 K: a low temperature broad shoulder, which suggests emission from multiple shallow electron defect levels with energies < 29 meV, and a high temperature minimum occurring at approximately 230 K with an activation energy of 539 meV, which suggests a defect in the barrier layer in the device. Two similar nBn detectors are then subjected to 63 MeV proton irradiation in step doses and measured between steps. One experiment is performed in-situ with an nBn held at approximately 10 K during dosing, and the other experiment is performed ex-situ with a similar nBn held at room temperature for dosing. The ex-situ dosing results in an evaluation of the defect introduction rate that is three to four times lower than in-situ due to partial annealing of the proton-induced displacement damage at room temperature. The results for these two experiments are then compared with the dose-dependent recombination rate analysis, resulting in an estimated recombination defect cross-section of 1.6x10^(-13) cm^2 for the shallow shoulder defect.