Low optical loss electrical isolation for multi-section monolithic GaSb-based photonic circuits
Monolithic photonic integrated circuits (PICs) platforms exploiting III-V materials combine passive and active waveguide structures in multi-section optoelectronic device architectures. Their operation requires high electrical isolation between adjacent functional sections without compromising the optical signal. This fundamental requirement is addressed for GaSb-based waveguides, which are known to exhibit high conductivity of p-type layers reducing the electrical isolation capability. To this end, a co-designed electrical-optical isolation strategy based on using deeply etched strip waveguides combined with adiabatic ridge-to-strip waveguide tapers in GaSb-based multiple-quantum-well heterostructures is proposed. While deep etching alone enables isolation resistances of up to 40 k-ohm, it severely degrades optical propagation. By introducing optimized adiabatic tapers, we demonstrate good optical performance as single-mode continuous-wave lasing in a two-section device with integrated absorber, while maintaining an isolation resistance of 17.3 k-ohm; this corresponds to an approximately 17-fold improvement over previously reported GaSb two-section devices. The approach establishes a critical building block for the development of monolithic GaSb-based PICs operating above 2 um.