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Petr Vašina

Publications and source records attributed to Petr Vašina.

3 recordsLinked to original sources

Effect of oxygen content on optical, structural, and dielectric properties of Al$_x$Ta$_y$O$_z$$ thin films

This study reports on the optical, structural, and dielectric properties of aluminum tantalum oxide (Al$_x$Ta$_y$O$_z$) thin films deposited at low temperature on silicon and steel substrates by pulsed direct current reactive magnetron sputtering of a target containing 80 at.% aluminum and 20 at.% tantalum in Ar/O$_2$ atmosphere. Oxygen flow rates ranging from 5.0 to 20 sccm corresponded to O content changes from 57.7 to 69.6 at.% and resulted in large differences in dielectric behavior, from films with no measurable dielectric strength to a dielectric strength of 231 V$μ$m$^{-1}$, respectively. Ab initio calculations were employed to explain the large property changes, and we show that a decrease in the dielectric strength can be linked to the formation of metal-metal bonds in the material, when the O content is less than what would correspond to a stoichiometric Ta$_2$O$_5$ and Al$_2$O$_3$ mixture. The electronic states corresponding to the metal--metal bonds are located in the band gap close to the top of the valence band, leading to an effective band gap reduction, which is directly supported by X-ray photoelectron spectroscopy valence band measurements and by a broad optical absorption in the visible region.

cond-mat.mtrl-sci↗

Prediction and identification of point defect fingerprints in X-ray photoelectron spectra of TiN$_x$ with 1.18 $\le x \le$ 1.37

We investigate the effect of selected N and Ti point defects in $B$1 TiN on N 1s and Ti\,2p$_{3/2}$ binding energies (BE) by experiments and ab initio calculations. X-ray photoelectron spectroscopy (XPS) measurements of TiN$_x$ films with 1.18 $\le x \le$ 1.37 reveal additional N 1s spectral components at lower binding energies. Ab initio calculations predict that these components are caused by either Ti vacancies, which induce a N 1s BE shift of -0.54 eV in its first N neighbors, and/or N tetrahedral interstitials, which have their N 1s BE shifted by -1.18 eV and shift the BE of their first N neighbors by -0.53 eV. However, based on {\it ab initio} data the tetrahedral N interstitial is estimated to be unstable at room temperature. We, therefore, unambiguously attribute the N 1s spectral components at lower BE in Ti-deficient TiN$_x$ thin films to the presence of Ti vacancies. Furthermore, it is demonstrated that the vacancy concentration in Al-capped Ti-deficient TiN$_x$ can be quantified with the here proposed correlative method based on measured and predicted BE data. Our work highlights the potential of ab initio-guided XPS measurements for detecting and quantifying point defects in $B$1 TiN$_x$.

cond-mat.mtrl-sci↗

Bond formation at polycarbonate | X interfaces (X = Al$_2$O$_3$, TiO$_2$, TiAlO$_2$) studied by theory and experiments

Interfacial bond formation during sputter deposition of metal oxide thin films onto polycarbonate (PC) is investigated by ab initio molecular dynamics simulations and X-ray photoelectron spectroscopy (XPS) analysis of PC | X interfaces (X = Al$_2$O$_3$, TiO$_2$, TiAlO$_2$). Generally, the predicted bond formation is consistent with the experimental data. For all three interfaces, the majority of bonds identified by XPS are (C-O)-metal bonds, whereas C-metal bonds are the minority. Compared to the PC | Al$_2$O$_3$ interface, the PC | TiO$_2$ and PC | TiAlO$_2$ interfaces exhibit a reduction in the measured interfacial bond density by ~ 75 and ~ 65%, respectively. Multiplying the predicted bond strength with the corresponding experimentally determined interfacial bond density shows that Al$_2$O$_3$ exhibits the strongest interface with PC, while TiO$_2$ and TiAlO$_2$ exhibit ~ 70 and ~ 60% weaker interfaces, respectively. This can be understood by considering the complex interplay between the metal oxide composition, the bond strength as well as the population of bonds that are formed across the interface.

cond-mat.mtrl-sci↗