arXiv subjects

Petra Reinke

Publications and source records attributed to Petra Reinke.

4 recordsLinked to original sources

arXiv2021

Correlating surface stoichiometry and termination in SrTiO$_{3}$ films grown by hybrid molecular beam epitaxy

Hybrid oxide molecular beam epitaxy (hMBE), a thin-film deposition technique in which transition metal cations are delivered using a metal-organic precursor, has emerged as the state-of-the-art approach to the synthesis of electronic-grade complex oxide films with a stoichiometric growth window. However, numerous questions remain regarding the chemical mechanisms of the growth process and the surface properties of the resulting films. To examine these properties, thin film SrTiO$_{3}$ (STO) was prepared by hMBE using a titanium tetraisopropoxide (TTIP) precursor for Ti delivery and an elemental Sr source on annealed STO and Nb-doped STO substrates with varying TTIP:Sr flux ratios to examine the conditions for the reported stoichiometric growth window. The films were transferred in vacuo to an x-ray photoelectron spectroscopy system to study the surface elemental composition. Samples were examined using x-ray diffraction to compare our surface sensitive results with previously reported measurements of the bulk of the films in the literature. Ex situ studies by atomic force microscopy, scanning tunneling microscopy and low energy electron microscopy confirmed the presence of surface reconstructions and an Ehrlich-Schwoebel barrier consistent with an A-site SrO termination. We find that a surface exhibiting a mixture of SrO and TiO$_{2}$ termination, or a full SrO termination is necessary to obtain stoichiometric adsorption-controlled growth. These results indicate that surface Sr is necessary to maintain chemical equilibrium for stoichiometric growth during the hMBE process, which is important for the design of future interfacial systems using this technique.

cond-mat.mtrl-sci↗

arXiv2016

Growth of Ni and Ni-Cr Alloy Thin Films on MgO(001): Effect of Alloy Composition on Surface Morphology

The effects of substrate treatment, temperature and composition on the surface morphology of Ni-Cr thin films grown on MgO(001) are studied by scanning tunneling microscopy (STM) and atomic force microscopy (AFM). A combination of acid-etching and high temperature deposition (400C) will result in smooth films and terraces (up to 30 nm wide) suitable for the study of progression of chemical reactions on the surface. Two different treatments are used to prepare the MgO substrates for deposition and they introduce characteristic differences in film surface morphology. Thin films that are grown on the phosphoric acid-treated substrates present reduced nucleation density during the initial stages of film growth which results in long and wide terraces. Due to the about 16 percent lattice mismatch in the Ni(001)/MgO(001) system, film growth at 400C yields discontinuous films and a two-step growth process is necessary to obtain a continuous layer. Ni films are deposited at 100C and subjected to a post-growth anneal at 300C for 2 hours to obtain a smoother surface. The addition of just 5 wt. percent Crchanges the growth processes and yields continuous films at 400C without de-wetting in contrast to pure Ni films. With increasing Cr content, the films become progressively smoother with wider terraces. Ni5Cr alloy thin films have an rms surface roughness of 3.63+/-0.75 nm while Ni33Cr thin film is smoother with an rms roughness of only 0.29 +/-0.13 nm. The changes in film growth initiated by alloying with Cr are due to changes in the interfacial chemistry which favorably alters the initial adsorption of the metal atoms on MgO surface and suggests a reduction of the Ehrlich-Schwoebel barrier. The growth of smooth Ni-Cr thin films with well-defined surface structure opens up a new pathway for a wide range of surface science studies related to alloy performance.

cond-mat.mtrl-sci↗

arXiv2016

3D Nanostructures on Ge/Si(100) Wetting Layers: Hillocks and Pre-Quantum Dots

The annealing of sub-critical Ge wetting layers (WL<3.5 ML) initiates the formation of 3D nanostructures, whose shape and orientation is determined by the WL thickness and thus directly related to the strain energy. The emergence of these nanostructures, hillocks and pre-quantum dots, is studied by scanning tunneling microscopy. A wetting layer deposited at 350 C is initially rough on the nanometer length-scale and undergoes a progressive transformation and smoothening until for T>460 C vacancy lines and the 2xn reconstruction are observed. The metastable Ge wetting layer (WL) then collapses to form 3D nanostructures whose morphology is controlled by the WL thickness: firstly, hillocks, with a wedding cake-type structure where the step edges run parallel to the <110> direction, are formed for thin wetting layers, while {105}-faceted structures, so-called pre-quantum dots (p-QDs), are formed from thicker layers. The wetting layer thickness and thus the misfit strain energy controls the type of structure. The crossover thickness between hillock and p-QDs regime is between 1.6 and 2.1 ML. The hillocks have larger lateral dimensions and volumes than p-QDs, and the p-QDs are exceptionally small quantum dots with a lower limit of 10 nm in width. Our work opens a new pathway to the control of nanostructure morphology and size in the elastically strained Ge/Si system. Keywords: Quantum dots, Stranski-Krastanov, epitaxy, strained layers, scanning tunneling microscopy

cond-mat.mtrl-sci↗

arXiv2012

Mn Solid Solutions in Self-Assembled Ge/Si (001) Quantum Dot Heterostructures

Heteroepitaxial Ge0.98Mn0.02 quantum dots on Si (001) were grown by molecular beam epitaxy. The standard Ge wetting layer-hut-dome-superdome sequence was observed, with no indicators of second phase formation in the surface morphology. We show that Mn forms a dilute solid solution in the Ge quantum dot layer, and a significant fraction of the Mn partitions into a sparse array of buried, Mn-enriched silicide precipitates directly underneath a fraction of the Ge superdomes. The magnetic response from the ultra-thin film indicates the absence of robust room temperature ferromagnetism, perhaps due to anomalous intermixing of Si into the Ge quantum dots.

cond-mat.mtrl-sci↗