arXiv subjects

R. Pillarisetty

Publications and source records attributed to R. Pillarisetty.

10 recordsLinked to original sources

arXiv2022

Valley splitting in silicon from the interference pattern of quantum oscillations

We determine the energy splitting of the conduction-band valleys in two-dimensional (2D) electrons confined in silicon metal oxide semiconductor (Si-MOS) Hall-bar transistors. These Si-MOS Hall bars are made by advanced semiconductor manufacturing on 300 mm Si wafers and support a 2D electron gas of high quality with a maximum mobility of 17.6$\times$10$^3$cm$^2$/Vs and minimum percolation density of 3.45$\times$10$^{10}$cm$^{-2}$. Because of the low disorder, we observe beatings in the Shubnikov-de Haas oscillations that arise from the energy-split two low-lying conduction band valleys. From the analysis of the oscillations beating patterns up to T = 1.7 K, we estimate a maximum valley splitting of 8.2 meV at a density of 6.8$\times$10$^{12}$cm$^{-2}$. Furthermore, the valley splitting increases with density at a rate consistent with theoretical predictions for a near-ideal semiconductor/oxide interface.

cond-mat.mes-hall↗

arXiv2021

Qubits made by advanced semiconductor manufacturing

Full-scale quantum computers require the integration of millions of quantum bits. The promise of leveraging industrial semiconductor manufacturing to meet this requirement has fueled the pursuit of quantum computing in silicon quantum dots. However, to date, their fabrication has relied on electron-beam lithography and, with few exceptions, on academic style lift-off processes. Although these fabrication techniques offer process flexibility, they suffer from low yield and poor uniformity. An important question is whether the processing conditions developed in the manufacturing fab environment to enable high yield, throughput, and uniformity of transistors are suitable for quantum dot arrays and do not compromise the delicate qubit properties. Here, we demonstrate quantum dots hosted at a 28Si/28SiO2 interface, fabricated in a 300 mm semiconductor manufacturing facility using all-optical lithography and fully industrial processing. As a result, we achieve nanoscale gate patterns with remarkable homogeneity. The quantum dots are well-behaved in the multi-electron regime, with excellent tunnel barrier control, a crucial feature for fault-tolerant two-qubit gates. Single-spin qubit operation using magnetic resonance reveals relaxation times of over 1 s at 1 Tesla and coherence times of over 3 ms, matching the quality of silicon spin qubits reported to date. The feasibility of high-quality qubits made with fully-industrial techniques strongly enhances the prospects of a large-scale quantum computer

cond-mat.mes-hall↗

arXiv2019

Quantum transport properties of industrial $^{28}$Si/$^{28}$SiO$_2$

We investigate the structural and quantum transport properties of isotopically enriched $^{28}$Si/$^{28}$SiO$_2$ stacks deposited on 300 mm Si wafers in an industrial CMOS fab. Highly uniform films are obtained with an isotopic purity greater than 99.92\%. Hall-bar transistors with an equivalent oxide thickness of 17 nm are fabricated in an academic cleanroom. A critical density for conduction of $1.75\times10^{11}$ cm$^{-2}$ and a peak mobility of 9800 cm$^2$/Vs are measured at a temperature of 1.7 K. The $^{28}$Si/$^{28}$SiO$_2$ interface is characterized by a roughness of $Δ=0.4$ nm and a correlation length of $Λ=3.4$ nm. An upper bound for valley splitting energy of 480 $μ$eV is estimated at an effective electric field of 9.5 MV/m. These results support the use of wafer-scale $^{28}$Si/$^{28}$SiO$_2$ as a promising material platform to manufacture industrial spin qubits.

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arXiv2008

Giant frictional drag in strongly interacting bilayers near filling factor one

We study the frictional drag in high mobility, strongly interacting GaAs bilayer hole systems in the vicinity of the filling factor $ν=1$ quantum Hall state (QHS), at the same fillings where the bilayer resistivity displays a reentrant insulating phase. Our measurements reveal a very large longitudinal drag resistivity ($ρ^{D}_{xx}$) in this regime, exceeding 15 k$Ω/\Box$ at filling factor $ν=1.15$. $ρ^{D}_{xx}$ shows a weak temperature dependence and appears to saturate at a finite, large value at the lowest temperatures. Our observations are consistent with theoretical models positing a phase separation, e.g. puddles of $ν=1$ QHS embedded in a different state, when the system makes a transition from the coherent $ν=1$ QHS to the weakly coupled $ν=2$ QHS.

cond-mat.mes-hall↗

arXiv2004

Coulomb Drag near the metal-insulator transition in two-dimensions

We studied the drag resistivity between dilute two-dimensional hole systems, near the apparent metal-insulator transition. We find the deviations from the $T^{2}$ dependence of the drag to be independent of layer spacing and correlated with the metalliclike behavior in the single layer resistivity, suggesting they both arise from the same origin. In addition, layer spacing dependence measurements suggest that while the screening properties of the system remain relatively independent of temperature, they weaken significantly as the carrier density is reduced. Finally, we demonstrate that the drag itself significantly enhances the metallic $T$ dependence in the single layer resistivity.

cond-mat.mes-hall↗

arXiv2004

Spin Polarization Dependence of the Coulomb Drag at Large $r_{s}$

We find that the temperature dependence of the drag resistivity ($ρ_{D}$) between two dilute two-dimensional hole systems exhibits an unusual dependence upon spin polarization. Near the apparent metal-insulator transition, the temperature dependence of the drag, given by $T^α$, weakens with the application of a parallel magnetic field ($B_{||}$), with $α$ saturating at half its zero field value for $B_{||} > B^{*}$, where $B^{*}$ is the polarization field. Furthermore, we find that $α$ is roughly 2 at the parallel field induced metal-insulator transition, and that the temperature dependence of $ρ_{D}/T^{2}$ at different $B_{||}$ looks strikingly similar to that found in the single layer resistivity. In contrast, at higher densities, far from the zero field transition, the temperature dependence of the drag is roughly independent of spin polarization, with $α$ remaining close to 2, as expected from a simple Fermi liquid picture.

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arXiv2003

Layer charge instability in unbalanced bilayer systems in the quantum Hall regime

Measurements in GaAs hole bilayers with unequal layer densities reveal a pronounced magneto-resistance hysteresis at the magnetic field positions where either the majority or minority layer is at Landau level filling factor one. At a fixed field in the hysteretic regions, the resistance exhibits an unusual time dependence, consisting of random, bidirectional jumps followed by slow relaxations. These anomalies are apparently caused by instabilities in the charge distribution of the two layers.

cond-mat.mes-hall↗

arXiv2003

Role of density imbalance in an interacting bilayer hole system

We study interacting GaAs hole bilayers in the limit of zero tunneling. When the layers have equal densities, we observe a phase coherent bilayer quantum Hall (QH) state at total filling factor $ν=1$, flanked by insulating phases at nearby fillings which suggest the formation of a pinned, bilayer Wigner crystal. As we transfer charge from one layer to another, the insulating phases disappear while, surprisingly, the $ν=1$ QH state becomes stronger. Concomitantly, a pronounced hysteresis develops in the longitudinal magnetoresistance at higher fillings, indicative of a first-order quantum phase transition.

cond-mat.mes-hall↗

arXiv2003

In-Plane Magnetodrag between Dilute Two-Dimensional Systems

We performed in-plane magnetodrag measurements on dilute double layer two-dimensional hole systems, at in-plane magnetic fields that suppress the apparent metallic behavior, and to fields well above those required to fully spin polarize the system. When compared to the single layer magnetoresistance, the magnetodrag exhibits exactly the same qualitative behavior. In addition, we have found that the enhancement to the drag from the in-plane field exhibits a strong maximum when both layer densities are matched.

cond-mat.str-el↗

arXiv2002

Frictional Drag between Two Dilute Two-Dimensional Hole Layers

We report drag measurements on dilute double layer two-dimensional hole systems in the regime of r_s=19~39. We observed a strong enhancement of the drag over the simple Boltzmann calculations of Coulomb interaction, and deviations from the T^2 dependence which cannot be explained by phonon-mediated, plasmon-enhanced, or disorder-related processes. We suggest that this deviation results from interaction effects in the dilute regime.

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