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Subhali Subhechha

Publications and source records attributed to Subhali Subhechha.

4 recordsLinked to original sources

DTCO of NOR-Type IGZO FeFETs for 3D Heterogeneous AI Memories: A Read-Centric Perspective

InGaZnO (IGZO)-channel FeFETs have attracted notable interest thanks to recent advances in endurance, opening up their application space for read-dominated AI memory tiers. This work evaluates the viability of NOR-type IGZO FeFETs for 3D heterogeneous AI memories from a read-centric design-technology co-optimization (DTCO) perspective, spanning on-chip back-end-of-line (BEOL) RAMs and hybrid-bonded memory chiplets, and off-chip, monolithically integrated 3D FeNOR storage-class memories (SCMs). For on-chip BEOL RAMs and memory chiplets, we demonstrate the cross-node bitcell footprint scalability of IGZO FeFETs capable of delivering down to 10-A SRAM-equivalent bitcell area ($\sim$0.016 $\mu$m$^2$) with 7-nm ground rules while maintaining a sub-5 ns random access latency -- despite their writability challenges. We further identify the sensing margin penalty in NOR FeFET arrays arising from sneak current associated with the negative program-state $V_t$, which requires positive-$V_t$ engineering in order to eliminate the unwanted negative voltage read inhibition -- for example, by ferroelectric layer thinning. Last but not least, we elucidate the read margin implications on 3D FeNOR for SCMs, with the 3D stacking density limited by additional sneak current from neighbor channel shunting.

cs.ET

SOT-MRAM Bitcell Scaling with BEOL Read Selectors: A DTCO Study

This work explores the cross-node scaling potential of SOT-MRAM for last-level caches (LLCs) under heterogeneous system scaling paradigm. We perform extensive Design-Technology Co-Optimization (DTCO) exercises to evaluate the bitcell footprint for different cell configurations at a representative 7 nm technology and to assess their implications on read and write power-performance. We crucially identify the MTJ routing struggle in conventional two-transistor one-resistor (2T1R) SOT-MRAMs as the primary bitcell area scaling challenge and propose to use BEOL read selectors (BEOL RSs) that enable (10 -- 40) % bitcell area reduction and eventually match sub-N3 SRAM. On writability, we affirm that BEOL RS-based bitcells could meet the required SOT switching current, provided the magnetic free layer properties be engineered in line with LLC-specific, (0.1 -- 100) s retention targets. This is particularly to attribute to their (i) more available Si fins for write transistor and (ii) lower bitline resistance at reduced cell width. We nevertheless underscore the read tradeoff associated with BEOL RSs, with the low-drive IGZO-FET selector sacrificing the latency up to (3 -- 5) ns and the imperfectly rectifying diode selectors suffering (2.5 -- 5)$\times$ energy cost relative to 2T1R. This article thus highlights the realistic prospects and hurdles of BEOL RSs towards holistic power-performance-area scaling of SOT-MRAM.

cs.ET

Subthreshold Swing Behavior in Amorphous Indium-Gallium-Zinc-Oxide Transistors from Room to Cryogenic Temperatures

While cryogenic-temperature subthreshold swing (SS) in crystalline semiconductors has been widely studied, a careful study on the temperature-dependent SS in amorphous oxide semiconductors remains lacking. In this paper, a comprehensive analysis of the SS in thin-film transistors with an amorphous indium gallium zinc oxide (IGZO) channel at temperatures from 300 K down to 4 K is presented. Main observations include: 1) At room temperature (300 K), the devices exhibit a SS of 61 mV/dec, and a low interface trap density (<1011 cm-2), among the best reported values for IGZO devices. 2) A SS saturation around 40 mV/dec is observed between 200 K and 100 K. It is well explained by the electron transport via band tail states with exponential decay (Wt) of 13 meV. 3) At deep-cryogenic temperature, SS increase significantly exceeding 200 mV/dec at 4 K. Such high SS values are actually limited by the measurement current range, confirmed by Id-Vg simulations based on the variable range hopping (VRH) model. This work not only elucidates the SS behavior in amorphous IGZO devices but also provides a deep understanding of the physical mechanisms of electron transport in amorphous semiconductors.

cond-mat.mtrl-sci

The impact of process steps on nearly ideal subthreshold slope in 300-mm compatible InGaZnO TFT

While we demonstrate a back-gated (BG) amorphous Indium-Gallium-Zinc-Oxide (a-IGZO) transistors with a nearly ideal subthreshold slope (SS) ~ 60 mV/dec. However, SS degrades when a top-gated (TG) configuration is implemented. The energy distribution of traps inferred from temperature-dependent (T = 4 K - 300 K) and multi-frequency (f = 1 kHz - 100 kHz) admittance measurements, reveals a much higher trap density in TG devices. By analyzing the impact of each process step and conducting forming gas anneal (FGA) experiments, we reveal the role of hydrogen in the deterioration of the SS in the IGZO-based transistors.

physics.app-ph