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Thomas Mussenbrock

Publications and source records attributed to Thomas Mussenbrock.

At least 37 records · Page 2Linked to original sources

PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

This feature article considers the analysis of the initial states of film growth on polymer substrates. The assembled results are based on the cooperation between research groups in the field of plasma physics, chemistry, electric as well as mechanical engineering over the last years, mostly within the frame of the transregional project SFB-TR 87 ("Pulsed high power plasmas for the synthesis of nanostructured functional layers"). This feature article aims at bridging the gap between the understanding of plasma processes in the gas phase and the resulting surface and interface processes of the polymer. The results show that interfacial adhesion and initial film growth can be well controlled and even predicted based on the combination of analytical approaches.

cond-mat.soft↗

Nonlocal dynamics of secondary electrons in capacitively coupled radio frequency discharges

In capacitively coupled radio frequency (CCRF) discharges, the interaction of the plasma and the surface boundaries is linked to a variety of highly relevant phenomena for technological processes. One possible plasma-surface interaction is the generation of secondary electrons (SEs), which significantly influence the discharge when accelerated in the sheath electric field. However, SEs, in particular electron-induced SEs ($\updelta$-electrons), are frequently neglected in theory and simulations. Due to the relatively high threshold energy for the effective generation of $\updelta$-electrons at surfaces, their dynamics are closely connected and entangled with the dynamics of the ion-induced SEs ($\upgamma$-electrons). Thus, a fundamental understanding of the electron dynamics has to be achieved on a nanosecond timescale, and the effects of the different electron groups have to be segregated. This work utilizes $1d3v$ Particle-in-Cell/Monte Carlo Collisions (PIC/MCC) simulations of a symmetric discharge in the low-pressure regime ($p\,=\, 1\,\rm{Pa}$) with the inclusion of realistic electron-surface interactions for silicon dioxide. A diagnostic framework is introduced that segregates the electrons into three groups ("bulk-electrons", "$\upgamma$-electrons", and "$\updelta$-electrons") in order to analyze and discuss their dynamics. A variation of the electrode gap size $L_\mathrm{gap}$ is then presented as a control tool to alter the dynamics of the discharge significantly. It is demonstrated that this control results in two different regimes of low and high plasma density, respectively. The fundamental electron dynamics of both regimes are explained, which requires a complete analysis starting at global parameters (e.g., densities) down to single electron trajectories.

physics.plasm-ph↗

Physics-separating artificial neural networks for predicting sputtering and thin film deposition of AlN in Ar/N$_2$ discharges on experimental timescales

Understanding and modeling plasma-surface interactions frame a multi-scale as well as multi-physics problem. Scale-bridging machine learning surface surrogate models have been demonstrated to perceive the fundamental atomic fidelity for the physical vapor deposition of pure metals. However, the immense computational cost of the data-generating simulations render a practical application with predictions on relevant timescales impracticable. This issue is resolved in this work for the sputter deposition of AlN in Ar/N$_2$ discharges by developing a scheme that populates the parameter spaces effectively. Hybrid reactive molecular dynamics / time-stamped force-bias Monte Carlo simulations of randomized plasma-surface interactions / diffusion processes are used to setup a physics-separating artificial neural network. The application of this generic machine learning model to a specific experimental reference case study enables the systematic analysis of the particle flux emission as well as underlying system state (e.g., composition, mass density, stress, point defect structure) evolution within process times of up to 45 minutes.

cond-mat.mtrl-sci↗

Physics-separating artificial neural networks for predicting initial stages of Al sputtering and thin film deposition in Ar plasma discharges

Simulations of Al thin film sputter depositions rely on accurate plasma and surface interaction models. Establishing the latter commonly requires a higher level of abstraction and means to dismiss the fundamental atomic fidelity. Previous works on sputtering processes addressed this issue by establishing machine learning surrogate models, which include a basic surface state (i.e., stoichiometry) as static input. In this work, an evolving surface state and defect structure are introduced to jointly describe sputtering and growth with physics-separating artificial neural networks. The data describing the plasma-surface interactions stem from hybrid reactive molecular dynamics/time-stamped force bias Monte Carlo simulations of Al neutrals and Ar$^+$ ions impinging onto Al(001) surfaces. It is demonstrated that the fundamental processes are comprehensively described by taking the surface state as well as defect structure into account. Hence, a machine learning plasma-surface interaction surrogate model is established that resolves the inherent kinetics with high physical fidelity. The resulting model is not restricted to input from modeling and simulation, but may similarly be applied to experimental input data.

cond-mat.mtrl-sci↗

Physics inspired compact modelling of BiFeO$_3$ based memristors for hardware security applications

With the advent of the Internet of Things, nanoelectronic devices or memristors have been the subject of significant interest for use as new hardware security primitives. Among the several available memristors, BiFe$\rm O_{3}$ (BFO)-based electroforming-free memristors have attracted considerable attention due to their excellent properties, such as long retention time, self-rectification, intrinsic stochasticity, and fast switching. They have been actively investigated for use in physical unclonable function (PUF) key storage modules, artificial synapses in neural networks, nonvolatile resistive switches, and reconfigurable logic applications. In this work, we present a physics-inspired 1D compact model of a BFO memristor to understand its implementation for such applications (mainly PUFs) and perform circuit simulations. The resistive switching based on electric field-driven vacancy migration and intrinsic stochastic behaviour of the BFO memristor are modelled using the cloud-in-a-cell scheme. The experimental current-voltage characteristics of the BFO memristor are successfully reproduced. The response of the BFO memristor to changes in electrical properties, environmental properties (such as temperature) and stress are analyzed and consistent with experimental results.

cs.ET↗

Charge-optimized many-body interaction potential for AlN revisited to explore plasma-surface interactions

Plasma-surface interactions during AlN thin film sputter deposition could be studied by means of reactive molecular dynamics (RMD) methods. This requires an interaction potential that describes all species as well as wall interactions (e.g., particle emission, damage formation) appropriately. However, previous works focused on the establishment of AlN bulk potentials. Although for the third-generation charge-optimized many-body (COMB3) potential at least a single reference surface was taken into account, surface interactions are subject to limited reliability only. The demand for a revised COMB3 AlN potential is met in two steps: First, the Ziegler-Biersack-Littmark potential is tapered and the variable charge model QTE$^+$ is implemented to account for high-energy collisions and distant charge transport, respectively. Second, the underlying parameterization is reworked by applying a self-adaptive evolution strategy implemented in the GARFfield software. Four wurtzite, three zinc blende and three rock salt surfaces are considered. An example study on the ion bombardment induced particle emission and point defect formation reveals that the revised COMB3 AlN potential is appropriate for the accurate investigation of plasma-surface interactions by means of RMD simulations.

physics.plasm-ph↗

Molecular Dynamics Study on the Role of Ar Ions in the Sputter Deposition of Al Thin Films

Molecular dynamics simulations are often used to study sputtering and thin film growth. Compressive stresses in these thin films are generally assumed to be caused by a combination of forward sputtered (peened) built-in particles and entrapped working gas atoms. While the former are assumed to hold a predominant role, the effect of the latter on the interaction dynamics as well as thin film properties are scarcely clarified (concurrent or causative). The inherent overlay of the ion bombardment induced processes render an isolation of their contribution impracticable. In this work, this issue is addressed by comparing the results of two case studies on the sputter deposition of Al thin films in Ar working gas. In the first run Ar atoms are fully retained. In the second run they are artificially neglected, as implanted Ar atoms are assumed to outgas anyhow and not alter the ongoing dynamics significantly. Both case studies have in common that the consecutive impingement of 100 particles (i.e., Ar$^+$ ions, Al atoms) onto Al(001) surfaces for ion energies in the range of 3 eV to 300 eV as well as Al/Ar$^+$ flux ratios from 0 to 1 are considered. The surface interactions are simulated by means of hybrid reactive molecular dynamics/force-biased Monte Carlo simulations and characterized in terms of mass density, Ar concentration, biaxial stress, shear stress, ring statistical connectivity profile, Ar gas porosity, Al vacancy density, and root-mean-squared roughness. Ultimately, implanted Ar atoms are found to form subnanometer sized eventually outgassing clusters for ion energies exceeding 100 eV. They fundamentally govern a variety of surface processes (e.g., forward sputtering/peening) and surface properties (e.g., compressive stresses) in the considered operating regime.

cond-mat.mtrl-sci↗

Stochastic behaviour of an interface-based memristive device

A large number of simulation models have been proposed over the years to mimic the electrical behaviour of memristive devices. The models are based either on sophisticated mathematical formulations that do not account for physical and chemical processes responsible for the actual switching dynamics or on multi-physical spatially resolved approaches that include the inherent stochastic behaviour of real-world memristive devices but are computationally very expensive. In contrast to the available models, we present a computationally inexpensive and robust spatially 1D model for simulating interface-type memristive devices. The model efficiently incorporates the stochastic behaviour observed in experiments and can be easily transferred to circuit simulation frameworks. The ion transport, responsible for the resistive switching behaviour, is modelled using the kinetic Cloud-In-a-Cell scheme. The calculated current-voltage characteristics obtained using the proposed model show excellent agreement with the experimental findings.

cs.ET↗

Validation of the smooth step model by particle-in-cell/Monte Carlo collisions simulations

Bounded plasmas are characterized by a rapid but smooth transition from quasi-neutrality in the volume to electron depletion close to the electrodes and chamber walls. The thin non-neutral region, the boundary sheath, comprises only a small fraction of the discharge domain but controls much of its macroscopic behavior. Insights into the properties of the sheath and its relation to the plasma are of high practical and theoretical interest. The recently proposed smooth step model provides a closed analytical expression for the electric field in a planar, radio-frequency modulated sheath. It represents (i) the space charge field in the depletion zone, (ii) the generalized Ohmic and ambipolar field in the quasi-neutral zone, and (iii) a smooth interpolation for the transition in between. This investigation compares the smooth step model with the predictions of a more fundamental particle-in-cell/Monte Carlo collisions simulation and finds good quantitative agreement when the assumed length and time scale requirements are met. A second simulation case illustrates that the model remains applicable even when the assumptions are only marginally fulfilled

physics.plasm-ph↗

Kinetic simulation of electron cyclotron resonance assisted gas breakdown in split-biased waveguides for ITER collective Thomson scattering diagnostic

For the measurement of the dynamics of fusion-born alpha particles $E_α\leq 3.5$ MeV in ITER using collective Thomson scattering (CTS), safe transmission of a gyrotron beam at mm-wavelength (1 MW, 60 GHz) passing the electron cyclotron resonance (ECR) in the in-vessel tokamak `port plug' vacuum is a prerequisite. Depending on neutral gas pressure and composition, ECR-assisted gas breakdown may occur at the location of the resonance, which must be mitigated for diagnostic performance and safety reasons. The concept of a split electrically biased waveguide (SBWG) has been previously demonstrated in [C.P. Moeller, U.S. Patent 4,687,616 (1987)]. The waveguide is longitudinally split and a kV bias voltage applied between the two halves. Electrons are rapidly removed from the central region of high radio frequency electric field strength, mitigating breakdown. As a full scale experimental investigation of gas and electromagnetic field conditions inside the ITER equatorial port plugs is currently unattainable, a corresponding Monte Carlo simulation study is presented. Validity of the Monte Carlo electron model is demonstrated with a prediction of ECR breakdown and the mitigation pressure limits for the above quoted reference case with $^1$H$_2$ (and pollutant high $Z$ elements). For the proposed ITER CTS design with a 88.9 mm inner diameter SBWG, ECR breakdown is predicted to occur down to a pure $^1$H$_2$ pressure of 0.3 Pa, while mitigation is shown to be effective at least up to 10 Pa using a bias voltage of 1 kV. The analysis is complemented by results for relevant electric/magnetic field arrangements and limitations of the SBWG mitigation concept are addressed.

physics.plasm-ph↗

Generalized Method for Charge Transfer Equilibration in Reactive Molecular Dynamics

Variable charge models (e.g., EEM, QEq, ES+) in reactive molecular dynamics simulations often inherently impose a global charge transfer between atoms (approximating each system as ideal metal). Consequently, most surface processes (e.g., adsorption, desorption, deposition, sputtering) are affected, potentially causing dubious dynamics. This issue is meant to be addressed by the ACKS2 and QTPIE model, which are based on the Kohn-Sham density functional theory as well as a charge transfer restricting extension to the QEq model (approximating each system as ideal insulator), respectively. In a brief review of the QEq and the QTPIE model, their applicability for studying surface interactions is assessed in this work. Following this reasoning, the demand for a revised generalization of the QEq and QTPIE model is proposed, called charge transfer equilibration model or in short QTE model. This method is derived from the equilibration of constrained charge transfer variables, instead of considering atomic charge variables. The latter, however, are obtained by a respective transformation, employing an extended Lagrangian method. We moreover propose a mirror boundary condition and its implementation to accelerate surface investigations. The models proposed in this work facilitate reactive molecular dynamics simulations which describe various materials and surface phenomena appropriately.

cond-mat.mtrl-sci↗

Energy efficiency of voltage waveform tailoring for the generation of excited species in RF plasma jets operated in He/N$_2$ mixtures

Based on Tunable Diode Laser Absorption Spectroscopy (TDLAS) measurements of the spatially averaged and peak helium metastable atom densities in a capacitively coupled micro atmospheric pressure plasma jet operated in He/N$_2$ mixtures, the energy efficiency of metastable species (He-I 2$^3$S$_1$) generation is compared for three different scenarios: single frequency operation at (i) 13.56 MHz and (ii) 54.12 MHz, and Voltage Waveform Tailoring (VWT) at (iii) "valleys"-waveforms synthesized from four consecutive harmonics of 13.56 MHz. For each case, the dissipated power is measured based on a careful calibration procedure of voltage and current measurements. The results are compared to PIC/MCC simulation results and very good agreement is found. The computational results show that the choice of the surface coefficients in the simulation is important to reproduce the experimental data correctly. Due to the enhanced control of the spatio-temporal electron power absorption dynamics and, thus, of the electron energy distribution function by VWT, this approach does not only provide better control of the generation of excited and reactive species compared to single frequency excitation, but in case of helium metastables the energy efficiency is also shown to be significantly higher in case of VWT.

physics.plasm-ph↗

Electron heating mode transitions in radio-frequency driven micro atmospheric pressure plasma jets in He/O$_{2}$: A fluid dynamics approach

A two-dimensional fluid model is used to investigate the electron heating dynamics and the production of neutral species in a capacitively coupled radio-frequency micro atmospheric pressure helium plasma jet -- specifically the COST jet -- with a small oxygen admixture. Electron heating mode transitions are found to be induced by varying the driving voltage amplitude and the O$_2$ concentration numerically and experimentally. The helium metastable density, and the charged species densities are highly relevant to the electron heating dynamics. By analyzing the creation and destruction mechanisms of the negative ions, we find that the generation of negative ions strongly depends on the O$_2$ concentration. The increase of the electronegativity with the increasing O$_2$ concentration leads to an enhancement of the bulk drift electric field. The distributions of the different neutral species densities along the direction of the gas flow inside the jet, as well as in the effluent differ a lot due to the relevant chemical reaction rates and the effect of the gas flow. The simulated results show that a fluid model can be an effective tool for qualitative investigations of micro atmospheric pressure plasma jets.

physics.plasm-ph↗

A generic method for equipping arbitrary rf discharge simulation frameworks with external lumped element circuits

External electric circuits attached to radio-frequency plasma discharges are essential for the power transfer into the discharge and are, therefore, a key element for plasma operation. Many plasma simulations, however, simplify or even neglect the external network. This is because a solution of the circuit's auxiliary differential equations following Kirchhoff's laws is required, which can become a tedious task especially for large circuits. This work proposes a method, which allows to include electric circuits in any desired radio-frequency plasma simulation. Conceptually, arbitrarily complex external networks may be incorporated in the form of a simple netlist. The suggested approach is based on the harmonic balance concept, which splits the whole system into the nonlinear plasma and the linear circuit contribution. A mathematical formulation of the influence of the applied voltage on the current for each specific harmonic is required and proposed. It is demonstrated that this method is applicable for both simple global plasma models as well as more complex spatially resolved Particle-in-Cell simulations.

physics.plasm-ph↗

Kinetic Bandgap Analysis of Plasma Photonic Crystals

The dispersion relation of plasma and plasma-dielectric photonic multilayer structures is approached in terms of a one-dimensional Particle-in-Cell simulation. For several plasma-dielectric configurations, the system response is obtained using a pulsed excitation and a subsequent two-dimensional frequency analysis. It is first shown that the dispersion relation of a single, homogeneous plasma slab is well described by the cold-plasma model even at low pressures of 1 Pa. The study is extended to the simulation of plasma photonic crystals with a variety of configurations, based on the work of Hojo and Mase [J. Plasma Fusion Res. 80, 89 (2004)]. Considering a one-dimensional plasma photonic crystal made from alternating layers of dielectric and homogeneous plasma slabs, it is shown that the assumption of a cold-plasma description is well justified also in this case. Moreover, in this work the results are reformatted and analyzed in a band diagram representation, in particular based on the lattice constant $a$. Based on these considerations a scaling invariant representation is presented, utilizing a generalized set of parameters. The study is completed with an exemplary comparison of three plasma-dielectric photonic crystal configurations and their corresponding band diagrams.

physics.plasm-ph↗

Integration of external electric fields in molecular dynamics simulation models for resistive switching devices

Resistive switching devices emerged a huge amount of interest as promising candidates for non-volatile memories as well as artificial synapses due to their memristive behavior. The main physical and chemical phenomena which define their functionality are driven by externally applied voltages, and the resulting electric fields. Although molecular dynamics simulations are widely used in order to describe the dynamics on the corresponding atomic length and time scales, there is a lack of models which allow for the actual driving force of the dynamics, i.e. externally applied electric fields. This is due to the restriction of currently applied models to either solely conductive, non-reactive or insulating materials, with thicknesses in the order of the potential cutoff radius, i.e., 10 Å. In this work, we propose a generic model, which can be applied in particular to describe the resistive switching phenomena of metal-insulator-metal systems. It has been shown that the calculated electric field and force distribution in case of the chosen example system Cu/a-SiO$_2$/Cu are in agreement with fundamental field theoretical expectations.

cond-mat.mtrl-sci↗

Multi frequency matching for voltage waveform tailoring

Customized voltage waveforms composed of a number of frequencies and used as the excitation of radio-frequency plasmas can control various plasma parameters such as energy distribution functions, homogeneity of the ionflux or ionization dynamics. So far this technology, while being extensively studied in academia, has yet to be established in applications. One reason for this is the lack of a suitable multi-frequency matching network that allows for maximum power absorption for each excitation frequency that is generated and transmitted via a single broadband amplifier. In this work, a method is introduced for designing such a network based on network theory and synthesis. Using this method, a circuit simulation is established that connects an exemplary matching network to an equivalent circuit plasma model of a capacitive radio-frequency discharge. It is found that for a range of gas pressures and number of excitation frequencies the matching conditions can be satisfied, which proves the functionality and feasibility of the proposed concept. Based on the proposed multi-frequency impedance matching, tailored voltage waveforms can be used at an industrial level.

physics.plasm-ph↗

Consistent simulation of capacitive radio-frequency discharges and external matching networks

External matching networks are crucial and necessary for operating capacitively coupled plasmas in order to maximize the absorbed power. Experiments show that external circuits in general heavily interact with the plasma in a nonlinear way. This interaction has to be taken into account in order to be able to design suitable networks, e.g., for plasma processing systems. For a complete understanding of the underlying physics of this coupling, a nonlinear simulation approach which considers both the plasma and the circuit dynamics can provide useful insights. In this work, the coupling of an equivalent circuit plasma model and an electric external circuit composed of lumped elements is discussed. The plasma model itself is self-consistent in the sense that the plasma density and the electron temperature is calculated from the absorbed power based on a global plasma chemistry model. The approach encompasses all elements present in real plasma systems, i.e., the discharge itself, the matching network, the power generator as well as stray loss elements. While the main results of this work is the conceptual approach itself, at the example of a single-frequency capacitively coupled discharge its applicability is demonstrated. It is shown that it provides an effective and efficient way to analyze and understand the nonlinear dynamics of real plasma systems and, furthermore, may be applied to synthesize optimal matching networks.

physics.plasm-ph↗