arXiv subjects

Ulrike Grossner

Publications and source records attributed to Ulrike Grossner.

8 recordsLinked to original sources

arXiv2026

Muonium dynamics as a probe for depth-resolved properties of 4H-SiC

This study establishes a baseline for muonium (Mu) charge-exchange dynamics in n-type 4H-SiC through a detailed low-energy muon spin rotation (LE-uSR) investigation. Epitaxially grown and ion-implanted samples with nitrogen and phosphorus donors were characterized to assess the effect of carrier concentration and doping method on defect formation. LE-uSR enabled nanometer scale depth profiling of near-surface and implanted regions, revealing variations in charge carrier concentration due to fixed surface charges. The temperature dependence of the diamagnetic fraction and phase provided direct evidence of the Mu0 to Mu- transition, with extracted activation energies consistent with known donor ionization energies. Additionally, high-field uSR was used to analyze the Mu dynamics, and Monte-Carlo simulations to model the Mu0 electron capture process. The simulation results offer a quantitative method to extract free electron concentrations from LE-uSR data, enhancing its capability to characterize the activation of dopants and carrier depth profiles. We demonstrate that LE-uSR is a powerful depth-resolved tool that can provide insights for optimizing the fabrication of reliable SiC devices for power electronics.

cond-mat.mtrl-sci↗

arXiv2026

Impact of strain on electron-phonon coupling of quantum emitters

Defects in semiconductors acting as optically active spin qubits are intriguing objects of fundamental study and future technological developments. These defect-based color centers are of particular interest for detection and response to physical variations such as pressure and strain, or conversely -- as we demonstrate the possibility of herein -- pressure and strain can be utilized to manipulate quantum emitter properties. To investigate how strain can alter the fundamental electron-phonon interaction of quantum defects, we employ the negatively charged silicon vacancy ($\mathrm{V_{Si}^{-}}$) in 4H-SiC as a use-case and study its vibrational structure under applied tensile and compressive uniaxial strain using first-principles calculations. We show that the strain variations of the emission spectrum can be explained by differing responses of bulk-like and quasi-localized vibrational modes. Importantly, the $\mathrm{V_{Si}^{-}}$ defect exhibits a strain-induced enhancement of the Debye-Waller factor under uniaxial tensile strain applied along the $a$-axis of 4H-SiC, thereby improving its performance as a quantum emitter. The strain-dependent changes in the phonon sideband enable distinguishing between compressive and tensile strain, opening up the possibility of magnetic-field-free strain detection using only spin-conserving transitions of solid-state quantum emitters.

cond-mat.mtrl-sci↗

arXiv2024

Surface Structuring of Patterned 4H-SiC Surfaces Using a SiC/Si/SiC Sandwich Approach

Mesa- and trench-patterned surfaces of 4H-SiC(0001) 4{\textdegree}off wafers were structured in macrosteps using Si melting in a SiC-Si-SiC sandwich configuration. Si spreading difficulties were observed in the case of trench-patterned samples while the attempts on mesa-patterned ones were more successful. In the latter case, parallel macrosteps were formed on both the dry-etched and unetched areas though these macrosteps rarely cross the patterns edges. The proposed mechanism involved preferential etching at Si-C bilayer step edges and fast lateral propagation along the [1120] direction.

cond-mat.mtrl-sci↗

arXiv2024

Observation and manipulation of charge carrier distribution at the SiO$_2$/Si interface

Using low-energy muons, we map the charge carrier concentration as a function of depth and electric field across the \SiOSi interface up to a depth of \SI{100}{\nano\meter} in Si-based MOS capacitors. The results show that the formation of the anisotropic bond-centered muonium \MuBCz state in Si serves as a direct measure of the local changes in electronic structures. Different band-bending conditions could be distinguished, and the extension of the depletion width was directly extracted using the localized stopping and probing depth of the muons. Furthermore, electron build-up on the Si side of the \SiOO/Si interface, caused by the mirror charge induced by the fixed positive charge in the oxide and the image force effect, was observed. Our work represents a significant extension of the application of the muon spin rotation technique ($μ$SR) and lays the foundation for further research on direct observation of charge carrier density manipulation at technologically important semiconductor device interfaces.

cond-mat.other↗

arXiv2022

Investigation of the SiO2-SiC interface using low energy muon spin rotation spectroscopy

Using positive muons as local probes implanted at low energy enables gathering information about the material of interest with nanometer depth resolution (low energy muon spin rotation spectroscopy (LE-$μ$SR). In this work, we leverage the capabilities of LE-$μ$SR to perform an investigation of the SiO$_\text{2}$-SiC interface. Thermally oxidized samples are investigated before and after annealing in nitric oxide (NO) and argon (Ar) ambience. Thermal oxidation is found to result in structural changes both in the SiC crystal close to the interface and at the interface itself. Annealing in NO environment is known to passivate the defects leading to a reduction of the density of interface traps (D$_{it}$); LE-$μ$SR further reveals that the NO annealing results in a thin layer of high carrier concentration in SiC, extending to more than 50 nm depending on the annealing conditions. We also see indications of Si vacancy (V$_{Si}$) formation in SiC after thermal oxidation. Following NO annealing, nitrogen occupies the V$_{Si}$ sites, leading to the reduction in D$_{it}$ and at the same time, creating a charge-carrier-rich region near the interface. By comparing the LE-$μ$SR data from a sample with known doping density, we perform a high-resolution quantification of the free carrier concentration near the interface after NO annealing and discuss the origin of observed near-surface variations. Finally, the depletion of carriers in a MOS capacitor in the region below the interface is shown using LE-$μ$SR. The NO annealed sample shows the narrowest depletion region, likely due to the reduced D$_{it}$ and charge-carrier-rich region near the interface. Our findings demonstrate the many benefits of utilizing LE-$μ$SR to study critical regions of semiconductor devices that have been inaccessible with other techniques while retaining nanoscale depth resolution and a non-destructive approach.

cond-mat.mtrl-sci↗

arXiv2022

Defect Profiling of Oxide-Semiconductor Interfaces Using Low-Energy Muons

Muon spin rotation with low-energy muons (LEμSR) is a powerful nuclear method where electrical and magnetic properties of surface-near regions and thin films can be studied on a length scale of $\approx$\SI{200}{\nano\meter}. In this work, we show the potential of utilizing low-energy muons for a depth-resolved characterization of oxide-semiconductor interfaces, i.e. for silicon (Si) and silicon carbide (4H-SiC). Silicon dioxide (SiO$_2$) grown by plasma-enhanced chemical vapor deposition (PECVD) and by thermal oxidation of the SiO$_2$-semiconductor interface are compared with respect to interface and defect formation. The nanometer depth resolution of μallows for a clear distinction between the oxide and semiconductor layers, while also quantifying the extension of structural changes caused by the oxidation of both Si and SiC.

cond-mat.mtrl-sci↗

arXiv2021

Temperature dependence of on-state inter-terminal capacitances (Cgd and Cgs) of SiC MOSFETs and frequency limitations of their measurements

Inter-terminal capacitances (ITCs) have major influence on the dynamic performance of power SiC MOSFETs. Knowledge of the exact values for the ITCs is required in order to perform accurate and predictive compact model simulations of their dynamic performance. Since commercial SiC MOSFETs are capable of operating in a wide range of temperatures, it is important to know the values of ITCs in the whole temperature range of operation. Direct measurements of the ITCs with standard equipment is possible only at low current levels (i.e. in the off-state (Vgs < Vth) for Vds > 0 V), however their values in the on-state (Vgs>Vth) also influence the MOSFETs switching performance. In this work, ITCs of a planar SiC MOSFET in the on-state are studied by the means of a calibrated TCAD model, revealing substantial temperature dependence in the range of 300-450 K. In the first approximation, this temperature dependence of the ITCs can be explained by a weaker temperature dependence of the MOSFET channel resistance in comparison to its JFET and epitaxial layer resistances. In addition, it is shown that at high frequencies stray inductances of the TO-247-3 package result in a change of the extracted values of the on-state ITCs. This effect is already notable at 1 MHz.

physics.app-ph↗

arXiv2006

Comparison of near-interface traps in Al$_2$O$_3$/4H-SiC and Al$_2$O$_3$/SiO$_2$/4H-SiC structures

Aluminum oxide (Al2O3) has been grown by atomic layer deposition on n-type 4H-SiC with and without a thin silicon dioxide (SiO2) intermediate layer. By means of Capacitance Voltage and Thermal Dielectric Relaxation Current measurements, the interface properties have been investigated. Whereas for the samples with an interfacial SiO2 layer the highest near-interface trap density is found at 0.3 eV below the conduction band edge, Ec, the samples with only the Al2O3 dielectric exhibit a nearly trap free region close to Ec. For the Al2O3/SiC interface, the highest trap density appears between 0.4 to 0.6 eV below Ec. The results indicate the possibility for SiC-based MOSFETs with Al2O3 as the gate dielectric layer in future high performance devices.

cond-mat.mtrl-sci↗