arXiv subjects

Zhongwei Pan

Publications and source records attributed to Zhongwei Pan.

2 recordsLinked to original sources

arXiv1999

Application of Raman Scattering to Study the Strain Distribution in SiGe Layers

In this paper, we mainly present a new simple, efficient and nondestructive Raman scattering analysis method to study the distribution of strain in SiGe alloy films. The method can simultaneously determine both Ge fractional composition x and strain of SiGe films. We use the Ar+ laser lines (514.5, 488 and 457.9 nm) to detect the information of different depth of SiGe layers. The results show that the x value (about 0.50) of Si1-xGex and the strain of the films decrease from the interface between SiGe layers and Si substrates to SiGe surface.

cond-mat.mtrl-sci↗

arXiv1999

Application of Ultraviolet Fluorescence in Wafer Surface Cleaning Analysis

Ultraviolet fluorescence (UVF) is introduced as a novel and versatile method for the determination of the contamination of metal impurities on silicon wafer surfaces. The results given demonstrate the usefulness of UVF for contamination control in silicon wafer processing. The experiments show some main characteristic peaks such as Fe, Cu, Ni and Na at room temperature. Compared with other surface sensitive techniques, the main advantages of UVF are low detection limits, simultaneous multi-element analysis and high sensitivity (up to 109 Fe/cm2).

cond-mat.mtrl-sci↗