arXiv · 0708.2221
Nitrogen ion beam synthesis of InN in InP (100) at elevated temperature
Abstract
InN phase is grown in crystalline InP(100) substrates by 50 keV N+ implantation at an elevated temperature of 400 deg C followed by annealing at 525 deg C in N2 ambient. Crystallographic structural and Raman scattering studies are performed for the characterization of grown phases. Temperature- and power-dependent photoluminescence studies show direct band-to-band transition peak ~1.06 eV at temperatures <=150K. Implantations at an elevated temperature with a low ion beam current and subsequent low temperature annealing step are found responsible for the growth of high-quality InN phase.
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S. Dhara, P. Magudapathy, R. Kesavamoorthy, S. Kalavathi, V. S. Sastry, K. G. M. Nair, G. M. Hsu, L. C. Chen, K. H. Chen, K. Santhakumar, T. Soga. 2007-08-16. Nitrogen ion beam synthesis of InN in InP (100) at elevated temperature. https://doi.org/10.1063/1.2186101
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