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arXiv · 0711.2614

Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber

Yu. M. Gavriljuk·V. N. Gavrin·A. M. Gangapshev·V. V. Kazalov·V. V. Kuzminov·S. I. Panasenko·S. S. Ratkevich
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Abstract

The construction of an ion pulse ionization chamber aimed at measuring ultra-low levels of surface alpha-activity of different samples is described. The results of measurement carried out with alpha-source and copper samples and light-reflecting film VM2000 are presented.

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Yu. M. Gavriljuk, V. N. Gavrin, A. M. Gangapshev, V. V. Kazalov, V. V. Kuzminov, S. I. Panasenko, S. S. Ratkevich. 2007-11-16. Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber. https://arxiv.org/abs/0711.2614

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