arXiv · 0906.1995
Device fabrication and transport measurements of FinFETs built with $^{28}$Si SOI wafers towards donor qubits in silicon
Abstract
We report fabrication of transistors in a FinFET geometry using isotopically purified silicon-28 -on-insulator (28-SOI) substrates. Donor electron spin coherence in natural silicon is limited by spectral diffusion due to the residual $^{29}$Si nuclear spin bath, making isotopically enriched nuclear spin-free $^{28}$Si substrates a promising candidate for forming spin quantum bit devices. The FinFET architecture is fully compatible with single-ion implant detection for donor-based qubits, and the donor spin-state readout through electrical detection of spin resonance. We describe device processing steps and discuss results on electrical transport measurements at 0.3 K.
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CC Lo, A Persaud, S Dhuey, D Olynick, F Borondics, MC Martin, HA Bechtel, J Bokor, T Schenkel. 2009-06-10. Device fabrication and transport measurements of FinFETs built with $^{28}$Si SOI wafers towards donor qubits in silicon. https://doi.org/10.1088/0268-1242%2F24%2F10%2F105022
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