arXiv · 0906.5306
Quintuple-layer epitaxy of high-quality Bi2Se3 thin films for topological insulator
Abstract
We report the growth of atomically smooth, single crystalline Bi2Se3 thin films on Si(111) by using molecular beam epitaxy. Scanning tunneling microscopy, low-energy electron diffraction, X-ray photoelectron emission spectroscopy and Raman spectroscopy were used to characterize the stoichiometry and crystallinity of the film. The film grows in a self-organized quintuple-layer by quintuple-layer mode, and atomically smooth film can be obtained with the thickness down to one quintuple-layer (~1nm).
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Guanhua Zhang, Huajun Qin, Jing Teng, Jiandong Guo, Qinlin Guo, Xi Dai, Zhong Fang, Kehui Wu. 2009-06-29. Quintuple-layer epitaxy of high-quality Bi2Se3 thin films for topological insulator. https://doi.org/10.1063/1.3200237
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