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arXiv · 1103.1975

Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale

D. Brunel·D. Troadec·D. Hourlier·D. Deresmes·M Zdrojek·T. Mélin
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Abstract

We investigate the fabrication of electrical contacts using ion- and electron-beam induced deposition of platinum at the sub-μm scale. Halos associated with the metal surface decoration are characterized electrically in the 0.05-2 μm range using transport measurements, conducting atomic force microscopy and Kelvin probe microscopy. In contrast with IBID, EBID electrodes exhibit weakly conductive halos at the sub-μm scale, and can thus be used to achieve resist-free electrical contacts for transport measurements at the sub-μm scale. Four-point transport measurements using μm-spaced EBID contacts are provided in the case of a multiwalled carbon nanotube.

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D. Brunel, D. Troadec, D. Hourlier, D. Deresmes, M Zdrojek, T. Mélin. 2011-03-10. Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale. https://doi.org/10.1016/j.mee.2011.03.011

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