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arXiv · 1207.3183

Enhanced Resolution of Poly-(Methyl Methacrylate) Electron Resist by Thermal Processing

Nima Arjmandi·Liesbet Lagae·Gustaaf Borghs
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Abstract

Granular nanostructure of electron beam resist had limited the ultimate resolution of electron beam lithography. We report a thermal process to achieve a uniform and homogeneous amorphous thin film of poly methyl methacrylate electron resist. This thermal process consists of a short time-high temperature backing process in addition to precisely optimized development process conditions. Using this novel process, we patterned arrays of holes in a metal film with diameter smaller than 5nm. In addition, line edge roughness and surface roughness of the resist reduced to 1nm and 100pm respectively.

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Nima Arjmandi, Liesbet Lagae, Gustaaf Borghs. 2012-07-13. Enhanced Resolution of Poly-(Methyl Methacrylate) Electron Resist by Thermal Processing. https://doi.org/10.1116/1.3167367

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