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arXiv · 1307.3980

Improved surface quality of anisotropically etched silicon {111} planes for mm-scale integrated optics

J. P. Cotter·I. Zeimpekis·M Kraft·E A Hinds
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Abstract

We have studied the surface quality of millimeter-scale optical mirrors produced by etching CZ and FZ silicon wafers in potassium hydroxide to expose the $\{111\}$ planes. We find that the FZ surfaces have four times lower noise power at spatial frequencies up to $500\, {mm}^{-1}$. We conclude that mirrors made using FZ wafers have higher optical quality.

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J. P. Cotter, I. Zeimpekis, M Kraft, E A Hinds. 2013-07-15. Improved surface quality of anisotropically etched silicon {111} planes for mm-scale integrated optics. https://doi.org/10.1088/0960-1317%2F23%2F11%2F117006

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