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arXiv · 1405.1224

Dispersion engineering of high-Q silicon microresonators via thermal oxidation

Wei C. Jiang·Jidong Zhang·Nicholas G. Usechak·Qiang Lin
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Abstract

We propose and demonstrate a convenient and sensitive technique for precise engineering of group-velocity dispersion in high-Q silicon microresonators. By accurately controlling the surface-oxidation thickness of silicon microdisk resonators, we are able to precisely manage the zero-dispersion wavelength while simultaneously further improving the high optical quality of our devices, with the optical Q close to a million. The demonstrated dispersion management allows us to achieve parametric generation with precisely engineerable emission wavelengths, which shows great potential for application in integrated silicon nonlinear and quantum photonics.

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Wei C. Jiang, Jidong Zhang, Nicholas G. Usechak, Qiang Lin. 2014-05-06. Dispersion engineering of high-Q silicon microresonators via thermal oxidation. https://doi.org/10.1063/1.4890986

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