arXiv · 1505.01628
Suppression of excess oxygen for environmentally stable amorphous In-Si-O thin-film transistors
Abstract
We discuss the environmental instability of amorphous indium oxide (InOx)-based thin-film transistors (TFTs) in terms of the excess oxygen in the semiconductor films. A comparison between amorphous InOx doped with low and high concentrations of oxygen binder (SiO2) showed that out-diffusion of oxygen molecules causes drastic changes in the film conductivity and TFT turn-on voltages. Incorporation of sufficient SiO2 could suppress fluctuations in excess oxygen because of the high oxygen bond-dissociation energy and low Gibbs free energy. Consequently, the TFT operation became rather stable. The results would be useful for the design of reliable oxide TFTs with stable electrical properties.
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Shinya Aikawa, Nobuhiko Mitoma, Takio Kizu, Toshihide Nabatame, Kazuhito Tsukagoshi. 2015-05-07. Suppression of excess oxygen for environmentally stable amorphous In-Si-O thin-film transistors. https://doi.org/10.1063/1.4921054
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