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arXiv · 1602.08205

Eigenanalysis of morphological diversity in silicon random nanostructures formed via resist collapse

Makoto Naruse·Morihisa Hoga·Yasuyuki Ohyagi·Shumpei Nishio·Naoya Tate·Naoki Yoshida·Tsutomu Matsumoto
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Abstract

This paper demonstrates eigenanalysis to quantitatively reveal the diversity and capacity of identities offered by the morphological diversity in silicon nanostructures formed via random collapse of resist. The analysis suggests that approximately 10^115 possible identities are provided per 0.18-um^2 area of nanostructures, indicating that nanoscale morphological signatures will be extremely useful for future information security applications where securing identities is critical. The eigenanalysis provides an intuitive physical picture and quantitative characterization of the diversity of structural fluctuations while unifying measurement stability concerns, which will be widely applicable to other materials, devices, and system architectures.

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Makoto Naruse, Morihisa Hoga, Yasuyuki Ohyagi, Shumpei Nishio, Naoya Tate, Naoki Yoshida, Tsutomu Matsumoto. 2016-02-26. Eigenanalysis of morphological diversity in silicon random nanostructures formed via resist collapse. https://doi.org/10.1016/j.physa.2016.06.140

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